Philipp Schaible

580 total citations
16 papers, 383 citations indexed

About

Philipp Schaible is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Mechanics of Materials. According to data from OpenAlex, Philipp Schaible has authored 16 papers receiving a total of 383 indexed citations (citations by other indexed papers that have themselves been cited), including 9 papers in Electrical and Electronic Engineering, 5 papers in Electronic, Optical and Magnetic Materials and 4 papers in Mechanics of Materials. Recurrent topics in Philipp Schaible's work include Semiconductor materials and devices (6 papers), Copper Interconnects and Reliability (5 papers) and Ion-surface interactions and analysis (3 papers). Philipp Schaible is often cited by papers focused on Semiconductor materials and devices (6 papers), Copper Interconnects and Reliability (5 papers) and Ion-surface interactions and analysis (3 papers). Philipp Schaible collaborates with scholars based in United States, Germany and Russia. Philipp Schaible's co-authors include G. C. Schwartz, L. I. Maissel, J. P. Anderson, Wilhelm Metzger, Reinhard Gotzhein, R. Glang, Μaik Gude and Jürgen Fleischer and has published in prestigious journals such as SHILAP Revista de lepidopterología, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Philipp Schaible

13 papers receiving 345 citations

Peers

Philipp Schaible

EEE

EOMM

MM

MC

CM

Hisataka Hayashi Japan

Miyako Matsui Japan

R W Brander United States

Ken’etsu Yokogawa Japan

Mireille Gaillard France

K. Tao China

Sergi Gomez United States

A. Bousetta United States

Mitsuo Okamoto Japan

W. Ting United States

Hisataka Hayashi Japan

Philipp Schaible

468 ×1.6

EEE

109 ×0.8

EOMM

158 ×1.2

MM

146 ×1.4

MC

42 ×0.5

CM

Citations per year, relative to Philipp Schaible Philipp Schaible (= 1×) peers Hisataka Hayashi

Countries citing papers authored by Philipp Schaible

Since Specialization

Citations

This map shows the geographic impact of Philipp Schaible's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Philipp Schaible with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Philipp Schaible more than expected).

Fields of papers citing papers by Philipp Schaible

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Philipp Schaible. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Philipp Schaible. The network helps show where Philipp Schaible may publish in the future.

Co-authorship network of co-authors of Philipp Schaible

This figure shows the co-authorship network connecting the top 25 collaborators of Philipp Schaible. A scholar is included among the top collaborators of Philipp Schaible based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Philipp Schaible. Philipp Schaible is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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16 of 16 papers shown

1.

Schaible, Philipp, et al.. (2025). Manufacturing and Defect Characterization of Rotationally Molded Hybrid Composite Drive Shafts. Procedia CIRP. 131. 1–6.

2.

Schaible, Philipp, et al.. (2025). Advanced manufacturing of thermoplastic tape preforms: braiding simulation, curved preforming, and consolidation via rotational and bladder-assisted molding. SHILAP Revista de lepidopterología. 11(1).

3.

Schaible, Philipp, et al.. (2014). The state analysis of intelligent tools of Computer Aided Software Engineering. 421–422.

4.

Schaible, Philipp, et al.. (2002). Re-engineering of the Internet Stream Protocol ST2+ with formalized design patterns. 1819. 268–277. 8 indexed citations

5.

Gotzhein, Reinhard & Philipp Schaible. (1999). Pattern-based development of communication systems. Annals of Telecommunications. 54(11-12). 508–525. 8 indexed citations

6.

Schaible, Philipp & G. C. Schwartz. (1985). Selective Reactive Ion Etching of TiW. Journal of The Electrochemical Society. 132(3). 730–731. 1 indexed citations

7.

Schwartz, G. C. & Philipp Schaible. (1983). The Effects of Arsenic Doping in Reactive Ion Etching of Silicon in Chlorinated Plasmas. Journal of The Electrochemical Society. 130(9). 1898–1905. 14 indexed citations

8.

Schwartz, G. C. & Philipp Schaible. (1983). Reactive Ion Etching of Copper Films. Journal of The Electrochemical Society. 130(8). 1777–1779. 60 indexed citations

9.

Schaible, Philipp & G. C. Schwartz. (1981). Reactive ion etching in microcircuit fabrication. Thin Solid Films. 83(2). 187–188. 1 indexed citations

10.

Schwartz, G. C. & Philipp Schaible. (1979). Reactive ion etching of silicon. Journal of Vacuum Science and Technology. 16(2). 410–413. 71 indexed citations

11.

Schaible, Philipp & G. C. Schwartz. (1979). Preferential lateral chemical etching in reactive ion etching of aluminum and aluminum alloys. Journal of Vacuum Science and Technology. 16(2). 377–380. 16 indexed citations

12.

Schaible, Philipp, Wilhelm Metzger, & J. P. Anderson. (1978). Reactive ion etching of aluminum and aluminum alloys in an rf plasma containing halogen species. Journal of Vacuum Science and Technology. 15(2). 334–337. 61 indexed citations

13.

Schaible, Philipp & L. I. Maissel. (1969). Thin-film maximum thermometer. Thin Solid Films. 3(4). 277–285. 4 indexed citations

14.

Glang, R. & Philipp Schaible. (1968). Tolerance limitations of etched film resistors. Thin Solid Films. 1(4). 309–322. 5 indexed citations

15.

Schaible, Philipp, et al.. (1966). Load-Life Tests of Cr-SiO Cermet Thin-Film Resistors. 143–157. 2 indexed citations

16.

Maissel, L. I. & Philipp Schaible. (1965). Thin Films Deposited by Bias Sputtering. Journal of Applied Physics. 36(1). 237–242. 132 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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