J. M. Eldridge
- Metals and Alloys top 10%
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- Iron oxide chemistry and applications 4
- Electrochemistry top 10%
- Surfaces, Coatings and Films top 10%
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- Semiconductor materials and devices 18
- Thin-Film Transistor Technologies 4
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- Copper Interconnects and Reliability 8
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- Metal and Thin Film Mechanics 5
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- Electronic and Structural Properties of Oxides 4
- Silicon Nanostructures and Photoluminescence 4
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- High-Temperature Coating Behaviors 3
- Co-authors
- R. W. HoffmanNamsun ChouMartin E. KordeschDaniel A. SchersonP. BalkErnest YeagerD. W. DongWen‐Yaung Lee
- Journals
- Journal of The Electrochemical Society (16 papers)Journal of Applied Physics (5 papers)Journal of Electronic Materials (3 papers)
- Partner nations
- United StatesAustria
In The Last Decade
J. M. Eldridge
44 papers receiving 710 citations
Peers
Comparison fields: 5 of 49
- Metals and Alloys 31
- Renewable Energy, Sustainability and the Environment 179
- Electrochemistry 67
- Surfaces, Coatings and Films 69
- Electrical and Electronic Engineering 478
Countries citing papers authored by J. M. Eldridge
This map shows the geographic impact of J. M. Eldridge's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. M. Eldridge with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. M. Eldridge more than expected).
Fields of papers citing papers by J. M. Eldridge
This network shows the impact of papers produced by J. M. Eldridge. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. M. Eldridge. The network helps show where J. M. Eldridge may publish in the future.
Co-authorship network
The 25 scholars most cited alongside J. M. Eldridge, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 1994 | 5 | |
| 2 | 1992 | 5 | |
| 3 | 1990 | 11 | |
| 4 | 1990 | 9 | |
| 5 | 7.4 : Materials and Processing Studies for Thermal Ink-Jet Devices (Report on 1986 SID International Symposium) | 1986 | 1 |
| 6 | 1985 | 15 | |
| 7 | 1984 | 8 | |
| 8 | 1983 | 34 | |
| 9 | 1983 | 114 | |
| 10 | 1982 | 6 | |
| 11 | 1982 | 11 | |
| 12 | 1981 | 35 | |
| 13 | 1978 | 6 | |
| 14 | 1978 | 3 | |
| 15 | 1975 | 25 | |
| 16 | 1973 | 24 | |
| 17 | 1971 | 35 | |
| 18 | MEASUREMENT OF TUNNEL CURRENT DENSITY IN A METAL/OXIDE/METAL SYSTEM AS A FUNCTION OF OXIDE THICKNESS. | 1971 | 2 |
| 19 | 1970 | 68 | |
| 20 | 1970 | 2 |
About J. M. Eldridge
J. M. Eldridge is a scholar working on Surfaces, Coatings and Films, Metals and Alloys, Ceramics and Composites, Electronic, Optical and Magnetic Materials and Electrochemistry, having authored 47 papers that have together received 760 indexed citations. Recurring topics across this work include Semiconductor materials and devices (18 papers), Copper Interconnects and Reliability (8 papers), Metal and Thin Film Mechanics (5 papers), Iron oxide chemistry and applications (4 papers), Thin-Film Transistor Technologies (4 papers), Electronic and Structural Properties of Oxides (4 papers), Silicon Nanostructures and Photoluminescence (4 papers) and High-Temperature Coating Behaviors (3 papers). The work is most often cited by research in Metals and Alloys (31 citations), Renewable Energy, Sustainability and the Environment (179 citations), Electrochemistry (67 citations), Surfaces, Coatings and Films (69 citations) and Electrical and Electronic Engineering (478 citations). J. M. Eldridge has collaborated with scholars based in United States and Austria. Frequent co-authors include R. W. Hoffman, Namsun Chou, Martin E. Kordesch, Daniel A. Scherson, P. Balk, Ernest Yeager, D. W. Dong, Wen‐Yaung Lee, D. R. Kerr and J. Grimblot. Their work appears in journals such as Journal of The Electrochemical Society, Journal of Applied Physics, Journal of Electronic Materials, Thin Solid Films and Surface Science.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.