B. E. E. Kastenmeier

663 citations

14 papers · 548 indexed · h-index 10

Mechanics of Materials top 5%
- Metal and Thin Film Mechanics 5
Electrical and Electronic Engineering top 10%
- Semiconductor materials and devices 12
- Plasma Diagnostics and Applications 8
- Thin-Film Transistor Technologies 1
Electronic, Optical and Magnetic Materials
- Copper Interconnects and Reliability 4
Materials Chemistry
- Diamond and Carbon-based Materials Research 2
Surfaces, Coatings and Films
Biomedical Engineering
- Advanced Surface Polishing Techniques 1
Computational Mechanics
- Ion-surface interactions and analysis 1

Co-authors: G. S. Oehrlein P. J. Matsuo JJ Beulens J.G. Langan M. F. Doemling M. Schaepkens R.E. Ellefson William R. Entley
Cited by: Mechanics of Materials Electrical and Electronic Engineering Electronic, Optical and Magnetic Materials
Journals: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (7 papers)Microelectronic Engineering (1 paper)Applied Physics Letters (1 paper)
Partner nations: United States Germany Canada

In The Last Decade

B. E. E. Kastenmeier

14 papers receiving 537 citations

Peers

Countries citing papers authored by B. E. E. Kastenmeier

Since Specialization

Citations

This map shows the geographic impact of B. E. E. Kastenmeier's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by B. E. E. Kastenmeier with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites B. E. E. Kastenmeier more than expected).

Fields of papers citing papers by B. E. E. Kastenmeier

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by B. E. E. Kastenmeier. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by B. E. E. Kastenmeier. The network helps show where B. E. E. Kastenmeier may publish in the future.

Co-authorship network

The 23 scholars most cited alongside B. E. E. Kastenmeier, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with B. E. E. Kastenmeier Line = papers co-authored together B. E. E. Kastenmeier links everyone, so they are left out of the graph.

All Works

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14 of 14 papers shown

#	Work
1	Effects of pore morphology on the diffusive properties of a porous low-κ dielectric Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Eric Joseph,Taku Shirai,Matthew Goeckner,Lawrence Overzet,Hua Peng,David W. Gidley,B. E. E. Kastenmeier	2007	1
2	Non-destructive electrical characterization of low-k sidewall damage before metallization by a near-field scanned microwave probe A. Schwartz,Vladimir V. Talanov,G. D. Johnston,B. E. E. Kastenmeier,Brian E. White,S.V. Satyanarayana	2006	1
3	Pore Structure and Integration Performance of a Porous CVD Ultra Low k Dielectric MRS Proceedings ·雅洋山本,Andreas Knorr,Wenli Wu,David Gidley,B. E. E. Kastenmeier	2005	2
4	Dual damascene ash development for a VFTL of target k=2.0 integration Microelectronic Engineering ·Brian E. White,Andreas Knorr,Sabina Petrova,B. E. E. Kastenmeier,家喜张,Mirella Romanelli Vicente Bertolo-Cagnoto,Tiberiu Marasoiu,Michael Gallagher	2005	9
5	Surface etching mechanism of silicon nitride in fluorine and nitric oxide containing plasmas Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·B. E. E. Kastenmeier,P. J. Matsuo,G. S. Oehrlein,R.E. Ellefson,Mark Saunders	2001	36
6	Gas utilization in remote plasma cleaning and stripping applications Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·B. E. E. Kastenmeier,G. S. Oehrlein,J.G. Langan,William R. Entley	2000	25
7	Highly selective etching of silicon nitride over silicon and silicon dioxide Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·B. E. E. Kastenmeier,P. J. Matsuo,G. S. Oehrlein	1999	85
8	Silicon etching in NF3/O2 remote microwave plasmas Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·P. J. Matsuo,B. E. E. Kastenmeier,G. S. Oehrlein,J.G. Langan	1999	31
9	Surface science issues in plasma etching IBM Journal of Research and Development ·G. S. Oehrlein,M. F. Doemling,B. E. E. Kastenmeier,P. J. Matsuo,Marisol Huerta,M. Schaepkens,T. E. F. M. Standaert	1999	38
10	Remote plasma etching of silicon nitride and silicon dioxide using NF3/O2 gas mixtures Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·B. E. E. Kastenmeier,P. J. Matsuo,G. S. Oehrlein,J.G. Langan	1998	85
11	Role of N2 addition on CF4/O2 remote plasma chemical dry etching of polycrystalline silicon Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·P. J. Matsuo,B. E. E. Kastenmeier,JJ Beulens,G. S. Oehrlein	1997	63
12	Study of plasma - surface interactions: chemical dry etching and high-density plasma etching Plasma Sources Science and Technology ·G. S. Oehrlein,P. J. Matsuo,M. F. Doemling,N. R. Rueger,B. E. E. Kastenmeier,M. Schaepkens,Carissa V. Dagostino,JJ Beulens	1996	27
13	Chemical dry etching of silicon nitride and silicon dioxide using CF4/O2/N2 gas mixtures Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·B. E. E. Kastenmeier,P. J. Matsuo,JJ Beulens,G. S. Oehrlein	1996	120
14	Chemical downstream etching of silicon–nitride and polycrystalline silicon using CF4/O2/N2: Surface chemical effects of O2 and N2 additives Applied Physics Letters ·JJ Beulens,B. E. E. Kastenmeier,P. J. Matsuo,G. S. Oehrlein	1995	25

About B. E. E. Kastenmeier

B. E. E. Kastenmeier is a scholar working on Electronic, Optical and Magnetic Materials, Mechanics of Materials, Electrical and Electronic Engineering, Computational Mechanics and Biomedical Engineering, having authored 14 papers that have together received 548 indexed citations. Recurring topics across this work include Semiconductor materials and devices (12 papers), Plasma Diagnostics and Applications (8 papers), Metal and Thin Film Mechanics (5 papers), Copper Interconnects and Reliability (4 papers), Diamond and Carbon-based Materials Research (2 papers), Thin-Film Transistor Technologies (1 paper), Advanced Surface Polishing Techniques (1 paper) and Ion-surface interactions and analysis (1 paper). The work is most often cited by research in Mechanics of Materials (220 citations), Electrical and Electronic Engineering (477 citations), Electronic, Optical and Magnetic Materials (77 citations), Materials Chemistry (188 citations) and Surfaces, Coatings and Films (22 citations). B. E. E. Kastenmeier has collaborated with scholars based in United States, Germany and Canada. Frequent co-authors include G. S. Oehrlein, P. J. Matsuo, JJ Beulens, J.G. Langan, M. F. Doemling, M. Schaepkens, R.E. Ellefson, William R. Entley, T. E. F. M. Standaert and N. R. Rueger. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Microelectronic Engineering, Applied Physics Letters, IBM Journal of Research and Development and Plasma Sources Science and Technology.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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