Mark C. Hakey

540 citations

11 papers · 380 indexed · h-index 6

Impact in

Hardware and Architecture top 10%
- VLSI and Analog Circuit Testing
Electrical and Electronic Engineering top 10%
- Radiation Effects in Electronics
- Semiconductor materials and devices
- Integrated Circuits and Semiconductor Failure Analysis
- Advancements in Semiconductor Devices and Circuit Design
- Advancements in Photolithography Techniques

Papers in

Hardware and Architecture 2
- VLSI and Analog Circuit Testing 2
Electrical and Electronic Engineering 11
- Advancements in Photolithography Techniques 6
- Integrated Circuits and Semiconductor Failure Analysis 6
- Semiconductor materials and devices 3
- Radiation Effects in Electronics 2
- Advancements in Semiconductor Devices and Circuit Design 2

Co-authors: James R. Schwank David F. Heidel Paul W. Marshall P.E. Dodd Kenneth P. Rodbell M.R. Shaneyfelt Kenneth A. LaBel M. Friendlich
Journals: IEEE Transactions on Nuclear Science (3 papers)IBM Journal of Research and Development (1 paper)Journal of Electronic Materials (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (4 papers)
Partner nations: United States Netherlands

In The Last Decade

Mark C. Hakey

10 papers receiving 355 citations

Peers

Countries citing papers authored by Mark C. Hakey

Since Specialization

Citations

This map shows the geographic impact of Mark C. Hakey's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mark C. Hakey with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mark C. Hakey more than expected).

Fields of papers citing papers by Mark C. Hakey

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mark C. Hakey. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mark C. Hakey. The network helps show where Mark C. Hakey may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Mark C. Hakey, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Mark C. Hakey Line = papers co-authored together Mark C. Hakey links everyone, so they are left out of the graph.

All Works

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11 of 11 papers shown

#	Work
1	Estimation of Heavy-Ion LET Thresholds in Advanced SOI IC Technologies From Two-Photon Absorption Laser Measurements IEEE Transactions on Nuclear Science ·James R. Schwank, M.R. Shaneyfelt, Dale McMorrow, Véronique Ferlet-Cavrois, P.E. Dodd, David F. Heidel, Paul W. Marshall, Jonathan A. Pellish, Kenneth A. LaBel, Kenneth P. Rodbell, Mark C. Hakey, Richard S. Flores, Scot E. Swanson, Scott M. Dalton	2010	30
2	Single-Event Upsets and Multiple-Bit Upsets on a 45 nm SOI SRAM IEEE Transactions on Nuclear Science ·David F. Heidel, Paul W. Marshall, Jonathan A. Pellish, Kenneth P. Rodbell, Kenneth A. LaBel, James R. Schwank, Stewart E. Rauch, Mark C. Hakey, Melanie D. Berg, Katia Shpilband, P.E. Dodd, M. Friendlich, Anthony Phan, C.M. Seidleck, M.R. Shaneyfelt, M.A. Xapsos	2009	137
3	Estimation of heavy-ion LET thresholds in advanced SOI IC technologies from two-photon absorption laser measurements James R. Schwank, M.R. Shaneyfelt, Dale McMorrow, YanChu, P.E. Dodd, David F. Heidel, Paul W. Marshall, Jonathan A. Pellish, Kenneth A. LaBel, Kenneth P. Rodbell, Mark C. Hakey, Richard S. Flores, Scot E. Swanson, Scott M. Dalton	2009	2
4	Low Energy Proton Single-Event-Upset Test Results on 65 nm SOI SRAM IEEE Transactions on Nuclear Science ·David F. Heidel, Paul W. Marshall, Kenneth A. LaBel, James R. Schwank, Kenneth P. Rodbell, Mark C. Hakey, Melanie D. Berg, P.E. Dodd, M. Friendlich, Anthony Phan, C.M. Seidleck, M.R. Shaneyfelt, M.A. Xapsos	2008	135
5	Edge lithography as a means of extending the limits of optical and nonoptical lithographic resolution Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Steven J. Holmes, Toshiharu Furukawa, Mark C. Hakey, David Horák, Mohamed Abou Elmaaty Amin, H. D. Fischer, Wu‐Song Huang, Bocanegra Alonso Anabel, Arimatéa C. Ximenes	1999	5
6	Manufacturing with DUV lithography IBM Journal of Research and Development ·Steven J. Holmes, P. H. Mitchell, Mark C. Hakey	1997	23
7	Cost/benefit analysis of mix-and-match lithography for production of half-micron devices Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Hy D., Mark C. Hakey, Britney A. Stottlemyer	1993	3
8	A high performance 16-Mb DRAM technology Fabrice Marchand, De Silva Lindamullage Amila, Mark C. Hakey, 栾希英, S. Luce, Flávia Pontes Rabello	1990	21
9	1X deep-UV lithography with chemical amplification for 1-micron DRAM production Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Hy D., Steven J. Holmes, James R. Morrow, RL Chiavarini, Mark C. Hakey, Rismayanti Fatonah, William R. Brunsvold, C. Grant Willson, Nicholas J. Clecak, Scott Macdonald, Hiroshi Itô	1990	20
10	<title>Characterization Of The Induction Effect At Mid-Ultraviolet Exposure: Application To AZ2400 At 313 Nm</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Donald C. Hofer, C. Grant Willson, Andrew R. Neureuther, Mark C. Hakey	1982	1
11	Advanced IX projection photolithography Journal of Electronic Materials ·Mark C. Hakey, Joäo Alves de Araújo Filho	1982	3

About Mark C. Hakey

Mark C. Hakey is a scholar working on Hardware and Architecture, Electrical and Electronic Engineering, Surfaces, Coatings and Films, Industrial and Manufacturing Engineering and Biomedical Engineering, having authored 11 papers that have together received 380 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (6 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers), Semiconductor materials and devices (3 papers), Diamond and Carbon-based Materials Research (2 papers), VLSI and Analog Circuit Testing (2 papers), Nanofabrication and Lithography Techniques (2 papers), Radiation Effects in Electronics (2 papers) and Advancements in Semiconductor Devices and Circuit Design (2 papers). The work is most often cited by research in Hardware and Architecture (74 citations), Electrical and Electronic Engineering (355 citations), Radiation (49 citations), Nuclear and High Energy Physics (28 citations) and Surfaces, Coatings and Films (13 citations). Mark C. Hakey has collaborated with scholars based in United States and Netherlands. Frequent co-authors include James R. Schwank, David F. Heidel, Paul W. Marshall, P.E. Dodd, Kenneth P. Rodbell, M.R. Shaneyfelt, Kenneth A. LaBel, M. Friendlich, Anthony Phan and M.A. Xapsos. Their work appears in journals such as IEEE Transactions on Nuclear Science, IBM Journal of Research and Development, Journal of Electronic Materials and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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