U. Haak

933 citations

15 papers · 172 indexed · h-index 7

Impact in

Nuclear Energy and Engineering
Surfaces, Coatings and Films
- Optical Coatings and Gratings

Papers in

Surfaces, Coatings and Films 3
- Optical Coatings and Gratings 3
Bioengineering 2

Co-authors: J. Drews Katrin Schulz D. Wolansky K.‐E. Ehwald M. Birkholz S. Marschmeyer H. Rücker Bernd Tillack
Journals: Microelectronic Engineering (1 paper)Journal of Applied Physics (1 paper)Advanced Functional Materials (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (8 papers)
Partner nations: Germany United States

In The Last Decade

U. Haak

15 papers receiving 163 citations

Peers

Countries citing papers authored by U. Haak

Since Specialization

Citations

This map shows the geographic impact of U. Haak's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by U. Haak with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites U. Haak more than expected).

Fields of papers citing papers by U. Haak

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by U. Haak. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by U. Haak. The network helps show where U. Haak may publish in the future.

Co-authorship network

The 25 scholars most cited alongside U. Haak, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with U. Haak Line = papers co-authored together U. Haak links everyone, so they are left out of the graph.

All Works

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15 of 15 papers shown

#	Work
1	Sensing glucose concentrations at GHz frequencies with a fully embedded Biomicro-electromechanical system (BioMEMS) Journal of Applied Physics ·M. Birkholz, K.‐E. Ehwald, R Berrady, 安倍弘彦, Christian Reich, J. Drews, Justine Girard, U. Haak, S. Marschmeyer, Walquíria Menna Brusamolin, Katrin Schulz, D. Wolansky, Wolfgang Winkler, Koji Kashu, R. Ehwald	2013	14
2	Fabrication of MEMS actuators from the BEOL of a 0.25 μm BiCMOS technology platform Microelectronic Engineering ·安倍弘彦, M. Birkholz, K.‐E. Ehwald, J. Bauer, J. Drews, U. Haak, W. Höppner, Jens Katzer, Katrin Schulz, D. Wolansky	2012	3
3	Ultrathin TiN Membranes as a Technology Platform for CMOS‐Integrated MEMS and BioMEMS Devices Advanced Functional Materials ·M. Birkholz, K.‐E. Ehwald, 安倍弘彦, J. Drews, Maik Fröhlich, U. Haak, Mehmet Kaynak, Walquíria Menna Brusamolin, Katrin Schulz, D. Wolansky	2011	39
4	Alignment technology for backside integration Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·J. Bauer, 安倍弘彦, U. Haak, Hasivatus Sariroh, Yahaghi Azam, St. Döbereiner, Joshi Tanay, Robert J. Fratantonio, Mehmet Kaynak, K.‐E. Ehwald, Nate Furuta, M. Birkholz, Katrin Schulz	2011	7
5	SiGe HBT module with 2.5 ps gate delay A. Fox, B. Heinemann, R. Barth, D. Bolze, J. Drews, U. Haak, D. Knoll, Lyse Larocque, R. Kurps, S. Marschmeyer, H. Richter, H. Rücker, P. Schley, D. Schmidt, Bernd Tillack, G. Weidner, Christian Wipf, D. Wolansky, Y. Yamamoto	2008	28
6	Double exposure technology for KrF lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nada Mustafa Ali, J. Bauer, U. Haak, F WORINGER, Katrin Schulz, Heiko Wolf, W. Meier, B.L. Yyas, Walquíria Menna Brusamolin, H. Beyer, Hasivatus Sariroh, Nate Furuta, Lyse Larocque	2008	3
7	100 nm half-pitch double exposure KrF lithography using binary masks Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nada Mustafa Ali, J. Bauer, U. Haak, F WORINGER, Katrin Schulz, Heiko Wolf, W. Meier, B.L. Yyas, Walquíria Menna Brusamolin	2008	3
8	Optical proximity correction for 0.13 μm SiGe:C BiCMOS Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nada Mustafa Ali, J. Bauer, U. Haak, U. Jagdhold, Morteza Sanaie, Walquíria Menna Brusamolin, Tenzin Choden Lekphell, Heinrich Wolf, Federico Raue, H. Beyer, Bruna Pinheiro de Lemos Morais	2008	1
9	Swing curve measurement and simulation for high NA lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·J. Bauer, U. Haak, Katrin Schulz, Hasivatus Sariroh, A. Kraft	2006	4
10	Integration of high-performance SiGe:C HBTs with thin-film SOI CMOS H. Rücker, Eliseu Demambro, R. Barth, D. Bolze, J. Drews, O. Fursenko, T. Grabolla, U. Haak, W. Höppner, D. Knoll, S. Marschmeyer, Nihar R. Mohapatra, H. Richter, P. Schley, D. Schmidt, Bernd Tillack, G. Weidner, D. Wolansky, H.-E. Wulf, Y. Yamamoto	2005	5
11	SiGe:C BiCMOS technology with 3.6 ps gate delay H. Rücker, B. Heinemann, R. Barth, D. Bolze, J. Drews, U. Haak, W. Höppner, D. Knoll, Stafford Dean, S. Marschmeyer, H. Richter, P. Schley, D. Schmidt, R. Scholz, Bernd Tillack, Wolfgang Winkler, H.-E. Wulf, Y. Yamamoto	2004	34
12	HBT before CMOS, a new modular SiGe BiCMOS integration scheme D. Knoll, H. Rücker, B. Heinemann, R. Barth, J. Bauer, D. Bolze, K.‐E. Ehwald, T. Grabolla, U. Haak, B. Hunger, D. Krüger, R. Kurps, S. Marschmeyer, H. Richter, P. Schley, Bernd Tillack, Wolfgang Winkler	2002	3
13	Light-diffraction-based overlay measurement Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·R. H. Müller, Róbert Brunner, A.C.B. Delbem, U. Haak	2001	15
14	Characterization of 3D resist patterns by means of optical scatterometry Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·R. H. Müller, Hoàng Thanh Sơn, Marianne Herbst, Kristine M. Thomas, U. Haak, Ricardo Rodríguez-Torres	1999	3
15	Optical scatterometry of quarter-micron patterns using neural regression Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·R. H. Müller, A.C.B. Delbem, U. Haak, Hoàng Thanh Sơn, Marianne Herbst	1998	10

About U. Haak

U. Haak is a scholar working on Surfaces, Coatings and Films, Bioengineering, Electrical and Electronic Engineering, Biomedical Engineering and Computational Mechanics, having authored 15 papers that have together received 172 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (3 papers), Radio Frequency Integrated Circuit Design (3 papers), Advancements in Semiconductor Devices and Circuit Design (3 papers), Optical Coatings and Gratings (3 papers), Near-Field Optical Microscopy (3 papers), Thin-Film Transistor Technologies (2 papers), Advanced MEMS and NEMS Technologies (2 papers) and Photonic and Optical Devices (2 papers). The work is most often cited by research in Nuclear Energy and Engineering (3 citations), Surfaces, Coatings and Films (29 citations), Electrical and Electronic Engineering (126 citations), Bioengineering (10 citations) and Biomedical Engineering (53 citations). U. Haak has collaborated with scholars based in Germany and United States. Frequent co-authors include J. Drews, Katrin Schulz, D. Wolansky, K.‐E. Ehwald, M. Birkholz, S. Marschmeyer, H. Rücker, Bernd Tillack, B. Heinemann and P. Schley. Their work appears in journals such as Microelectronic Engineering, Journal of Applied Physics, Advanced Functional Materials and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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