Uwe Hollerbach

496 total citations
38 papers, 379 citations indexed

About

Uwe Hollerbach is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Uwe Hollerbach has authored 38 papers receiving a total of 379 indexed citations (citations by other indexed papers that have themselves been cited), including 30 papers in Electrical and Electronic Engineering, 23 papers in Biomedical Engineering and 7 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Uwe Hollerbach's work include Advancements in Photolithography Techniques (30 papers), Advanced Surface Polishing Techniques (11 papers) and Nanofabrication and Lithography Techniques (11 papers). Uwe Hollerbach is often cited by papers focused on Advancements in Photolithography Techniques (30 papers), Advanced Surface Polishing Techniques (11 papers) and Nanofabrication and Lithography Techniques (11 papers). Uwe Hollerbach collaborates with scholars based in United States, Netherlands and Israel. Uwe Hollerbach's co-authors include Bob Eisenberg, Boaz Nadler, Eytan Barouch, Steven A. Orszag, David D. Busath, Daniel C. Cole, Z. Schuss, Xuelong Shi, Robert Socha and Stephen Hsu and has published in prestigious journals such as Langmuir, Japanese Journal of Applied Physics and IEEE Electron Device Letters.

In The Last Decade

Uwe Hollerbach

31 papers receiving 358 citations

Peers

Countries citing papers authored by Uwe Hollerbach

Since Specialization

Citations

This map shows the geographic impact of Uwe Hollerbach's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Uwe Hollerbach with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Uwe Hollerbach more than expected).

Fields of papers citing papers by Uwe Hollerbach

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Uwe Hollerbach. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Uwe Hollerbach. The network helps show where Uwe Hollerbach may publish in the future.

Co-authorship network of co-authors of Uwe Hollerbach

This figure shows the co-authorship network connecting the top 25 collaborators of Uwe Hollerbach. A scholar is included among the top collaborators of Uwe Hollerbach based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Uwe Hollerbach. Uwe Hollerbach is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology 2005 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), (unknown), (unknown), Uwe Hollerbach, Robert Socha, (unknown), Stephen Hsu, Xuelong Shi	6
2	Lithography manufacturing implementation for 65 nm and 45 nm nodes with model-based scattering bars using IML technology 2005 ·(unknown), (unknown), (unknown), (unknown), Uwe Hollerbach, Robert Socha, (unknown), Stephen Hsu, Xuelong Shi	1
3	RET masks for the final frontier of optical lithography 2005 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), Stephen Hsu, (unknown), (unknown), Xuelong Shi, (unknown), Robert Socha, Uwe Hollerbach, (unknown), Jung‐Chul Park, (unknown), (unknown)	9
4	Contact hole reticle optimization by using interference mapping lithography (IML) 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Robert Socha, (unknown), Stephen D. H. Hsu, (unknown), (unknown), Noel Corcoran, Uwe Hollerbach, (unknown), Xuelong Shi, Will Conley	9
5	Saturation of conductance in single ion channels: The blocking effect of the near reaction field 2004 ·Physical Review E ·Boaz Nadler, Z. Schuss, Uwe Hollerbach, Bob Eisenberg	27
6	Contact and via hole mask design optimization for 65-nm technology node 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Xuelong Shi, Robert Socha, (unknown), Uwe Hollerbach, (unknown), Stephen D. H. Hsu, (unknown), Noel Corcoran, Mircea Dusa, Jung Chul Park	0
7	Dielectric boundary force and its crucial role in gramicidin 2003 ·Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics ·Boaz Nadler, Uwe Hollerbach, Bob Eisenberg	55
8	Predicting Function from Structure Using the Poisson−Nernst−Planck Equations: Sodium Current in the Gramicidin A Channel 2000 ·Langmuir ·Uwe Hollerbach, (unknown), David D. Busath, Bob Eisenberg	63
9	Achieving sub-half-micron i-line manufacturability through automated OPC 1997 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Eric M. Jackson, (unknown), (unknown), (unknown), Uwe Hollerbach, (unknown), (unknown), (unknown), Eytan Barouch, Steven A. Orszag, (unknown), (unknown)	2
10	<title>OPTIMASK: an OPC algorithm for chrome and phase-shift mask design</title> 1995 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Eytan Barouch, Uwe Hollerbach, (unknown)	9
11	<title>Automated determination of CAD layout failures through focus: experiment and simulation</title> 1994 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), Eytan Barouch, Uwe Hollerbach, Steven A. Orszag	3
12	Vector aerial image with off-axis illumination 1993 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Eytan Barouch, Daniel C. Cole, Uwe Hollerbach, Steven A. Orszag	4
13	Experiment and simulation of sub-0.25-μm resist processes for 193-nm lithography 1993 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Roderick R. Kunz, Mark A. Hartney, (unknown), Eytan Barouch, Uwe Hollerbach	2
14	Simulation of photolithographic processes in general two- and three-dimensional geometries 1992 ·UMI eBooks ·Uwe Hollerbach	0
15	Advanced i-line resist performance with and without phase-shift masks 1992 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Eytan Barouch, Uwe Hollerbach, Steven A. Orszag	0
16	Extending scalar aerial image calculations to higher numerical apertures 1992 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Daniel C. Cole, Eytan Barouch, Uwe Hollerbach, Steven A. Orszag	17
17	Derivation and Simulation of Higher Numerical Aperture Scalar Aerial Images 1992 ·Japanese Journal of Applied Physics ·Daniel C. Cole, Eytan Barouch, Uwe Hollerbach, Steven A. Orszag	25
18	Process latitudes in projection printing 1991 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Eytan Barouch, Uwe Hollerbach, Steven A. Orszag, Brian Bradie, Martin Peckerar	2
19	Numerical simulation of submicron photolithographic processing 1991 ·Journal of Scientific Computing ·Eytan Barouch, John W. Cahn, Uwe Hollerbach, Steven A. Orszag	1
20	Modeling process latitude in UV projection lithography 1991 ·IEEE Electron Device Letters ·Eytan Barouch, Uwe Hollerbach, Steven A. Orszag, Brian Bradie, Martin Peckerar	4

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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