Eugene J. Karwacki

469 total citations
24 papers, 394 citations indexed

About

Eugene J. Karwacki is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry. According to data from OpenAlex, Eugene J. Karwacki has authored 24 papers receiving a total of 394 indexed citations (citations by other indexed papers that have themselves been cited), including 15 papers in Electrical and Electronic Engineering, 9 papers in Electronic, Optical and Magnetic Materials and 8 papers in Materials Chemistry. Recurrent topics in Eugene J. Karwacki's work include Semiconductor materials and devices (11 papers), Copper Interconnects and Reliability (9 papers) and Metal and Thin Film Mechanics (7 papers). Eugene J. Karwacki is often cited by papers focused on Semiconductor materials and devices (11 papers), Copper Interconnects and Reliability (9 papers) and Metal and Thin Film Mechanics (7 papers). Eugene J. Karwacki collaborates with scholars based in United States, Taiwan and China. Eugene J. Karwacki's co-authors include Michael Langsam, Madhu Anand, Bing Ji, Manchao Xiao, Mark L. O’Neill, Xinjian Lei, Hansong Cheng, J. Yang, Nicholas Winograd and Jinping Wu and has published in prestigious journals such as Journal of the American Chemical Society, Journal of Applied Physics and Analytical Chemistry.

In The Last Decade

Eugene J. Karwacki

23 papers receiving 375 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Eugene J. Karwacki United States 11 275 194 70 66 61 24 394
G. Beshkov Bulgaria 11 240 0.9× 254 1.3× 32 0.5× 31 0.5× 102 1.7× 49 406
Luca Nobili Italy 16 386 1.4× 333 1.7× 50 0.7× 87 1.3× 120 2.0× 51 634
Seth T. Taylor United States 11 103 0.4× 202 1.0× 34 0.5× 50 0.8× 39 0.6× 25 372
Jonathan D. P. Counsell United Kingdom 12 158 0.6× 226 1.2× 31 0.4× 43 0.7× 35 0.6× 21 381
Felix Mitschker Germany 15 332 1.2× 247 1.3× 95 1.4× 19 0.3× 113 1.9× 33 483
V.A. Nalimova Russia 14 288 1.0× 425 2.2× 37 0.5× 95 1.4× 21 0.3× 45 593
Hua-Gen Peng United States 6 116 0.4× 162 0.8× 75 1.1× 56 0.8× 214 3.5× 9 416
P. Premkumar India 11 200 0.7× 164 0.8× 63 0.9× 29 0.4× 46 0.8× 22 345
S. K. Gordeev Russia 13 178 0.6× 526 2.7× 129 1.8× 131 2.0× 76 1.2× 63 698
Alok Awasthi India 9 124 0.5× 145 0.7× 28 0.4× 140 2.1× 43 0.7× 15 357

Countries citing papers authored by Eugene J. Karwacki

Since Specialization
Citations

This map shows the geographic impact of Eugene J. Karwacki's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Eugene J. Karwacki with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Eugene J. Karwacki more than expected).

Fields of papers citing papers by Eugene J. Karwacki

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Eugene J. Karwacki. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Eugene J. Karwacki. The network helps show where Eugene J. Karwacki may publish in the future.

Co-authorship network of co-authors of Eugene J. Karwacki

This figure shows the co-authorship network connecting the top 25 collaborators of Eugene J. Karwacki. A scholar is included among the top collaborators of Eugene J. Karwacki based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Eugene J. Karwacki. Eugene J. Karwacki is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Han, Bo, Qingfan Zhang, Jinping Wu, et al.. (2011). On the Mechanisms of SiO2 Thin-Film Growth by the Full Atomic Layer Deposition Process Using Bis(t-butylamino)silane on the Hydroxylated SiO2(001) Surface. The Journal of Physical Chemistry C. 116(1). 947–952. 48 indexed citations
3.
Karwacki, Eugene J., et al.. (2007). Electron Attachment: A New Approach to ${\rm H} _{2}$ Fluxless Solder Reflow for Wafer Bumping. IEEE Transactions on Advanced Packaging. 30(3). 485–490. 2 indexed citations
4.
Cheng, Yi-Lung, et al.. (2007). Organofluorosilicate glass: A dense low-k dielectric with superior materials properties. Journal of Physics and Chemistry of Solids. 69(2-3). 518–522. 4 indexed citations
5.
O’Neill, Mark L., Brian K. Peterson, Raymond N. Vrtis, et al.. (2006). Impact of Pore Size and Morphology of Porous Organosilicate Glasses on Integrated Circuit Manufacturing. MRS Proceedings. 914. 9 indexed citations
6.
Zhuang, Hong, et al.. (2006). The effects of etch chemistry on the etch rates of ArF BARC products. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61530N–61530N. 3 indexed citations
8.
Ji, Bing, et al.. (2004). Optimization and analysis of NF3 in situ chamber cleaning plasmas. Journal of Applied Physics. 95(8). 4452–4462. 20 indexed citations
9.
Ji, Bing, et al.. (2004). Power dependence of NF3 plasma stability for in situ chamber cleaning. Journal of Applied Physics. 95(8). 4446–4451. 13 indexed citations
10.
Li, Xi, Xuefeng Hua, Ling Li, et al.. (2004). Surface chemical changes of aluminum during NF3-based plasma processing used for in situ chamber cleaning. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 22(1). 158–164. 19 indexed citations
11.
O’Neill, Mark L., et al.. (2003). Optimized Materials Properties for Organosilicate Glasses Produced by Plasma-Enhanced Chemical Vapor Deposition. MRS Proceedings. 766. 6 indexed citations
12.
Benck, Eric C., et al.. (2003). Submillimeter-wavelength plasma chemical diagnostics for semiconductor manufacturing. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 21(5). 2067–2075. 3 indexed citations
13.
Vrtis, Raymond N., et al.. (2003). Plasma Enhanced Chemical Vapor Deposition of Porous Organosilicate Glass ILD Films With k ≤ 2.4.. MRS Proceedings. 766. 10 indexed citations
14.
McGrath, R.T., et al.. (2001). Ion energy distributions and optical emission spectra in NF3-based process chamber cleaning plasmas. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(4). 1346–1357. 30 indexed citations
15.
Karwacki, Eugene J., et al.. (1993). Measuring the depth of fluorine incorporation in high and low density polyethylene by Rutherford backscattering spectrometry. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 11(3). 514–520. 1 indexed citations
16.
Cabrerα, A.L., Eugene J. Karwacki, & J. F. Kirner. (1990). Surface analysis of copper, brass, and steel foils exposed to fluorine containing atmospheres. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 8(6). 3988–3996. 1 indexed citations
17.
Kirner, J. F., et al.. (1988). Surface analysis of austenitic stainless steel annealed in N2-H2 atmospheres. Applied Surface Science. 32(1-2). 239–245. 6 indexed citations
18.
Kirner, J. F., et al.. (1988). Inhibition of nitrogen uptake by SiO2 surface films formed on stainless steel during annealing in H2/N2 atmospheres. Metallurgical Transactions A. 19(12). 3045–3055. 6 indexed citations
19.
Karwacki, Eugene J. & Nicholas Winograd. (1986). A secondary ion mass spectrometry study of the catalytic oxidation of methanol on Cu(110). Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 4(3). 1433–1436. 3 indexed citations
20.
Moon, Dae Won, et al.. (1983). Angle-resolved SIMS studies of organic monolayers on the silver (111) surface. Journal of the American Chemical Society. 105(9). 2916–2917. 11 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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