Larry Zhao

723 total citations
29 papers, 564 citations indexed

About

Larry Zhao is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Mechanics of Materials. According to data from OpenAlex, Larry Zhao has authored 29 papers receiving a total of 564 indexed citations (citations by other indexed papers that have themselves been cited), including 28 papers in Electrical and Electronic Engineering, 25 papers in Electronic, Optical and Magnetic Materials and 8 papers in Mechanics of Materials. Recurrent topics in Larry Zhao's work include Copper Interconnects and Reliability (24 papers), Semiconductor materials and devices (23 papers) and Metal and Thin Film Mechanics (8 papers). Larry Zhao is often cited by papers focused on Copper Interconnects and Reliability (24 papers), Semiconductor materials and devices (23 papers) and Metal and Thin Film Mechanics (8 papers). Larry Zhao collaborates with scholars based in Belgium, United States and Japan. Larry Zhao's co-authors include Mikhaı̈l R. Baklanov, Gerald Beyer, Zsolt Tökei, Stefan De Gendt, Christoph Adelmann, Marianna Pantouvaki, Kristof Croes, Els Van Besien, Christopher J. Wilson and Cor Claeys and has published in prestigious journals such as ACS Nano, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Larry Zhao

28 papers receiving 555 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Larry Zhao Belgium 14 479 377 133 116 94 29 564
Chien Chiang United States 8 280 0.6× 253 0.7× 127 1.0× 78 0.7× 52 0.6× 21 383
Mong-Song Liang Taiwan 16 641 1.3× 220 0.6× 152 1.1× 162 1.4× 41 0.4× 51 715
T. M. Tsai Taiwan 12 278 0.6× 209 0.6× 100 0.8× 128 1.1× 56 0.6× 24 342
Catherine B. Labelle United States 14 365 0.8× 142 0.4× 163 1.2× 225 1.9× 104 1.1× 34 551
T. Spooner United States 13 412 0.9× 312 0.8× 76 0.6× 83 0.7× 64 0.7× 49 472
Kai‐Erik Elers Finland 10 411 0.9× 176 0.5× 150 1.1× 214 1.8× 39 0.4× 11 459
Marc French United States 13 400 0.8× 198 0.5× 97 0.7× 257 2.2× 34 0.4× 16 522
Abdullah Mamun United States 14 262 0.5× 271 0.7× 56 0.4× 280 2.4× 112 1.2× 38 600
Syun‐Ming Jang Taiwan 15 374 0.8× 176 0.5× 111 0.8× 127 1.1× 47 0.5× 23 434
Adam Urbanowicz Belgium 13 608 1.3× 574 1.5× 332 2.5× 128 1.1× 60 0.6× 49 711

Countries citing papers authored by Larry Zhao

Since Specialization
Citations

This map shows the geographic impact of Larry Zhao's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Larry Zhao with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Larry Zhao more than expected).

Fields of papers citing papers by Larry Zhao

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Larry Zhao. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Larry Zhao. The network helps show where Larry Zhao may publish in the future.

Co-authorship network of co-authors of Larry Zhao

This figure shows the co-authorship network connecting the top 25 collaborators of Larry Zhao. A scholar is included among the top collaborators of Larry Zhao based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Larry Zhao. Larry Zhao is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
2.
Koike, Junichi, et al.. (2016). Amorphous Co-Ti alloy as a single layer barrier for Co local interconnect structure. 162–164. 13 indexed citations
3.
Zhao, Larry, et al.. (2015). Communication—The Impact of TaN Barrier Processes on Different Ultra Low-k Dielectrics. ECS Journal of Solid State Science and Technology. 4(12). N160–N162. 2 indexed citations
4.
Baklanov, Mikhaı̈l R., Christoph Adelmann, Larry Zhao, & Stefan De Gendt. (2014). Advanced Interconnects: Materials, Processing, and Reliability. ECS Journal of Solid State Science and Technology. 4(1). Y1–Y4. 102 indexed citations
5.
Croes, Kristof, Vladimir Cherman, Yunlong Li, et al.. (2012). Reliability concerns in copper TSV's: Methods and results. 1–5. 10 indexed citations
6.
Zhao, Larry, et al.. (2011). Direct observation of the 1/E dependence of time dependent. Applied Physics Letters. 98(3). 32107. 5 indexed citations
7.
Zhao, Larry, Mikhaı̈l R. Baklanov, Zsolt Tökei, et al.. (2011). Study of metal barrier deposition-induced damage to porous low-k materials. Microelectronic Engineering. 88(9). 3030–3034. 19 indexed citations
8.
Pantouvaki, Marianna, C. Huffman, Larry Zhao, et al.. (2011). Advanced Organic Polymer for the Aggressive Scaling of Low-kMaterials. Japanese Journal of Applied Physics. 50(4S). 04DB01–04DB01. 4 indexed citations
9.
Zhao, Larry, Marianna Pantouvaki, Kristof Croes, et al.. (2011). Role of copper in time dependent dielectric breakdown of porous organo-silicate glass low-k materials. Applied Physics Letters. 99(22). 26 indexed citations
10.
Zhao, Larry, Zsolt Tökei, Kristof Croes, et al.. (2011). Direct observation of the 1/E dependence of time dependent dielectric breakdown in the presence of copper. Applied Physics Letters. 98(3). 32107–32107. 41 indexed citations
11.
Besien, Els Van, Marianna Pantouvaki, Larry Zhao, et al.. (2011). Influence of porosity on electrical properties of low-k dielectrics. Microelectronic Engineering. 92. 59–61. 32 indexed citations
12.
Croes, Kristof, et al.. (2010). Study of leakage mechanism and trap density in porous low-k materials. 549–555. 20 indexed citations
13.
Zhao, Larry, Mikhaı̈l R. Baklanov, Marianna Pantouvaki, Zsolt Tökei, & Gerald Beyer. (2010). Ultra Low-k Materials: Challenges of Scaling. ECS Transactions. 33(12). 117–123. 5 indexed citations
14.
Wilson, Christopher J., Kristof Croes, Chao Zhao, et al.. (2009). Synchrotron measurement of the effect of linewidth scaling on stress in advanced Cu/Low-k interconnects. Journal of Applied Physics. 106(5). 15 indexed citations
15.
Zhao, Larry, et al.. (2009). A novel test structure to study intrinsic reliability of barrier/low-k. 848–850. 19 indexed citations
16.
Le, Quoc Toan, et al.. (2009). Removal of Photoresist and BARC in Cu BEOL using an All-wet Process. ECS Transactions. 25(5). 173–178. 2 indexed citations
17.
Zhao, Larry, et al.. (2009). A new perspective of barrier material evaluation and process optimization. 206–208. 31 indexed citations
18.
Besser, Paul R., Ehrenfried Zschech, Richard Ortega, et al.. (2001). Microstructural characterization of inlaid copper interconnect lines. Journal of Electronic Materials. 30(4). 320–330. 54 indexed citations
19.
Zhao, Jinshi, et al.. (2000). Defect analysis of Cl2/HBr/He/O2 etching process by imaging time-of-flight secondary ion mass spectrometry. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 18(1). 207–212.
20.
Capasso, C., et al.. (2000). <title>Electromigration failure modes and Blech effect in single-inlaid Cu interconnects</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4229. 1–7. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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