R. Carruthers

817 total citations
13 papers, 421 citations indexed

About

R. Carruthers is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, R. Carruthers has authored 13 papers receiving a total of 421 indexed citations (citations by other indexed papers that have themselves been cited), including 12 papers in Electrical and Electronic Engineering, 4 papers in Electronic, Optical and Magnetic Materials and 3 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in R. Carruthers's work include Semiconductor materials and devices (8 papers), Advancements in Semiconductor Devices and Circuit Design (5 papers) and Copper Interconnects and Reliability (4 papers). R. Carruthers is often cited by papers focused on Semiconductor materials and devices (8 papers), Advancements in Semiconductor Devices and Circuit Design (5 papers) and Copper Interconnects and Reliability (4 papers). R. Carruthers collaborates with scholars based in United States and Canada. R. Carruthers's co-authors include L. Gignac, M. Steen, J. Chapple-Sokol, W. Patrick, G. C. Schwartz, Vijay Narayanan, B.P. Linder, P. Jamison, Jin‐Hwan Kim and Elizabeth A. Duch and has published in prestigious journals such as Journal of The Electrochemical Society, Thin Solid Films and IEEE Electron Device Letters.

In The Last Decade

R. Carruthers

13 papers receiving 397 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
R. Carruthers United States 9 399 83 69 65 46 13 421
Dong Kyun Sohn Singapore 12 351 0.9× 64 0.8× 68 1.0× 114 1.8× 69 1.5× 46 386
D. Louis France 11 269 0.7× 102 1.2× 47 0.7× 22 0.3× 61 1.3× 28 295
Yong Kong Siew Belgium 9 204 0.5× 125 1.5× 50 0.7× 44 0.7× 42 0.9× 25 246
N. Jourdan Belgium 11 309 0.8× 161 1.9× 51 0.7× 75 1.2× 36 0.8× 26 342
V. Dhandapani United States 6 555 1.4× 43 0.5× 128 1.9× 114 1.8× 20 0.4× 10 575
Tomo Ueno Japan 11 288 0.7× 61 0.7× 217 3.1× 61 0.9× 54 1.2× 36 358
Nae-In Lee South Korea 14 613 1.5× 60 0.7× 274 4.0× 69 1.1× 32 0.7× 54 627
T. Standaert United States 14 426 1.1× 134 1.6× 56 0.8× 58 0.9× 71 1.5× 27 458
Arito Ogawa Japan 10 404 1.0× 42 0.5× 118 1.7× 93 1.4× 22 0.5× 30 421
Katherina Babich United States 9 233 0.6× 69 0.8× 143 2.1× 15 0.2× 54 1.2× 26 294

Countries citing papers authored by R. Carruthers

Since Specialization
Citations

This map shows the geographic impact of R. Carruthers's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. Carruthers with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. Carruthers more than expected).

Fields of papers citing papers by R. Carruthers

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by R. Carruthers. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. Carruthers. The network helps show where R. Carruthers may publish in the future.

Co-authorship network of co-authors of R. Carruthers

This figure shows the co-authorship network connecting the top 25 collaborators of R. Carruthers. A scholar is included among the top collaborators of R. Carruthers based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with R. Carruthers. R. Carruthers is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

13 of 13 papers shown
1.
Saenger, K. L., C. Lavoie, R. Carruthers, et al.. (2011). Metal-catalyzed graphitization in Ni-C alloys and amorphous-C/Ni bilayers. MRS Proceedings. 1284. 1 indexed citations
2.
Narayanan, Vijay, K. Maitra, B.P. Linder, et al.. (2006). Process optimization for high electron mobility in nMOSFETs with aggressively scaled HfO/sub 2//metal stacks. IEEE Electron Device Letters. 27(7). 591–594. 35 indexed citations
3.
Gusev, E. P., Vijay Narayanan, Sufi Zafar, et al.. (2005). Charge trapping in aggressively scaled metal gate/high-κ stacks. 729–732. 8 indexed citations
4.
Narayanan, Vijay, J. Newbury, P. Jamison, et al.. (2005). Systematic study of work function engineering and scavenging effect using NiSi alloy FUSI metal gates with advanced gate stacks. 4 pp.–645. 18 indexed citations
5.
Cartier, E., F. R. McFeely, Vijay Narayanan, et al.. (2005). Role of oxygen vacancies in V/sub BF//V/sub t/ stability of pFET metals on HfO/sub 2/. 230–231. 52 indexed citations
6.
Rim, K., K. Chan, L. Shi, et al.. (2004). Fabrication and mobility characteristics of ultra-thin strained Si directly on insulator (SSDOI) MOSFETs. 3.1.1–3.1.4. 103 indexed citations
7.
Cabral, C., J. Kedzierski, B.P. Linder, et al.. (2004). Dual workfunction fully silicided metal gates. 184–185. 32 indexed citations
8.
Kang, S. K., Jean Horkans, P. C. Andricacos, et al.. (2003). Pb-free solder alloys for flip chip applications. 283–288. 12 indexed citations
9.
Zhu, Wenjuan, T.P. Ma, T. Tamagawa, et al.. (2002). HfO/sub 2/ and HfAlO for CMOS: thermal stability and current transport. 20.4.1–20.4.4. 47 indexed citations
10.
Lucadamo, G., C. Lavoie, C. Cabral, R. Carruthers, & J. M. E. Harper. (2000). In situ and Ex situ Measurements of Stress Evolution in the Cobalt-Silicon System. MRS Proceedings. 611. 4 indexed citations
11.
Gignac, L., et al.. (1998). Electromigration in physical vapor deposited Cu lines. 113–126. 3 indexed citations
12.
Gignac, L., et al.. (1997). Electromigration in 0.25 μm wide Cu line on W. Thin Solid Films. 308-309. 443–447. 53 indexed citations
13.
Patrick, W., et al.. (1992). Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Films Using Tetraethoxysilane and Oxygen: Characterization and Properties of Films. Journal of The Electrochemical Society. 139(9). 2604–2613. 53 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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