E. Louis

1.5k citations

62 papers · 928 indexed · h-index 19

Impact in

Surfaces, Coatings and Films top 2%
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
Radiation top 5%
- Advanced X-ray Imaging Techniques
- X-ray Spectroscopy and Fluorescence Analysis

Papers in

Surfaces, Coatings and Films 17
- Electron and X-Ray Spectroscopy Techniques 11
- Optical Coatings and Gratings 10
Radiation 13
- Advanced X-ray Imaging Techniques 9

Co-authors: F. Bijkerk Andrey Yakshin Robbert Wilhelmus Elisabeth van de Kruijs E. Zoethout N.B. Koster Ileana Nedelcu S. Müllender Dim‐Lee Kwong
Journals: Journal of Applied Physics (6 papers)Thin Solid Films (5 papers)Microelectronic Engineering (5 papers)Applied Surface Science (4 papers)Optics Letters (4 papers)
Partner nations: Netherlands Germany Russia

In The Last Decade

E. Louis

60 papers receiving 876 citations

Peers

Countries citing papers authored by E. Louis

Since Specialization

Citations

This map shows the geographic impact of E. Louis's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. Louis with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. Louis more than expected).

Fields of papers citing papers by E. Louis

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by E. Louis. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. Louis. The network helps show where E. Louis may publish in the future.

Co-authors

The 25 scholars most cited alongside E. Louis, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with E. Louis Line = papers co-authored together E. Louis links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors Optics Express ·В. В. Медведев, Alfiana Fitri, R. van der Meer, Andrey Yakshin, E. Louis, V.M. Krivtsun, F. Bijkerk	2013	17
2	Optimization of LaN/B multilayer mirrors for 6.x nm wavelength Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Igor A. Makhotkin, Robbert Wilhelmus Elisabeth van de Kruijs, E. Zoethout, E. Louis, Gabrielle H. Schusler	2013	2
3	Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection Optics Letters ·Alfiana Fitri, F.A. van Goor, E. Louis, F. Bijkerk	2012	15
4	Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources Optics Express ·R. Loch, R. Sobierajski, E. Louis, Laudyce Rétat, Gabrielle H. Schusler	2012	8
5	Influence of noble gas ion polishing species on extreme ultraviolet mirrors Journal of Applied Physics ·Alfiana Fitri, E. Zoethout, Igor A. Makhotkin, E. Louis, F. Bijkerk	2012	9
6	Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements Optics Letters ·R. Loch, A. Dubrouil, R. Sobierajski, D. Descamps, B. Fabre, 覚中野, Robbert Wilhelmus Elisabeth van de Kruijs, Doug Gruver, E. M. Gullikson, J. Gaudin, E. Louis, Gabrielle H. Schusler, E. Mével, S. Petit, E. Constant, Y. Mairesse	2011	12
7	Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ·Sergiy M. Dobrovolskiy, Andrey Yakshin, F.D. Tichelaar, J. Verhoeven, E. Louis, Gabrielle H. Schusler	2010	1
8	Properties of broadband depth-graded multilayer mirrors for EUV optical systems Optics Express ·Andrey Yakshin, I. V. Kozhevnikov, E. Zoethout, E. Louis, F. Bijkerk	2010	33
9	Damage studies of multilayer optics for XUV free electron lasers Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·E. Louis, A. R. Khorsand, R. Sobierajski, Shuhang Xu, M. Jurek, D. Klinger, J.B. Pełka, L. Juha, J. Chalupský, J. Cihelka, V. Hájková, U. Jastrow, S. Toleikis, H. Wabnitz, K. Tiedtke, J. Gaudin, Eric M. Gullikson, F. Bijkerk	2009	13
10	Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Andrey Yakshin, Robbert Wilhelmus Elisabeth van de Kruijs, Ileana Nedelcu, E. Zoethout, E. Louis, F. Bijkerk, B. Pommier and, S. Müllender	2007	32
11	Substrate recovery layers for EUVL optics: effects on multilayer reflectivity and surface roughness Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ileana Nedelcu, Robbert Wilhelmus Elisabeth van de Kruijs, Andrey Yakshin, E. Louis, F. Bijkerk, S. Müllender	2007	1
12	Nano-size crystallites in Mo/Si multilayer optics Thin Solid Films ·Robbert Wilhelmus Elisabeth van de Kruijs, E. Zoethout, Andrey Yakshin, Ileana Nedelcu, E. Louis, B. Pommier and, Gellért Sipos, S. Müllender, F. Bijkerk	2006	26
13	Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions Thin Solid Films ·N. Vogt, Robbert Wilhelmus Elisabeth van de Kruijs, E. Louis, F. Bijkerk, J. Verhoeven	2006	3
14	Multilayer coated reflective optics for Extreme UV lithography Microelectronic Engineering ·E. Louis, C M Barbosa de Lemos, N.B. Koster, F. Bijkerk, Rosario Obregon, S. Yu. Zuev, S. S. Andreev, Xu Yuezhen, Н. Н. Салащенко	1995	19
15	Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment Microelectronic Engineering ·E. Louis, C M Barbosa de Lemos, N.B. Koster, