Thomas H. Baum

1.3k total citations
43 papers, 1.0k citations indexed

About

Thomas H. Baum is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry. According to data from OpenAlex, Thomas H. Baum has authored 43 papers receiving a total of 1.0k indexed citations (citations by other indexed papers that have themselves been cited), including 23 papers in Electrical and Electronic Engineering, 15 papers in Electronic, Optical and Magnetic Materials and 13 papers in Materials Chemistry. Recurrent topics in Thomas H. Baum's work include Semiconductor materials and devices (18 papers), Copper Interconnects and Reliability (11 papers) and Laser-induced spectroscopy and plasma (5 papers). Thomas H. Baum is often cited by papers focused on Semiconductor materials and devices (18 papers), Copper Interconnects and Reliability (11 papers) and Laser-induced spectroscopy and plasma (5 papers). Thomas H. Baum collaborates with scholars based in United States, Germany and France. Thomas H. Baum's co-authors include Carl E. Larson, Carol R. Jones, P. Doppelt, Paul B. Comita, Robert L. Jackson, Chongying Xu, Arnold L. Rheingold, Toivo T. Kodas, Scott Reynolds and Christopher J. Smart and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Chemistry of Materials.

In The Last Decade

Thomas H. Baum

42 papers receiving 963 citations

Author Peers

Peers are selected by citation overlap in the author's most active subfields. citations · hero ref

Author Last Decade Papers Cites
Thomas H. Baum 502 359 324 188 181 43 1.0k
Peter Hahn 666 1.3× 125 0.3× 473 1.5× 136 0.7× 205 1.1× 37 1.3k
M. C. Wood 577 1.1× 185 0.5× 413 1.3× 256 1.4× 190 1.0× 45 1.2k
P.A.W. van der Heide 417 0.8× 295 0.8× 994 3.1× 56 0.3× 110 0.6× 62 1.4k
S. Rushworth 1.1k 2.1× 271 0.8× 775 2.4× 113 0.6× 140 0.8× 123 1.5k
Robert Marshall 397 0.8× 116 0.3× 1.0k 3.1× 139 0.7× 165 0.9× 20 1.4k
H. Roulet 912 1.8× 154 0.4× 831 2.6× 30 0.2× 199 1.1× 41 1.4k
Masao Takahashi 910 1.8× 136 0.4× 764 2.4× 35 0.2× 132 0.7× 90 1.4k
R. W. M. Kwok 644 1.3× 74 0.2× 573 1.8× 46 0.2× 121 0.7× 74 1.1k
Shenglai Wang 174 0.3× 604 1.7× 439 1.4× 41 0.2× 314 1.7× 79 923

Countries citing papers authored by Thomas H. Baum

Since Specialization
Citations

This map shows the geographic impact of Thomas H. Baum's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thomas H. Baum with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thomas H. Baum more than expected).

Fields of papers citing papers by Thomas H. Baum

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Thomas H. Baum. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thomas H. Baum. The network helps show where Thomas H. Baum may publish in the future.

