Timothy J. Leedham

1.0k total citations
43 papers, 860 citations indexed

About

Timothy J. Leedham is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Catalysis. According to data from OpenAlex, Timothy J. Leedham has authored 43 papers receiving a total of 860 indexed citations (citations by other indexed papers that have themselves been cited), including 32 papers in Electrical and Electronic Engineering, 31 papers in Materials Chemistry and 6 papers in Catalysis. Recurrent topics in Timothy J. Leedham's work include Semiconductor materials and devices (25 papers), Ferroelectric and Piezoelectric Materials (16 papers) and Electronic and Structural Properties of Oxides (12 papers). Timothy J. Leedham is often cited by papers focused on Semiconductor materials and devices (25 papers), Ferroelectric and Piezoelectric Materials (16 papers) and Electronic and Structural Properties of Oxides (12 papers). Timothy J. Leedham collaborates with scholars based in United Kingdom, France and United States. Timothy J. Leedham's co-authors include Anthony C. Jones, Hywel O. Davies, Michael J. Crosbie, P.J. Wright, Paul O’Brien, Paul A. Williams, Alexander Steiner, D.J. Williams, J.F. Bickley and D.B. Powell and has published in prestigious journals such as Journal of Materials Chemistry, Journal of the American Ceramic Society and Thin Solid Films.

In The Last Decade

Timothy J. Leedham

43 papers receiving 839 citations

Peers

Timothy J. Leedham
Hywel O. Davies United Kingdom
A.P. Milanov Germany
Hee Jin Kim South Korea
Thomas Webb United Kingdom
H. Hau Wang United States
Timothy J. Leedham
Citations per year, relative to Timothy J. Leedham Timothy J. Leedham (= 1×) peers A. Maisonnat

Countries citing papers authored by Timothy J. Leedham

Since Specialization
Citations

This map shows the geographic impact of Timothy J. Leedham's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Timothy J. Leedham with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Timothy J. Leedham more than expected).

Fields of papers citing papers by Timothy J. Leedham

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Timothy J. Leedham. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Timothy J. Leedham. The network helps show where Timothy J. Leedham may publish in the future.

Co-authorship network of co-authors of Timothy J. Leedham

This figure shows the co-authorship network connecting the top 25 collaborators of Timothy J. Leedham. A scholar is included among the top collaborators of Timothy J. Leedham based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Timothy J. Leedham. Timothy J. Leedham is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kawasaki, S., et al.. (2008). Concentric Metallic-Piezoelectric Microtube Arrays. MRS Proceedings. 1071. 9 indexed citations
2.
Miyake, Masato, Xiaojie Lou, Ming Zhang, et al.. (2005). HIGH-TEMPERATURE AMORPHOUS HAFNIA (HfO2) FOR MICROELECTRONICS. Integrated ferroelectrics. 74(1). 165–172. 3 indexed citations
3.
Jiménez, Carmen, M. Audier, J.P. Sénateur, et al.. (2005). Electrical characterization of HfO2 films obtained by UV assisted injection MOCVD. Microelectronics Reliability. 45(5-6). 929–932. 1 indexed citations
4.
Ehrhart, P., Rainer Waser, Jiaqing He, et al.. (2003). Comparison of Hafnium Precursors for the MOCVD of HfO2 for Gate Dielectric Applications. Integrated ferroelectrics. 57(1). 1163–1173. 7 indexed citations
6.
Matero, Raija, Mikko Ritala, Markku Leskelä, et al.. (2002). Atomic layer deposition of ZrO2 thin films using a new alkoxide precursor. Journal of Non-Crystalline Solids. 303(1). 24–28. 41 indexed citations
7.
Wright, P.J., Michael J. Crosbie, P.A. Lane, et al.. (2002). Metal organic chemical vapor deposition (MOCVD) of oxides and ferroelectric materials. Journal of Materials Science Materials in Electronics. 13(11). 671–678. 20 indexed citations
8.
Williams, Paul A., John L. Roberts, Anthony C. Jones, et al.. (2001). Novel mononuclear zirconium and hafnium alkoxides; improved precursors for the MOCVD of ZrO2 and HfO2. Journal of Materials Chemistry. 12(2). 165–167. 45 indexed citations
9.
Leedham, Timothy J., Anthony C. Jones, Hywel O. Davies, et al.. (2001). Improved precursors for the mocvd of sbt, sbn and sbtn. Integrated ferroelectrics. 36(1-4). 111–118. 2 indexed citations
10.
Davies, Hywel O., Anthony C. Jones, Paul O’Brien, et al.. (2000). ChemInform Abstract: Developing the Chemistry of Novel Scandium β‐Diketonates for the MOCVD of Scandium‐Containing Oxides.. ChemInform. 31(7). 1 indexed citations
11.
Crosbie, Michael J., P.J. Wright, D.J. Williams, et al.. (1999). Comparison of tantalum precursors for use in liquid injection CVD of thin film oxides, dielectrics and ferroelectrics. Journal de Physique IV (Proceedings). 9(PR8). Pr8–935. 7 indexed citations
12.
Jones, Anthony C., Timothy J. Leedham, P.J. Wright, et al.. (1999). Metalorganic chemical vapour deposition (MOCVD) of zirconia and lead zirconate titanate using a novel zirconium precursor. Journal of the European Ceramic Society. 19(6-7). 1431–1434. 21 indexed citations
13.
Crosbie, Michael J., P.J. Wright, Hywel O. Davies, et al.. (1999). MOCVD of Strontium Tantalate Thin Films Using Novel Bimetallic Alkoxide Precursors. Chemical Vapor Deposition. 5(1). 9–12. 41 indexed citations
14.
Davies, Hywel O., Timothy J. Leedham, Anthony C. Jones, et al.. (1999). Some tantalum(V) β-diketonate and tantalum(V) aminoalcoholate derivatives potentially important in the deposition of tantalum-containing materials. Polyhedron. 18(24). 3165–3172. 19 indexed citations
15.
Jones, Anthony C., Timothy J. Leedham, P.J. Wright, et al.. (1999). The control of growth dynamics by the use of designed precursors for the MOCVD of electronic ceramics. Materials Science in Semiconductor Processing. 2(2). 165–171. 5 indexed citations
16.
Leedham, Timothy J., Anthony C. Jones, P.J. Wright, et al.. (1999). Novel precursors for the MOCVD of ferroelectric thin films. Integrated ferroelectrics. 26(1-4). 85–92. 3 indexed citations
17.
Jones, Anthony C., Timothy J. Leedham, P.J. Wright, et al.. (1998). Synthesis and characterisation of two novel titanium isopropoxides stabilised with a chelating alkoxide: their use in the liquid injection MOCVD of titanium dioxide thin films. Journal of Materials Chemistry. 8(8). 1773–1777. 68 indexed citations
18.
Jones, Anthony C., Timothy J. Leedham, P.J. Wright, et al.. (1998). Liquid Injection MOCVD of Zirconium Dioxide Using a Novel Mixed Ligand Zirconium Precursor. Chemical Vapor Deposition. 4(5). 197–201. 26 indexed citations
19.
Jones, Anthony C., Timothy J. Leedham, P.J. Wright, et al.. (1997). Control of Growth Dynamics by Molecular Design in the MOCVD of Electronic Ceramics. MRS Proceedings. 495. 24 indexed citations
20.
Powell, D.B. & Timothy J. Leedham. (1972). Infrared and Raman spectra of 1,5-cyclooctadiene complexes of rhodium, palladium and platinum. Spectrochimica Acta Part A Molecular Spectroscopy. 28(2). 337–341. 33 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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