L. M. Ephrath

557 total citations
16 papers, 400 citations indexed

About

L. M. Ephrath is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, L. M. Ephrath has authored 16 papers receiving a total of 400 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electrical and Electronic Engineering, 4 papers in Computational Mechanics and 3 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in L. M. Ephrath's work include Semiconductor materials and devices (11 papers), Plasma Diagnostics and Applications (5 papers) and Integrated Circuits and Semiconductor Failure Analysis (5 papers). L. M. Ephrath is often cited by papers focused on Semiconductor materials and devices (11 papers), Plasma Diagnostics and Applications (5 papers) and Integrated Circuits and Semiconductor Failure Analysis (5 papers). L. M. Ephrath collaborates with scholars based in United States. L. M. Ephrath's co-authors include R. S. Bennett, D. J. DiMaria, E. Petrillo, Donald R. Young, P. H. Fang, W. Nowak, B. L. Crowder, A. Cramer, F. L. Pesavento and M.R. Wordeman and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

L. M. Ephrath

16 papers receiving 372 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
L. M. Ephrath United States	11	356	111	78	74	68	16	400
Xueyu Qian United States	11	301 0.8×	83 0.7×	36 0.5×	35 0.5×	119 1.8×	19	334
T. Tsurushima Japan	13	356 1.0×	101 0.9×	191 2.4×	122 1.6×	24 0.4×	37	424
D. Carl United States	11	324 0.9×	114 1.0×	55 0.7×	24 0.3×	98 1.4×	17	365
Andrew S. Alimonda United States	8	404 1.1×	189 1.7×	81 1.0×	13 0.2×	104 1.5×	12	459
E. Lane United States	12	321 0.9×	75 0.7×	116 1.5×	16 0.2×	116 1.7×	31	374
B. Anthony United States	10	292 0.8×	178 1.6×	75 1.0×	52 0.7×	22 0.3×	19	331
D. Barr United States	10	202 0.6×	80 0.7×	28 0.4×	96 1.3×	35 0.5×	33	268
Satish D. Athavale United States	7	400 1.1×	291 2.6×	30 0.4×	38 0.5×	91 1.3×	10	487
Sergi Gomez United States	9	341 1.0×	96 0.9×	42 0.5×	24 0.3×	121 1.8×	9	387
M. F. Doemling United States	7	417 1.2×	143 1.3×	21 0.3×	48 0.6×	192 2.8×	8	455

Countries citing papers authored by L. M. Ephrath

Since Specialization

Citations

This map shows the geographic impact of L. M. Ephrath's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by L. M. Ephrath with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites L. M. Ephrath more than expected).

Fields of papers citing papers by L. M. Ephrath

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by L. M. Ephrath. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by L. M. Ephrath. The network helps show where L. M. Ephrath may publish in the future.

Co-authorship network of co-authors of L. M. Ephrath

This figure shows the co-authorship network connecting the top 25 collaborators of L. M. Ephrath. A scholar is included among the top collaborators of L. M. Ephrath based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with L. M. Ephrath. L. M. Ephrath is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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16 of 16 papers shown

Bassous, E., et al.. (1983). A Three‐Layer Resist System for Deep U.V. and RIE Microlithography on Nonplanar Surfaces. Journal of The Electrochemical Society. 130(2). 478–484. 11 indexed citations

Ephrath, L. M. & R. S. Bennett. (1982). RIE Contamination of Etched Silicon Surfaces. Journal of The Electrochemical Society. 129(8). 1822–1826. 42 indexed citations

Ephrath, L. M. & E. Petrillo. (1982). Parameter and Reactor Dependence of Selective Oxide RIE in CF 4 + H 2. Journal of The Electrochemical Society. 129(10). 2282–2287. 40 indexed citations

Ephrath, L. M.. (1982). Dry Etching for VLSI—A Review. Journal of The Electrochemical Society. 129(3). 62C–66C. 17 indexed citations

Ephrath, L. M., D. J. DiMaria, & F. L. Pesavento. (1981). Parameter Dependence of RIE Induced Radiation Damage in Silicon Dioxide. Journal of The Electrochemical Society. 128(11). 2415–2419. 18 indexed citations

Tsai, M. Y., L. M. Ephrath, B. L. Crowder, et al.. (1981). One‐Micron Polycide (WSi2 on Poly‐Si) MOSFET Technology. Journal of The Electrochemical Society. 128(10). 2207–2214. 38 indexed citations

Ephrath, L. M.. (1981). Reactive ion etching for VLSI. IEEE Transactions on Electron Devices. 28(11). 1315–1319. 18 indexed citations

Ephrath, L. M.. (1980). Reactive ion etching for VLSI. 402–404. 4 indexed citations

DiMaria, D. J., L. M. Ephrath, & Donald R. Young. (1979). Radiation damage in silicon dioxide films exposed to reactive ion etching. Journal of Applied Physics. 50(6). 4015–4021. 46 indexed citations

10.

Ephrath, L. M.. (1979). Selective Etching of Silicon Dioxide Using Reactive Ion Etching with CF 4 ‐ H 2. Journal of The Electrochemical Society. 126(8). 1419–1421. 118 indexed citations

11.

Hunter, W. R., L. M. Ephrath, W. D. Grobman, et al.. (1979). 1 /spl mu/m MOSFET VLSI technology. V. A single-level polysilicon technology using electron-beam lithography. IEEE Journal of Solid-State Circuits. 14(2). 275–281. 4 indexed citations

12.

Hunter, W. R., L. M. Ephrath, W. D. Grobman, et al.. (1978). One-micrometer electron-beam lithography FET technology. 54–57. 2 indexed citations

13.

Ephrath, L. M.. (1978). The effect of cathode materials on reactive ion etching of silicon and silicon dioxide in a CF4 plasma. Journal of Electronic Materials. 7(3). 415–428. 14 indexed citations

14.

Ephrath, L. M.. (1975). Growth of Polycrystalline Silicon Film on Metal Substrates.. 1 indexed citations

15.

Ephrath, L. M.. (1975). Growth of polycrystalline silicon films on titanium and aluminum layers. Journal of Electronic Materials. 4(6). 1207–1227. 3 indexed citations

16.

Fang, P. H., L. M. Ephrath, & W. Nowak. (1974). Polycrystalline silicon films on aluminum sheets for solar cell application. Applied Physics Letters. 25(10). 583–584. 24 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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