JJ Beulens

927 total citations
24 papers, 814 citations indexed

About

JJ Beulens is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Materials Chemistry. According to data from OpenAlex, JJ Beulens has authored 24 papers receiving a total of 814 indexed citations (citations by other indexed papers that have themselves been cited), including 15 papers in Electrical and Electronic Engineering, 12 papers in Mechanics of Materials and 10 papers in Materials Chemistry. Recurrent topics in JJ Beulens's work include Plasma Diagnostics and Applications (13 papers), Diamond and Carbon-based Materials Research (10 papers) and Metal and Thin Film Mechanics (9 papers). JJ Beulens is often cited by papers focused on Plasma Diagnostics and Applications (13 papers), Diamond and Carbon-based Materials Research (10 papers) and Metal and Thin Film Mechanics (9 papers). JJ Beulens collaborates with scholars based in Netherlands, United States and France. JJ Beulens's co-authors include G. S. Oehrlein, P. J. Matsuo, B. E. E. Kastenmeier, N. R. Rueger, M. Schaepkens, T. E. F. M. Standaert, M. F. Doemling, D.C. Schram, D.C. Schram and Dragomir Milojevic and has published in prestigious journals such as Applied Physics Letters, Thin Solid Films and Journal of Applied Polymer Science.

In The Last Decade

JJ Beulens

24 papers receiving 792 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
JJ Beulens Netherlands 14 666 364 282 157 112 24 814
C. Boisse-Laporte France 20 849 1.3× 307 0.8× 261 0.9× 340 2.2× 56 0.5× 45 1.0k
S. Komiya Japan 17 403 0.6× 341 0.9× 326 1.2× 180 1.1× 83 0.7× 54 815
Sergey Zyryanov Russia 18 763 1.1× 389 1.1× 204 0.7× 98 0.6× 299 2.7× 50 863
A. Rhallabi France 14 634 1.0× 243 0.7× 269 1.0× 121 0.8× 56 0.5× 62 794
Shigeru Nishimatsu Japan 16 820 1.2× 131 0.4× 307 1.1× 187 1.2× 89 0.8× 36 918
Y. Arnal France 19 665 1.0× 348 1.0× 252 0.9× 148 0.9× 109 1.0× 40 844
Erik Johnson France 24 1.3k 2.0× 221 0.6× 533 1.9× 339 2.2× 50 0.4× 109 1.5k
Erik A. Edelberg United States 11 701 1.1× 226 0.6× 363 1.3× 96 0.6× 49 0.4× 11 770
Edward V. Barnat United States 13 425 0.6× 178 0.5× 298 1.1× 140 0.9× 15 0.1× 30 685
Tetsuya Tatsumi Japan 21 1.4k 2.0× 494 1.4× 416 1.5× 74 0.5× 310 2.8× 67 1.5k

Countries citing papers authored by JJ Beulens

Since Specialization
Citations

This map shows the geographic impact of JJ Beulens's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by JJ Beulens with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites JJ Beulens more than expected).

Fields of papers citing papers by JJ Beulens

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by JJ Beulens. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by JJ Beulens. The network helps show where JJ Beulens may publish in the future.

