Yongchan Ban
- Electrical and Electronic Engineering top 10%
- Hardware and Architecture top 5%
- Biomedical Engineering
- Industrial and Manufacturing Engineering
- Electronic, Optical and Magnetic Materials
- Co-authors
- David Z. PanMinsik ChoKevin LucasKun YuanBei YuSavithri SundareswaranLars W. LiebmannJae-Seok Yang
- Topics
- Advancements in Photolithography Techniques (30 papers)Integrated Circuits and Semiconductor Failure Analysis (13 papers)VLSI and Analog Circuit Testing (9 papers)
- Cited by
- Hardware and ArchitectureElectrical and Electronic EngineeringIndustrial and Manufacturing Engineering
- Journals
- IEEE Transactions on Computer-Aided Design of Integrated Circuits and SystemsIEEE Journal on Emerging and Selected Topics in Circuits and SystemsJournal of Micro/Nanolithography MEMS and MOEMS
- Partner nations
- United StatesSouth KoreaTaiwan
In The Last Decade
Yongchan Ban
35 papers receiving 350 citations
Peers
Comparison fields: 5 of 26
- Electrical and Electronic Engineering 347
- Hardware and Architecture 133
- Biomedical Engineering 90
- Industrial and Manufacturing Engineering 25
- Electronic, Optical and Magnetic Materials 14
Countries citing papers authored by Yongchan Ban
This map shows the geographic impact of Yongchan Ban's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Yongchan Ban with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Yongchan Ban more than expected).
Fields of papers citing papers by Yongchan Ban
This network shows the impact of papers produced by Yongchan Ban. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Yongchan Ban. The network helps show where Yongchan Ban may publish in the future.
Co-authorship network of co-authors of Yongchan Ban
This figure shows the co-authorship network connecting the top 25 collaborators of Yongchan Ban. A scholar is included among the top collaborators of Yongchan Ban based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Yongchan Ban. Yongchan Ban is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 1 | |
| 2 | 0 | |
| 3 | 1 | |
| 4 | 4 | |
| 5 | 1 | |
| 6 | 1 | |
| 7 | 2 | |
| 8 | 6 | |
| 9 | 6 | |
| 10 | Dealing with IC manufacturability in extreme scaling (Embedded tutorial paper) | 2 |
| 11 | 7 | |
| 12 | 30 | |
| 13 | 10 | |
| 14 | 16 | |
| 15 | 6 | |
| 16 | 15 | |
| 17 | 62 | |
| 18 | 25 | |
| 19 | 7 | |
| 20 | 1 |
About Yongchan Ban
Yongchan Ban is a scholar working on Hardware and Architecture, Electrical and Electronic Engineering and Biomedical Engineering, having authored 37 papers that have together received 364 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (30 papers), Integrated Circuits and Semiconductor Failure Analysis (13 papers) and VLSI and Analog Circuit Testing (9 papers). The work is most often cited by research in Hardware and Architecture (133 citations), Electrical and Electronic Engineering (347 citations) and Industrial and Manufacturing Engineering (25 citations). Yongchan Ban has collaborated with scholars based in United States, South Korea and Taiwan. Frequent co-authors include David Z. Pan, Minsik Cho, Kevin Lucas, Kun Yuan, Bei Yu, Savithri Sundareswaran, Lars W. Liebmann, Jae-Seok Yang, Chul‐Hong Park and Rajendran Panda. Their work appears in journals such as IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, IEEE Journal on Emerging and Selected Topics in Circuits and Systems and Journal of Micro/Nanolithography MEMS and MOEMS.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.