Yue Kuo

3.1k total citations
240 papers, 2.4k citations indexed

About

Yue Kuo is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Yue Kuo has authored 240 papers receiving a total of 2.4k indexed citations (citations by other indexed papers that have themselves been cited), including 217 papers in Electrical and Electronic Engineering, 68 papers in Materials Chemistry and 42 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Yue Kuo's work include Semiconductor materials and devices (159 papers), Thin-Film Transistor Technologies (71 papers) and Ferroelectric and Negative Capacitance Devices (47 papers). Yue Kuo is often cited by papers focused on Semiconductor materials and devices (159 papers), Thin-Film Transistor Technologies (71 papers) and Ferroelectric and Negative Capacitance Devices (47 papers). Yue Kuo collaborates with scholars based in United States, Taiwan and China. Yue Kuo's co-authors include Jiang Lu, Way Kuo, Chen-Han Lin, Sangheon Lee, Tao Yuan, Shumao Zhang, Somenath Chatterjee, Wen Luo, J.X. Lu and B. Schueler and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Proceedings of the IEEE.

In The Last Decade

Yue Kuo

222 papers receiving 2.3k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Yue Kuo United States	26	2.0k	867	349	253	203	240	2.4k
M. Cantoni Italy	21	464 0.2×	775 0.9×	662 1.9×	293 1.2×	38 0.2×	91	1.7k
Yasuaki Ishikawa Japan	27	2.2k 1.1×	1.2k 1.4×	187 0.5×	332 1.3×	66 0.3×	265	2.7k
Sławomir Prucnal Germany	25	1.5k 0.7×	1.4k 1.6×	317 0.9×	378 1.5×	134 0.7×	193	2.2k
Ming Feng China	29	1.7k 0.8×	986 1.1×	561 1.6×	366 1.4×	230 1.1×	172	2.8k
Qing Zhong China	16	763 0.4×	2.0k 2.3×	136 0.4×	123 0.5×	45 0.2×	105	2.5k
Ming Niu China	20	612 0.3×	626 0.7×	378 1.1×	300 1.2×	113 0.6×	72	1.3k
Hsun‐Jen Chuang United States	23	1.8k 0.9×	2.7k 3.1×	203 0.6×	472 1.9×	23 0.1×	67	3.3k
Ho Seong Lee South Korea	29	1.2k 0.6×	1.8k 2.0×	375 1.1×	141 0.6×	40 0.2×	164	2.5k
Thierry Lebey France	26	1.5k 0.7×	1.7k 2.0×	378 1.1×	564 2.2×	69 0.3×	147	2.4k
Olga Casals Spain	24	1.3k 0.6×	681 0.8×	79 0.2×	772 3.1×	263 1.3×	79	1.9k

Countries citing papers authored by Yue Kuo

Since Specialization

Citations

This map shows the geographic impact of Yue Kuo's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Yue Kuo with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Yue Kuo more than expected).

Fields of papers citing papers by Yue Kuo

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Yue Kuo. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Yue Kuo. The network helps show where Yue Kuo may publish in the future.

Co-authorship network of co-authors of Yue Kuo

This figure shows the co-authorship network connecting the top 25 collaborators of Yue Kuo. A scholar is included among the top collaborators of Yue Kuo based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Yue Kuo. Yue Kuo is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Geng, Di, Ling Li, Kris Myny, et al.. (2023). Thin-film transistors for large-area electronics. Nature Electronics. 6(12). 963–972. 82 indexed citations

Kuo, Yue, et al.. (2022). Plasma oxidation as an effective method in etching copper interconnect lines at room-temperature. Japanese Journal of Applied Physics. 61(3). 30902–30902. 2 indexed citations

Kuo, Yue. (2022). (Invited) Oxide TFT Applications: Principles and Challenges. ECS Transactions. 109(6). 137–144. 1 indexed citations

Kuo, Yue, et al.. (2021). Layer Thickness Effect on Lifetime of Copper Oxide Passivated Plasma Etched Copper Line. ECS Transactions. 102(2). 167–175. 1 indexed citations

Kuo, Yue, et al.. (2021). Electrical and Optical Characteristics of SSI-LED Made from Capacitor Containing Tri-Layer WO _x Embedded Zr-Doped HfO _x Gate Dielectric. ECS Journal of Solid State Science and Technology. 10(12). 126001–126001. 1 indexed citations

Kuo, Yue, et al.. (2020). Metal Capping Layer Effects on Electromigration Failure Phenomena of Plasma Etched Copper Lines. ECS Journal of Solid State Science and Technology. 9(10). 104009–104009. 2 indexed citations

Kuo, Yue, et al.. (2020). Study of Electrothermal Characteristics and Emitted Light Characteristics of SSI-LED. ECS Journal of Solid State Science and Technology. 9(6). 65017–65017.

Wang, Yaogong, et al.. (2020). Si Wafer Dopant Concentration Effect on Light Emission of Solid State Incandescent Light Emitting Devices. ECS Journal of Solid State Science and Technology. 9(3). 36004–36004. 1 indexed citations

Kuo, Yue, et al.. (2014). Factors Affecting Light Emission from Solid State Incandescent Light Emitting Devices with Sputter Deposited Zr-Doped HfO₂Thin Films. ECS Journal of Solid State Science and Technology. 3(10). Q182–Q189. 11 indexed citations

10.

Kuo, Yue, et al.. (2012). Polycrystalline Silicon Thin Film Formed By Multiple Pulsed Rapid Thermal Annealing – Intrinsic a-Si Film Thickness Effect. MRS Proceedings. 1426. 269–274.

11.

Kuo, Yue, et al.. (2011). Temperature Effects on Charge Transfer Mechanisms of nc-ITO Embedded ZrHfO High-k Nonvolatile Memory Devices. MRS Proceedings. 1337. 2 indexed citations

12.

Lin, Chen-Han & Yue Kuo. (2010). Nonvolatile Memories with Dual-Layer Nanocrystalline ZnO Embedded Zr-Doped HfO[sub 2] High-k Dielectric. Electrochemical and Solid-State Letters. 13(3). H83–H83. 17 indexed citations

13.

Kuo, Yue. (2006). Mixed Oxide High-k Gate Dielectrics - Interface Layer Structure, Breakdown Mechanism, and Memories. ECS Transactions. 3(3). 253–263. 17 indexed citations

14.

Kuo, Yue. (2005). Thin Film Transistor Technologies (TFTT VII) : proceedings of the international symposium. Electrochemical Society eBooks. 1 indexed citations

15.

Kuo, Yue, et al.. (2005). Influence of a 5 A Tantalum Nitride Interface Layer on Dielectric Properties of Zirconium-Doped Tantalum Oxide High-k Films. Journal of The Electrochemical Society. 152(8). G617–G617. 8 indexed citations

16.

Kuo, Yue. (2004). Amorphous silicon thin film transistors. Kluwer Academic eBooks. 14 indexed citations

17.

Lu, J.X., et al.. (2004). Effects of the TaNx interface layer on doped tantalum oxide high-k films. Vacuum. 74(3-4). 539–547. 9 indexed citations

18.

Kuo, Yue. (2001). Thin Film Transistor Technologies V : proceedings of the International Symposium. Electrochemical Society eBooks. 1 indexed citations

19.

Kuo, Yue. (1995). Proceedings of the Second Symposium on Thin Film Transistor Technologies. Electrochemical Society eBooks. 4 indexed citations

20.

Kuo, Yue. (1993). Etch mechanism in the low refractive index silicon nitride plasma-enhanced chemical vapor deposition process. Applied Physics Letters. 63(2). 144–146. 29 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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