Co-authorship network of co-authors of JJ Beulens

This figure shows the co-authorship network connecting the top 25 collaborators of JJ Beulens. A scholar is included among the top collaborators of JJ Beulens based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with JJ Beulens. JJ Beulens is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Rueger, N. R., M. F. Doemling, M. Schaepkens, et al.. (1999). Selective etching of SiO 2 over polycrystalline silicon using CHF 3 in an inductively coupled plasma reactor. 17(5). 2492–2502. 1 indexed citations
2.
Schaepkens, M., N. R. Rueger, JJ Beulens, et al.. (1999). Effect of capacitive coupling on inductively coupled fluorocarbon plasma processing. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 17(6). 3272–3280. 26 indexed citations
3.
Koulidiati, J., A. Czernichowski, JJ Beulens, & D. C. Schram. (1998). Diagnostics of a Hydrocarbon Plasma Jet Using the A2Δ-X2Π System of CH. Acta Physica Polonica A. 94(1). 3–12. 2 indexed citations
4.
Rueger, N. R., JJ Beulens, M. Schaepkens, et al.. (1997). Role of steady state fluorocarbon films in the etching of silicon dioxide using CHF3 in an inductively coupled plasma reactor. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 15(4). 1881–1889. 229 indexed citations
5.
Oehrlein, G. S., P. J. Matsuo, M. F. Doemling, et al.. (1996). Study of plasma - surface interactions: chemical dry etching and high-density plasma etching. Plasma Sources Science and Technology. 5(2). 193–199. 27 indexed citations
6.
Beulens, JJ, B. E. E. Kastenmeier, P. J. Matsuo, & G. S. Oehrlein. (1995). Chemical downstream etching of silicon–nitride and polycrystalline silicon using CF4/O2/N2: Surface chemical effects of O2 and N2 additives. Applied Physics Letters. 66(20). 2634–2636. 25 indexed citations
7.
Beulens, JJ, et al.. (1994). Fast deposition of amorphous hydrogenated carbon and silicon layers. TU/e Research Portal (Eindhoven University of Technology). 54. 115. 1 indexed citations
8.
Beulens, JJ, et al.. (1994). Atomic and molecular emission spectroscopy on an expanding argon/methane plasma. Plasma Chemistry and Plasma Processing. 14(1). 15–42. 17 indexed citations
9.
Beulens, JJ, et al.. (1993). Axial temperatures and electron densities in a flowing cascaded arc: model versus experiment. Plasma Sources Science and Technology. 2(3). 180–189. 19 indexed citations
10.
Beulens, JJ, et al.. (1993). Fast deposition of amorphous carbon and silicon layers. Journal of Nuclear Materials. 200(3). 430–433. 11 indexed citations
11.
Beulens, JJ, et al.. (1992). Plasma deposited carbon films as a possible means for divertor repair. Thin Solid Films. 212(1-2). 282–296. 13 indexed citations
12.
Beulens, JJ, et al.. (1992). Fast silicon etching using an expanding cascade arc plasma in a SF6/argon mixture. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 2387–2392. 21 indexed citations
13.
Beulens, JJ, et al.. (1991). Radiative energy loss in a two-temperature argon plasma. Journal of Quantitative Spectroscopy and Radiative Transfer. 46(5). 385–392. 32 indexed citations
14.
Beulens, JJ, et al.. (1991). A two-dimensional nonequilibrium model of cascaded arc plasma flows. Physics of Fluids B Plasma Physics. 3(9). 2548–2557. 74 indexed citations
15.
Beulens, JJ, et al.. (1991). Carbon deposition using an expanding cascaded arc d.c. plasma. Surface and Coatings Technology. 47(1-3). 401–417. 31 indexed citations
16.
Beulens, JJ, et al.. (1990). Axial Temperatures and Electron Densities in a Flowing Cascaded arc. MRS Proceedings. 190. 9 indexed citations
17.
Beulens, JJ, et al.. (1990). FAST PLASMA DEPOSITION OF CARBON AND SILICON LAYERS. Le Journal de Physique Colloques. 51(C5). C5–361. 2 indexed citations
18.
Schram, D. C., G. M. W. Kroesen, & JJ Beulens. (1990). The physics of plasma polymer deposition. Journal of Applied Polymer Science. 46(0). 1–16. 4 indexed citations
19.
Koulidiati, J., A. Czernichowski, JJ Beulens, & D.C. Schram. (1990). ÉVALUATION DES TEMPÉRATURES DE ROTATION ET DE VIBRATION À PARTIR DU SPECTRE D'ÉMISSION A2Ɗ-X2Π DE LA MOLÉCULE CH. Le Journal de Physique Colloques. 51(C5). C5–297. 1 indexed citations
20.
Lydtin, H., et al.. (1989). Diamond depostition from a cascaded arc DC plasma. Data Archiving and Networked Services (DANS). 70–87. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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