Nicolas B. Cobb
- Electrical and Electronic Engineering top 10%
- Biomedical Engineering
- Media Technology top 2%
- Surfaces, Coatings and Films top 5%
- Industrial and Manufacturing Engineering top 5%
- Co-authors
- Avideh ZakhorYuri GranikThuy DoEmile SahouriaWeidong ZhangJames WordWilhelm MaurerChris A. Mack
- Topics
- Advancements in Photolithography Techniques (27 papers)Integrated Circuits and Semiconductor Failure Analysis (12 papers)Industrial Vision Systems and Defect Detection (10 papers)
- Journals
- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIETechConnect Briefs
- Partner nations
- United StatesHungaryNetherlands
In The Last Decade
Nicolas B. Cobb
31 papers receiving 554 citations
Peers
Comparison fields: 5 of 29
- Electrical and Electronic Engineering 577
- Biomedical Engineering 192
- Media Technology 166
- Surfaces, Coatings and Films 110
- Industrial and Manufacturing Engineering 78
Countries citing papers authored by Nicolas B. Cobb
This map shows the geographic impact of Nicolas B. Cobb's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Nicolas B. Cobb with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Nicolas B. Cobb more than expected).
Fields of papers citing papers by Nicolas B. Cobb
This network shows the impact of papers produced by Nicolas B. Cobb. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Nicolas B. Cobb. The network helps show where Nicolas B. Cobb may publish in the future.
Co-authorship network of co-authors of Nicolas B. Cobb
This figure shows the co-authorship network connecting the top 25 collaborators of Nicolas B. Cobb. A scholar is included among the top collaborators of Nicolas B. Cobb based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Nicolas B. Cobb. Nicolas B. Cobb is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 15 | |
| 2 | 14 | |
| 3 | 17 | |
| 4 | 18 | |
| 5 | 1 | |
| 6 | 26 | |
| 7 | 3 | |
| 8 | 1 | |
| 9 | 3 | |
| 10 | 41 | |
| 11 | 27 | |
| 12 | 5 | |
| 13 | 3 | |
| 14 | 2 | |
| 15 | Full-chip Process Simulation for Silicon DRC | 8 |
| 16 | 5 | |
| 17 | 12 | |
| 18 | 29 | |
| 19 | 47 | |
| 20 | 13 |
About Nicolas B. Cobb
Nicolas B. Cobb is a scholar working on Surfaces, Coatings and Films, Industrial and Manufacturing Engineering and Hardware and Architecture, having authored 31 papers that have together received 606 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (27 papers), Integrated Circuits and Semiconductor Failure Analysis (12 papers) and Industrial Vision Systems and Defect Detection (10 papers). The work is most often cited by research in Media Technology (166 citations), Surfaces, Coatings and Films (110 citations) and Hardware and Architecture (77 citations). Nicolas B. Cobb has collaborated with scholars based in United States, Hungary and Netherlands. Frequent co-authors include Avideh Zakhor, Yuri Granik, Thuy Do, Emile Sahouria, Weidong Zhang, James Word, Wilhelm Maurer, Chris A. Mack, J. Andres Torres and Uwe Hollerbach. Their work appears in journals such as Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE and TechConnect Briefs.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.