M. F. Doemling

512 total citations
8 papers, 455 citations indexed

About

M. F. Doemling is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Biomedical Engineering. According to data from OpenAlex, M. F. Doemling has authored 8 papers receiving a total of 455 indexed citations (citations by other indexed papers that have themselves been cited), including 8 papers in Electrical and Electronic Engineering, 4 papers in Electronic, Optical and Magnetic Materials and 2 papers in Biomedical Engineering. Recurrent topics in M. F. Doemling's work include Plasma Diagnostics and Applications (5 papers), Copper Interconnects and Reliability (4 papers) and Semiconductor materials and devices (4 papers). M. F. Doemling is often cited by papers focused on Plasma Diagnostics and Applications (5 papers), Copper Interconnects and Reliability (4 papers) and Semiconductor materials and devices (4 papers). M. F. Doemling collaborates with scholars based in United States. M. F. Doemling's co-authors include G. S. Oehrlein, N. R. Rueger, M. Schaepkens, T. E. F. M. Standaert, JJ Beulens, J. M. Cook, B. E. E. Kastenmeier, P. J. Matsuo and R.A. Haring and has published in prestigious journals such as Applied Physics Letters, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and IBM Journal of Research and Development.

In The Last Decade

M. F. Doemling

8 papers receiving 445 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
M. F. Doemling United States	7	417	192	143	108	54	8	455
Hisataka Hayashi Japan	12	468 1.1×	158 0.8×	146 1.0×	109 1.0×	86 1.6×	40	505
Kazuo Nojiri Japan	9	377 0.9×	98 0.5×	148 1.0×	44 0.4×	54 1.0×	16	412
Shashank C. Deshmukh United States	7	277 0.7×	81 0.4×	166 1.2×	89 0.8×	35 0.6×	16	374
Satish D. Athavale United States	7	400 1.0×	91 0.5×	291 2.0×	63 0.6×	66 1.2×	10	487
D. Carl United States	11	324 0.8×	98 0.5×	114 0.8×	123 1.1×	40 0.7×	17	365
Karsten Arts Netherlands	12	488 1.2×	89 0.5×	366 2.6×	67 0.6×	36 0.7×	16	562
Xueyu Qian United States	11	301 0.7×	119 0.6×	83 0.6×	51 0.5×	55 1.0×	19	334
L. M. Ephrath United States	11	356 0.9×	68 0.4×	111 0.8×	37 0.3×	54 1.0×	16	400
Andrew S. Alimonda United States	8	404 1.0×	104 0.5×	189 1.3×	30 0.3×	54 1.0×	12	459
P. Kudláček Netherlands	11	436 1.0×	305 1.6×	373 2.6×	45 0.4×	20 0.4×	15	557

Countries citing papers authored by M. F. Doemling

Since Specialization

Citations

This map shows the geographic impact of M. F. Doemling's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. F. Doemling with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. F. Doemling more than expected).

Fields of papers citing papers by M. F. Doemling

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M. F. Doemling. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. F. Doemling. The network helps show where M. F. Doemling may publish in the future.

Co-authorship network of co-authors of M. F. Doemling

This figure shows the co-authorship network connecting the top 25 collaborators of M. F. Doemling. A scholar is included among the top collaborators of M. F. Doemling based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with M. F. Doemling. M. F. Doemling is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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8 of 8 papers shown

Doemling, M. F., et al.. (2000). Using a quartz crystal microbalance for low energy ion beam etching studies. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 18(1). 232–236. 11 indexed citations

Rueger, N. R., M. F. Doemling, M. Schaepkens, et al.. (1999). Selective etching of SiO 2 over polycrystalline silicon using CHF 3 in an inductively coupled plasma reactor. 17(5). 2492–2502. 1 indexed citations

Oehrlein, G. S., M. F. Doemling, B. E. E. Kastenmeier, et al.. (1999). Surface science issues in plasma etching. IBM Journal of Research and Development. 43(1.2). 181–197. 38 indexed citations

Rueger, N. R., M. F. Doemling, M. Schaepkens, et al.. (1999). Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 17(5). 2492–2502. 67 indexed citations

Doemling, M. F., N. R. Rueger, G. S. Oehrlein, & J. M. Cook. (1998). Photoresist erosion studied in an inductively coupled plasma reactor employing CHF3. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(4). 1998–2005. 39 indexed citations

Rueger, N. R., JJ Beulens, M. Schaepkens, et al.. (1997). Role of steady state fluorocarbon films in the etching of silicon dioxide using CHF3 in an inductively coupled plasma reactor. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 15(4). 1881–1889. 229 indexed citations

Doemling, M. F., N. R. Rueger, & G. S. Oehrlein. (1996). Observation of inverse reactive ion etching lag for silicon dioxide etching in inductively coupled plasmas. Applied Physics Letters. 68(1). 10–12. 43 indexed citations

Oehrlein, G. S., P. J. Matsuo, M. F. Doemling, et al.. (1996). Study of plasma - surface interactions: chemical dry etching and high-density plasma etching. Plasma Sources Science and Technology. 5(2). 193–199. 27 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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