Hans Eisenmann

540 total citations
14 papers, 416 citations indexed

About

Hans Eisenmann is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Hardware and Architecture. According to data from OpenAlex, Hans Eisenmann has authored 14 papers receiving a total of 416 indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Electrical and Electronic Engineering, 6 papers in Surfaces, Coatings and Films and 4 papers in Hardware and Architecture. Recurrent topics in Hans Eisenmann's work include Advancements in Photolithography Techniques (11 papers), Electron and X-Ray Spectroscopy Techniques (6 papers) and VLSI and FPGA Design Techniques (5 papers). Hans Eisenmann is often cited by papers focused on Advancements in Photolithography Techniques (11 papers), Electron and X-Ray Spectroscopy Techniques (6 papers) and VLSI and FPGA Design Techniques (5 papers). Hans Eisenmann collaborates with scholars based in Germany, United States and Austria. Hans Eisenmann's co-authors include Frank Johannes, Thomas Waas, Hans Hartmann, Wolfgang Henke, P. Hudek, U. Denker, Dirk Beyer, Jens Schneider, Andrzej J. Strojwas and Ang Lu and has published in prestigious journals such as Microelectronic Engineering, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena and IEE Proceedings - Computers and Digital Techniques.

In The Last Decade

Hans Eisenmann

12 papers receiving 378 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Hans Eisenmann Germany	7	403	265	42	40	38	14	416
Kwangok Jeong United States	13	347 0.9×	141 0.5×	41 1.0×	47 1.2×	12 0.3×	36	385
M.G. Rosenfield United States	9	255 0.6×	89 0.3×	38 0.9×	26 0.7×	87 2.3×	29	303
Vyacheslav Rovner United States	9	376 0.9×	191 0.7×	30 0.7×	51 1.3×	3 0.1×	16	399
Yongchan Ban United States	11	347 0.9×	133 0.5×	12 0.3×	90 2.3×	7 0.2×	37	364
Victor Champac Mexico	14	704 1.7×	432 1.6×	9 0.2×	36 0.9×	4 0.1×	100	720
Haitong Tian United States	12	347 0.9×	190 0.7×	26 0.6×	40 1.0×	2 0.1×	21	358
Gyoyoung Jin South Korea	7	193 0.5×	42 0.2×	61 1.5×	13 0.3×	4 0.1×	25	221
Geoffrey Yeap United States	13	489 1.2×	68 0.3×	15 0.4×	30 0.8×	3 0.1×	48	508
Daniel Micusik Germany	10	366 0.9×	36 0.1×	16 0.4×	111 2.8×	6 0.2×	22	389
A. Maheshwari United States	9	481 1.2×	170 0.6×	62 1.5×	61 1.5×		17	509

Countries citing papers authored by Hans Eisenmann

Since Specialization

Citations

This map shows the geographic impact of Hans Eisenmann's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hans Eisenmann with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hans Eisenmann more than expected).

Fields of papers citing papers by Hans Eisenmann

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Hans Eisenmann. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hans Eisenmann. The network helps show where Hans Eisenmann may publish in the future.

Co-authorship network of co-authors of Hans Eisenmann

This figure shows the co-authorship network connecting the top 25 collaborators of Hans Eisenmann. A scholar is included among the top collaborators of Hans Eisenmann based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hans Eisenmann. Hans Eisenmann is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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14 of 14 papers shown

Eisenmann, Hans. (2015). Force-Directed Placement of VLSI Circuits. 131–132. 2 indexed citations

Hess, Christopher P., et al.. (2014). Direct probing characterization vehicle test chip for wafer level exploration of transistor pattern on product chips. 395. 219–223. 2 indexed citations

Hudek, P., et al.. (2007). Fogging effect correction method in high-resolution electron beam lithography. Microelectronic Engineering. 84(5-8). 814–817. 15 indexed citations

Eisenmann, Hans, et al.. (2003). Generalization of the photo process window and its application to OPC test pattern design. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5042. 42–42. 3 indexed citations

Schneider, Jens, et al.. (2002). Compensation of long-range process effects on photomasks by design data correction. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4889. 59–59. 9 indexed citations

Eisenmann, Hans, et al.. (2002). Combining technology mapping with post-placement resynthesis for performance optimization. 616–621. 16 indexed citations

Lu, Ang, et al.. (1999). Technology mapping for simultaneous gate and interconnect optimisation. IEE Proceedings - Computers and Digital Techniques. 146(1). 21–21. 5 indexed citations

Eisenmann, Hans, et al.. (1999). Geometrical E-beam proximity correction for raster scan systems. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3665. 137–137. 1 indexed citations

Eisenmann, Hans & Frank Johannes. (1998). Generic global placement and floorplanning. 269–274. 297 indexed citations

10.

Maurer, Wilhelm, Thomas Waas, & Hans Eisenmann. (1996). <title>Evaluation of a fast and flexible OPC package: OPTISSIMO</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2884. 412–418.

11.

Waas, Thomas, et al.. (1995). Proximity correction for high CD accuracy and process tolerance. Microelectronic Engineering. 27(1-4). 179–182. 6 indexed citations

12.

Waas, Thomas, Hans Eisenmann, Hans Hartmann, & Wolfgang Henke. (1994). Automatic generation of phase shift mask layouts. Microelectronic Engineering. 23(1-4). 139–142. 11 indexed citations

13.

Eisenmann, Hans, Thomas Waas, & Hans Hartmann. (1994). Proximity correction of high-dosed frame with PROXECCO. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2194. 310–310. 6 indexed citations

14.

Eisenmann, Hans, Thomas Waas, & Hans Hartmann. (1993). PROXECCO—Proximity effect correction by convolution. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 11(6). 2741–2745. 43 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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