A. Muray

1.2k total citations · 1 hit paper
18 papers, 864 citations indexed

About

A. Muray is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, A. Muray has authored 18 papers receiving a total of 864 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electrical and Electronic Engineering, 11 papers in Surfaces, Coatings and Films and 5 papers in Biomedical Engineering. Recurrent topics in A. Muray's work include Advancements in Photolithography Techniques (12 papers), Integrated Circuits and Semiconductor Failure Analysis (10 papers) and Electron and X-Ray Spectroscopy Techniques (9 papers). A. Muray is often cited by papers focused on Advancements in Photolithography Techniques (12 papers), Integrated Circuits and Semiconductor Failure Analysis (10 papers) and Electron and X-Ray Spectroscopy Techniques (9 papers). A. Muray collaborates with scholars based in United States. A. Muray's co-authors include M. Isaacson, A. Harootunian, A. Lewis, I. Adesida, M. R. Scheinfein, Neil Richardson, Brian Whitehead, E. Kratschmer, E. D. Wolf and Mark Gesley and has published in prestigious journals such as Applied Physics Letters, Ultramicroscopy and Microelectronic Engineering.

In The Last Decade

A. Muray

18 papers receiving 826 citations

Hit Papers

align trajectories

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Development of a 500 Å spatial resolution light microscope

1984 537 citations A. Lewis, M. Isaacson et al. Ultramicroscopy profile →

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
A. Muray United States	10	587	553	334	192	120	18	864
R. L. Kostelak United States	7	1.1k 1.8×	799 1.4×	531 1.6×	140 0.7×	194 1.6×	23	1.3k
M. Spajer France	15	901 1.5×	723 1.3×	754 2.3×	110 0.6×	104 0.9×	47	1.2k
Ernst Jan R. Vesseur Netherlands	16	1.1k 1.9×	417 0.8×	515 1.5×	245 1.3×	182 1.5×	25	1.4k
Birgit Päivänranta Finland	12	369 0.6×	298 0.5×	235 0.7×	226 1.2×	89 0.7×	18	631
Erik M. Secula United States	11	179 0.3×	349 0.6×	142 0.4×	124 0.6×	182 1.5×	156	591
M. Kuttge Spain	13	1.1k 1.9×	517 0.9×	506 1.5×	214 1.1×	122 1.0×	15	1.3k
Ulrike Eigenthaler Germany	7	1.0k 1.7×	472 0.9×	566 1.7×	117 0.6×	61 0.5×	9	1.3k
Chusuke Munakata Japan	18	152 0.3×	813 1.5×	538 1.6×	128 0.7×	239 2.0×	98	1.0k
S. Babin United States	13	181 0.3×	530 1.0×	190 0.6×	304 1.6×	68 0.6×	91	662
Christophe Péroz United States	15	367 0.6×	393 0.7×	290 0.9×	151 0.8×	81 0.7×	42	760

Countries citing papers authored by A. Muray

Since Specialization

Citations

This map shows the geographic impact of A. Muray's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Muray with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Muray more than expected).

Fields of papers citing papers by A. Muray

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. Muray. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Muray. The network helps show where A. Muray may publish in the future.

Co-authorship network of co-authors of A. Muray

This figure shows the co-authorship network connecting the top 25 collaborators of A. Muray. A scholar is included among the top collaborators of A. Muray based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with A. Muray. A. Muray is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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18 of 18 papers shown

Muray, A., et al.. (1995). Experimental evaluation of an electron-beam pulse modulated blanker (160 MHz) for next-generation electron-beam raster scan systems. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 2488–2492. 3 indexed citations

Muray, A., et al.. (1994). Address data reduction and lithography performance of graybeam writing strategies for raster scan mask generation. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(6). 3465–3472. 3 indexed citations

Muray, A., et al.. (1992). <title>Issues associated with the commercialization of phase-shift masks</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1604. 236–264. 11 indexed citations

Muray, A., et al.. (1991). Phase-shift mask technology: requirements for e-beam mask lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1464. 314–314. 1 indexed citations

Muray, A., et al.. (1991). <title>Proximity effect correction on MEBES for 1x mask fabrication: lithography issues and tradeoffs at 0.25 micron</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1496. 171–179. 1 indexed citations

Muray, A., et al.. (1990). Proximity effect correction at 10 keV using ghost and sizing for 0.4 μm mask lithography. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 8(6). 1775–1779. 3 indexed citations

Richardson, Neil & A. Muray. (1988). An improved magnetic-collimating secondary electron energy filter for very large scale integrated diagnostics. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(1). 417–421. 17 indexed citations

Muray, A., et al.. (1987). Impact Of Wafer Flatness On Submicron Optical Lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 772. 232–232. 4 indexed citations

Adesida, I., E. Kratschmer, E. D. Wolf, A. Muray, & M. Isaacson. (1985). Ion beam lithography at nanometer dimensions. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 3(1). 45–49. 13 indexed citations

10.

Muray, A., M. R. Scheinfein, M. Isaacson, & I. Adesida. (1985). Radiolysis and resolution limits of inorganic halide resists. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 3(1). 367–372. 78 indexed citations

11.

Scheinfein, M. R., A. Muray, & M. Isaacson. (1985). Electron energy loss spectroscopy across a metal-insulator interface at sub-nanometer spatial resolution. Ultramicroscopy. 16(2). 233–239. 35 indexed citations

12.

Harootunian, A., et al.. (1984). Near-field investigation of submicrometer apertures at optical wavelengths (A). 1. 1293. 5 indexed citations

13.

Muray, A., M. Isaacson, & I. Adesida. (1984). AlF3—A new very high resolution electron beam resist. Applied Physics Letters. 45(5). 589–591. 60 indexed citations

14.

Isaacson, M., A. Muray, M. R. Scheinfein, I. Adesida, & E. Kratschmer. (1984). Nanometer structure fabrication using electron beam lithography. Microelectronic Engineering. 2(1-3). 58–64. 9 indexed citations

15.

Lewis, A., M. Isaacson, A. Harootunian, & A. Muray. (1984). Development of a 500 Å spatial resolution light microscope. Ultramicroscopy. 13(3). 227–231. 537 indexed citations breakdown →

16.

Muray, A., M. Isaacson, I. Adesida, & Brian Whitehead. (1983). Fabrication of apertures, slots, and grooves at the 8–80 nm scale in silicon and metal films. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 1(4). 1091–1095. 16 indexed citations

17.

Muray, A., et al.. (1983). VERY HIGH RESOLUTION ION BEAM LITHOGRAPHY.. 151–156. 1 indexed citations

18.

Isaacson, M. & A. Muray. (1981). I n s i t u vaporization of very low molecular weight resists using 1/2 nm diameter electron beams. Journal of Vacuum Science and Technology. 19(4). 1117–1120. 67 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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