Karsten Arts

698 total citations
16 papers, 562 citations indexed

About

Karsten Arts is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Condensed Matter Physics. According to data from OpenAlex, Karsten Arts has authored 16 papers receiving a total of 562 indexed citations (citations by other indexed papers that have themselves been cited), including 15 papers in Electrical and Electronic Engineering, 14 papers in Materials Chemistry and 1 paper in Condensed Matter Physics. Recurrent topics in Karsten Arts's work include Semiconductor materials and devices (13 papers), Electronic and Structural Properties of Oxides (12 papers) and Diamond and Carbon-based Materials Research (4 papers). Karsten Arts is often cited by papers focused on Semiconductor materials and devices (13 papers), Electronic and Structural Properties of Oxides (12 papers) and Diamond and Carbon-based Materials Research (4 papers). Karsten Arts collaborates with scholars based in Netherlands, United Kingdom and Finland. Karsten Arts's co-authors include W. M. M. Kessels, Harm C. M. Knoops, Tahsin Faraz, Riikka L. Puurunen, Saurabh Karwal, Mikko Utriainen, Marcel A. Verheijen, Adriaan J. M. Mackus, Tomoko Ito and Oliver A. Williams and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Chemistry of Materials.

In The Last Decade

Karsten Arts

15 papers receiving 550 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Karsten Arts Netherlands 12 488 366 89 67 36 16 562
M. Bonvalot France 12 326 0.7× 197 0.5× 44 0.5× 90 1.3× 19 0.5× 24 398
Satish D. Athavale United States 7 400 0.8× 291 0.8× 91 1.0× 63 0.9× 50 1.4× 10 487
Renan Bu China 12 252 0.5× 295 0.8× 100 1.1× 51 0.8× 27 0.8× 30 377
A. Weber Germany 14 222 0.5× 263 0.7× 255 2.9× 69 1.0× 26 0.7× 21 449
Akiharu Miyanaga Japan 9 239 0.5× 152 0.4× 44 0.5× 43 0.6× 51 1.4× 17 375
Yong Che China 13 399 0.8× 531 1.5× 77 0.9× 290 4.3× 29 0.8× 39 708
P. J. Matsuo United States 13 598 1.2× 226 0.6× 272 3.1× 139 2.1× 15 0.4× 14 686
Örjan Danielsson Sweden 16 506 1.0× 163 0.4× 47 0.5× 216 3.2× 120 3.3× 41 629
P. Besson France 14 722 1.5× 228 0.6× 33 0.4× 82 1.2× 22 0.6× 74 793
Taisuke Kageura Japan 10 324 0.7× 470 1.3× 165 1.9× 41 0.6× 28 0.8× 24 520

Countries citing papers authored by Karsten Arts

Since Specialization
Citations

This map shows the geographic impact of Karsten Arts's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Karsten Arts with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Karsten Arts more than expected).

Fields of papers citing papers by Karsten Arts

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Karsten Arts. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Karsten Arts. The network helps show where Karsten Arts may publish in the future.

Co-authorship network of co-authors of Karsten Arts

This figure shows the co-authorship network connecting the top 25 collaborators of Karsten Arts. A scholar is included among the top collaborators of Karsten Arts based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Karsten Arts. Karsten Arts is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

16 of 16 papers shown
1.
Mandal, Soumen, et al.. (2023). Zeta potential and nanodiamond self assembly assisted diamond growth on lithium niobate and lithium tantalate single crystal. Carbon. 212. 118160–118160. 5 indexed citations
2.
Arts, Karsten, et al.. (2022). Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile. Physical Chemistry Chemical Physics. 24(15). 8645–8660. 23 indexed citations
3.
Arts, Karsten, Satoshi Hamaguchi, Tomoko Ito, et al.. (2022). Foundations of atomic-level plasma processing in nanoelectronics. Plasma Sources Science and Technology. 31(10). 103002–103002. 41 indexed citations
4.
Arts, Karsten, et al.. (2021). Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2. Chemistry of Materials. 33(13). 5002–5009. 22 indexed citations
5.
Arts, Karsten, et al.. (2021). Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2. The Journal of Physical Chemistry C. 125(15). 8244–8252. 15 indexed citations
6.
Mandal, Soumen, et al.. (2021). Surface zeta potential and diamond growth on gallium oxide single crystal. Carbon. 181. 79–86. 29 indexed citations
7.
Knoops, Harm C. M., Karsten Arts, Luca Martini, et al.. (2021). Innovative remote plasma source for atomic layer deposition for GaN devices. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 39(6). 11 indexed citations
9.
Karwal, Saurabh, Marcel A. Verheijen, Karsten Arts, et al.. (2020). Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure. Plasma Chemistry and Plasma Processing. 40(3). 697–712. 17 indexed citations
10.
Arts, Karsten, Mikko Utriainen, Riikka L. Puurunen, W. M. M. Kessels, & Harm C. M. Knoops. (2019). Correction to “Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3 and HfO2. The Journal of Physical Chemistry C. 124(1). 1250–1250.
11.
Arts, Karsten, Mikko Utriainen, Riikka L. Puurunen, W. M. M. Kessels, & Harm C. M. Knoops. (2019). Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2. The Journal of Physical Chemistry C. 123(44). 27030–27035. 42 indexed citations
12.
Arts, Karsten, Vincent Vandalon, Riikka L. Puurunen, et al.. (2019). Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3 extracted from their impact on film conformality. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 37(3). 38 indexed citations
13.
Knoops, Harm C. M., Tahsin Faraz, Karsten Arts, & W. M. M. Kessels. (2019). Status and prospects of plasma-assisted atomic layer deposition. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 37(3). 176 indexed citations
14.
Faraz, Tahsin, Karsten Arts, Saurabh Karwal, Harm C. M. Knoops, & W. M. M. Kessels. (2018). Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties. Plasma Sources Science and Technology. 28(2). 24002–24002. 74 indexed citations
15.
Arts, Karsten, et al.. (2018). Broadband optical response of graphene measured by terahertz time-domain spectroscopy and FTIR spectroscopy. Journal of Applied Physics. 124(7). 10 indexed citations
16.
Macco, Bart, Jimmy Melskens, Nikolas J. Podraza, et al.. (2017). Correlating the silicon surface passivation to the nanostructure of low-temperature a-Si:H after rapid thermal annealing. Journal of Applied Physics. 122(3). 40 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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