R. Wisnieff

688 total citations
22 papers, 386 citations indexed

About

R. Wisnieff is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, R. Wisnieff has authored 22 papers receiving a total of 386 indexed citations (citations by other indexed papers that have themselves been cited), including 18 papers in Electrical and Electronic Engineering, 5 papers in Electronic, Optical and Magnetic Materials and 3 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in R. Wisnieff's work include Copper Interconnects and Reliability (5 papers), Electronic Packaging and Soldering Technologies (5 papers) and Semiconductor materials and devices (5 papers). R. Wisnieff is often cited by papers focused on Copper Interconnects and Reliability (5 papers), Electronic Packaging and Soldering Technologies (5 papers) and Semiconductor materials and devices (5 papers). R. Wisnieff collaborates with scholars based in United States, Switzerland and Japan. R. Wisnieff's co-authors include R. G. Wheeler, Keunsu Choi, Alpana Goel, D. E. Prober, R. Polastre, Christos Dimitrakopoulos, A. Grill, Zihong Liu, D.A. Antoniadis and John J. Ritsko and has published in prestigious journals such as Nature, Physical Review Letters and Applied Physics Letters.

In The Last Decade

R. Wisnieff

21 papers receiving 370 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
R. Wisnieff United States 11 261 159 107 69 31 22 386
Sylvain Maine France 9 227 0.9× 104 0.7× 125 1.2× 117 1.7× 18 0.6× 15 335
Baoxue Bo China 10 361 1.4× 215 1.4× 156 1.5× 47 0.7× 14 0.5× 80 422
Giacomo Ulisse Germany 11 271 1.0× 200 1.3× 113 1.1× 46 0.7× 18 0.6× 51 380
Shuichi Uchikoga Japan 9 314 1.2× 45 0.3× 238 2.2× 113 1.6× 32 1.0× 30 416
Ming-ta Hsieh United States 9 475 1.8× 104 0.7× 174 1.6× 87 1.3× 17 0.5× 23 529
R. Murali United States 10 208 0.8× 102 0.6× 264 2.5× 91 1.3× 11 0.4× 20 381
Chun‐Yen Chang Taiwan 13 466 1.8× 70 0.4× 202 1.9× 72 1.0× 57 1.8× 63 515
Ariela Donval Israel 10 189 0.7× 94 0.6× 63 0.6× 75 1.1× 37 1.2× 36 321
Tomonori Yamaoka Japan 10 314 1.2× 56 0.4× 125 1.2× 44 0.6× 7 0.2× 17 357
V.K. Ksenevich Belarus 9 110 0.4× 94 0.6× 212 2.0× 66 1.0× 45 1.5× 39 307

Countries citing papers authored by R. Wisnieff

Since Specialization
Citations

This map shows the geographic impact of R. Wisnieff's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. Wisnieff with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. Wisnieff more than expected).

Fields of papers citing papers by R. Wisnieff

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by R. Wisnieff. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. Wisnieff. The network helps show where R. Wisnieff may publish in the future.

Co-authorship network of co-authors of R. Wisnieff

This figure shows the co-authorship network connecting the top 25 collaborators of R. Wisnieff. A scholar is included among the top collaborators of R. Wisnieff based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with R. Wisnieff. R. Wisnieff is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Pyzyna, A., et al.. (2012). Interconnect Material Choices for Future Scaled Devices. 1 indexed citations
2.
Lin, Qinghuang, Alshakim Nelson, Luisa Bozano, et al.. (2011). Extending photo-patternable low-κ concept to 193nm lithography and e-beam lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7972. 79721A–79721A. 3 indexed citations
3.
Dimitrakopoulos, Christos, et al.. (2011). Effect of SiC wafer miscut angle on the morphology and Hall mobility of epitaxially grown graphene. Applied Physics Letters. 98(22). 36 indexed citations
4.
Chu, Jack O., Yu Zhu, Zihong Liu, et al.. (2011). Multilayer epitaxial graphene formed by pyrolysis of polycrystalline silicon-carbide grown on c-plane sapphire substrates. Applied Physics Letters. 98(13). 13 indexed citations
5.
Lin, Qinghuang, Alshakim Nelson, P. J. Brock, et al.. (2010). Multilevel integration of patternable low-κ material into advanced Cu BEOL. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7639. 76390J–76390J. 2 indexed citations
6.
Edelstein, D., Kaushik Chanda, E. Liniger, et al.. (2009). Integration and reliability of CVD Ru cap for Cu/Low-k development. 255–257. 3 indexed citations
7.
Rossnagel, S. M., R. Wisnieff, D. Edelstein, & T. S. Kuan. (2006). Interconnect issues post 45nm. 89–91. 12 indexed citations
8.
Delamarche, Emmanuel, Matthias Geißler, W. S. Graham, et al.. (2003). Electroless Deposition of NiB on 15 Inch Glass Substrates for the Fabrication of Transistor Gates for Liquid Crystal Displays. Langmuir. 19(14). 5923–5935. 35 indexed citations
9.
Howard, W. E., P.M. Alt, & R. Wisnieff. (2003). Eliminating crosstalk in thin film transistor/liquid crystal displays. 230–235.
10.
Troutman, R.R., L. C. Jenkins, R. Polastre, & R. Wisnieff. (2002). Characterization of TFT/LCD arrays. 231–234. 2 indexed citations
11.
Wisnieff, R.. (1998). Printing screens. Nature. 394(6690). 225–227. 71 indexed citations
12.
Fryer, P. M., E. G. Colgan, E. Galligan, et al.. (1998). High Conductivity Gate Metallurgy for TFT/LCD's. MRS Proceedings. 508. 1 indexed citations
13.
Colgan, E. G., et al.. (1998). Thin-film-transistor process-characterization test structures. IBM Journal of Research and Development. 42(3.4). 481–490. 7 indexed citations
14.
Fryer, P. M., E. G. Colgan, E. Galligan, et al.. (1997). A six‐mask TFT‐LCD process using copper‐gate metallurgy. Journal of the Society for Information Display. 5(1). 49–52. 12 indexed citations
15.
Jenkins, L. C., R. Polastre, R.R. Troutman, & R. Wisnieff. (1992). Functional testing of TFT/LCD arrays. IBM Journal of Research and Development. 36(1). 59–68. 18 indexed citations
16.
Howard, W. E., P.M. Alt, & R. Wisnieff. (1989). Eliminating crosstalk in thin-film transistor/liquid-crystal displays. IEEE Transactions on Electron Devices. 36(9). 1938–1942. 5 indexed citations
17.
Wisnieff, R.. (1988). Line delay and capacitive crosstalk effects in TFT/LCDs. Information Display. 29(2). 173–178. 3 indexed citations
18.
Lustig, N., et al.. (1988). Temperature Dependent Characteristics of Hydrogenated Amorphous Silicon thin film Transistors. MRS Proceedings. 118. 21 indexed citations
19.
Wheeler, R. G., Keunsu Choi, & R. Wisnieff. (1984). Quasi-one-dimensional effects in submicron width silicon inversion layers. Surface Science. 142(1-3). 19–24. 21 indexed citations
20.
Wheeler, R. G., Keunsu Choi, Alpana Goel, R. Wisnieff, & D. E. Prober. (1982). Localization and Electron-Electron Interaction Effects in Submicron-Width Inversion Layers. Physical Review Letters. 49(22). 1674–1677. 103 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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