Thomas V. Pistor

575 total citations
32 papers, 479 citations indexed

About

Thomas V. Pistor is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Computational Mechanics. According to data from OpenAlex, Thomas V. Pistor has authored 32 papers receiving a total of 479 indexed citations (citations by other indexed papers that have themselves been cited), including 24 papers in Electrical and Electronic Engineering, 16 papers in Surfaces, Coatings and Films and 11 papers in Computational Mechanics. Recurrent topics in Thomas V. Pistor's work include Advancements in Photolithography Techniques (21 papers), Electron and X-Ray Spectroscopy Techniques (11 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). Thomas V. Pistor is often cited by papers focused on Advancements in Photolithography Techniques (21 papers), Electron and X-Ray Spectroscopy Techniques (11 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). Thomas V. Pistor collaborates with scholars based in United States and South Korea. Thomas V. Pistor's co-authors include Christopher J. Stolz, François Y. Génin, L. L. Chase, Alberto Salleo, Andrew R. Neureuther, Michael D. Feit, Robert Socha, Siyao Qiu, Justin Wolfe and Anthony M. Monterrosa and has published in prestigious journals such as Journal of the Optical Society of America A, Microelectronic Engineering and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.

In The Last Decade

Thomas V. Pistor

30 papers receiving 406 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Thomas V. Pistor United States 9 301 218 207 116 96 32 479
Linas Smalakys Lithuania 9 203 0.7× 104 0.5× 81 0.4× 78 0.7× 67 0.7× 25 311
Stefan Rung Germany 15 344 1.1× 102 0.5× 224 1.1× 32 0.3× 128 1.3× 36 468
Zheng Kuang United Kingdom 14 337 1.1× 129 0.6× 248 1.2× 31 0.3× 95 1.0× 30 566
Holger Blaschke Germany 8 221 0.7× 112 0.5× 109 0.5× 73 0.6× 92 1.0× 40 312
Simon Schwarz Germany 12 233 0.8× 90 0.4× 155 0.7× 28 0.2× 89 0.9× 26 334
R. Hawley United States 5 187 0.6× 77 0.4× 129 0.6× 14 0.1× 85 0.9× 5 293
J. D. Bude United States 8 415 1.4× 106 0.5× 271 1.3× 28 0.2× 186 1.9× 11 507
Moez Haque Canada 10 150 0.5× 247 1.1× 134 0.6× 35 0.3× 29 0.3× 24 382
Joerg Schille Germany 13 450 1.5× 137 0.6× 243 1.2× 20 0.2× 252 2.6× 52 620
G. Heise Germany 15 270 0.9× 491 2.3× 74 0.4× 54 0.5× 126 1.3× 47 682

Countries citing papers authored by Thomas V. Pistor

Since Specialization
Citations

This map shows the geographic impact of Thomas V. Pistor's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thomas V. Pistor with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thomas V. Pistor more than expected).

Fields of papers citing papers by Thomas V. Pistor

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Thomas V. Pistor. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thomas V. Pistor. The network helps show where Thomas V. Pistor may publish in the future.

Co-authorship network of co-authors of Thomas V. Pistor

This figure shows the co-authorship network connecting the top 25 collaborators of Thomas V. Pistor. A scholar is included among the top collaborators of Thomas V. Pistor based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Thomas V. Pistor. Thomas V. Pistor is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Pistor, Thomas V.. (2024). Exploring EUV scanner design options enabled by free electron laser sources. 42–42. 1 indexed citations
2.
Herbol, Henry, et al.. (2015). Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach. Journal of Micro/Nanolithography MEMS and MOEMS. 14(2). 23505–23505. 3 indexed citations
3.
Pistor, Thomas V., et al.. (2015). Investigating deprotection-induced shrinkage and retro-grade sidewalls in NTD resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9426. 94260T–94260T. 5 indexed citations
4.
Herbol, Henry, et al.. (2015). Evaluating printability of buried native EUV mask phase defects through a modeling and simulation approach. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 94220Q–94220Q. 4 indexed citations
5.
Herbol, Henry, et al.. (2015). Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 33(2). 7 indexed citations
6.
Qiu, Siyao, Justin Wolfe, Anthony M. Monterrosa, et al.. (2011). Searching for optimal mitigation geometries for laser-resistant multilayer high-reflector coatings. Applied Optics. 50(9). C373–C373. 21 indexed citations
7.
Qiu, Siyao, Justin Wolfe, Anthony M. Monterrosa, et al.. (2010). Impact of substrate surface scratches on the laser damage resistance of multilayer coatings. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7842. 78421X–78421X. 11 indexed citations
8.
Qiu, Siyao, et al.. (2009). Modeling of light intensification by conical pits within multilayer coatings. OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information).
9.
Qiu, Siyao, Justin Wolfe, Anthony M. Monterrosa, et al.. (2009). Modeling of light intensification by conical pits within multilayer high reflector coatings. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7504. 75040M–75040M. 8 indexed citations
10.
Stolz, Christopher J., et al.. (2007). Light intensification modeling of coating inclusions irradiated at 351 and 1053 nm. Applied Optics. 47(13). C162–C162. 42 indexed citations
11.
Stolz, Christopher J., Michael D. Feit, & Thomas V. Pistor. (2006). Laser intensification by spherical inclusions embedded within multilayer coatings. Applied Optics. 45(7). 1594–1594. 72 indexed citations
12.
Pistor, Thomas V. & Robert Socha. (2002). Rigorous electromagnetic simulation of stepper alignment. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4689. 1045–1045. 4 indexed citations
13.
Pistor, Thomas V.. (2002). Rigorous 3D simulation of phase defects in alternating phase-shifting masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4562. 1038–1038. 2 indexed citations
14.
Génin, François Y., Alberto Salleo, Thomas V. Pistor, & L. L. Chase. (2001). Role of light intensification by cracks in optical breakdown on surfaces. Journal of the Optical Society of America A. 18(10). 2607–2607. 166 indexed citations
15.
Lee, Sang Il, Yunfei Deng, Thomas V. Pistor, et al.. (2001). LAVA web-based remote simulation: enhancements for education and technology innovation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4346. 1500–1500. 3 indexed citations
16.
Deng, Yunfei, Thomas V. Pistor, & Andrew R. Neureuther. (2001). <title>Models for characterizing the printability of buried EUV defects</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4343. 551–558. 7 indexed citations
17.
Neureuther, Andrew R., et al.. (2001). Simulation of image quality issues at low k 1 for 100-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4409. 33–33. 1 indexed citations
18.
Pistor, Thomas V., Andrew R. Neureuther, & Robert Socha. (2000). Modeling oblique incidence effects in photomasks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4000. 228–228. 40 indexed citations
19.
Pistor, Thomas V. & Andrew R. Neureuther. (1999). Calculating aerial images from EUV masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3676. 679–679. 15 indexed citations
20.
Socha, Robert, et al.. (1997). Simulating photomask edge roughness and corner rounding. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3050. 215–215. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by Linas Smalakys Breakdown of academic impact, for papers by Stefan Rung Breakdown of academic impact, for papers by Zheng Kuang Breakdown of academic impact, for papers by Holger Blaschke Breakdown of academic impact, for papers by Simon Schwarz Breakdown of academic impact, for papers by R. Hawley Breakdown of academic impact, for papers by J. D. Bude Breakdown of academic impact, for papers by Moez Haque Breakdown of academic impact, for papers by Joerg Schille Breakdown of academic impact, for papers by G. Heise
Rankless by CCL
2026