Co-authorship network of co-authors of Thomas H. Baum

This figure shows the co-authorship network connecting the top 25 collaborators of Thomas H. Baum. A scholar is included among the top collaborators of Thomas H. Baum based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Thomas H. Baum. Thomas H. Baum is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Korzenski, Michael B., et al.. (2006). Liquid Clean Formulations for Stripping High-Dose Ion-Implanted Photoresist from Microelectronic Devices. Journal of The Electrochemical Society. 153(7). G591–G591. 18 indexed citations
2.
Hendrix, B. C., S. Bilodeau, Ziyun Wang, et al.. (2002). Metalorganic Chemical Vapor Deposition of Thin Film ZrO2and Pb(Zr,Ti)O3: Precursor Chemistry and Process Characteristics. Japanese Journal of Applied Physics. 41(Part 1, No. 11B). 6695–6700. 3 indexed citations
3.
Xu, Chongying, Thomas H. Baum, Ilia A. Guzei, & Arnold L. Rheingold. (2000). Synthesis and Characterization of (hfac)In(CH3)2:  A Volatile Compound Useful for CVD of Indium and Indium-Containing Materials. Inorganic Chemistry. 39(9). 2008–2010. 8 indexed citations
4.
Paw, Witold, Thomas H. Baum, Kin‐Chung Lam, & Arnold L. Rheingold. (2000). Low-Melting, Mononuclear Tetrahydrofuran Complexes of M(2,2,6,6-tetramethylheptane-3,5-dionate)2 (M = Ba, Sr) and Related Analogues. Inorganic Chemistry. 39(9). 2011–2014. 9 indexed citations
5.
Baum, Thomas H., et al.. (1999). Synthesis and Stabilization of Stibine for Low-Temperature Chemical Vapor Deposition of Carbon-Free Antimony Films. Chemistry of Materials. 11(3). 547–551. 17 indexed citations
6.
Hendrix, B. C., Jeffrey F. Roeder, Thomas H. Baum, et al.. (1998). Correlations Between Composition, Texture, and Polarization in SrxBiyTa2O5+x+3y/2 Thin Films Deposited by MOCVD. MRS Proceedings. 541. 5 indexed citations
7.
Xu, Chongying, Thomas H. Baum, & Arnold L. Rheingold. (1998). New Precursors for Chemical Vapor Deposition of Iridium. Chemistry of Materials. 10(9). 2329–2331. 33 indexed citations
8.
Glassman, Timothy E., et al.. (1996). Evidence for Cooperative Oxidation of Mocvd Precursors Used in BaxSr1‐x TiO3 Film Growth. MRS Proceedings. 446.
9.
10.
Doppelt, P. & Thomas H. Baum. (1995). The chemical vapor deposition of copper and copper alloys. Thin Solid Films. 270(1-2). 480–482. 12 indexed citations
11.
Baum, Thomas H., Carl E. Larson, & Nigel P. Hacker. (1994). Poly(1,4-phenyleneazine N,N-dioxide): A Recyclable Material for a Solventless Laser-Imageable Resist Process. Chemistry of Materials. 6(11). 1978–1981. 5 indexed citations
12.
Baum, Thomas H. & Paul B. Comita. (1992). Laser-induced chemical vapor deposition of metals for microelectronics technology. Thin Solid Films. 218(1-2). 80–94. 43 indexed citations
13.
Baum, Thomas H., Paul B. Comita, & Toivo T. Kodas. (1991). <title>Laser-induced gold deposition for thin-film circuit repair</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1598. 122–131. 8 indexed citations
14.
Baum, Thomas H., et al.. (1991). Photoselective catalysis of electroless copper solutions for the formation of adherent copper films onto polyimide. Chemistry of Materials. 3(4). 714–720. 17 indexed citations
15.
Reynolds, Scott, et al.. (1991). Chemical vapor deposition of copper from 1,5-cyclooctadiene copper(I) hexafluoroacetylacetonate. Applied Physics Letters. 59(18). 2332–2334. 95 indexed citations
16.
Baum, Thomas H.. (1990). Photochemically Generated Gold Catalyst for Selective Electroless Plating of Copper. Journal of The Electrochemical Society. 137(1). 252–255. 14 indexed citations
17.
Shibata, Shuzo, Kinya Iijima, & Thomas H. Baum. (1990). Molecular structure of dimethyl(2,4-pentanedionato)gold(III). Journal of the Chemical Society Dalton Transactions. 1519–1519. 11 indexed citations
18.
Baum, Thomas H., Carl E. Larson, & Robert L. Jackson. (1988). Laser-Induced Chemical Vapor Deposition of High Purity Aluminum. MRS Proceedings. 129. 2 indexed citations
19.
Larson, Carl E., Thomas H. Baum, & Robert L. Jackson. (1986). Chemical Vapor Deposition of Gold. MRS Proceedings. 75. 5 indexed citations
20.
Baum, Thomas H. & Carol R. Jones. (1985). Laser chemical vapor deposition of gold. Applied Physics Letters. 47(5). 538–540. 80 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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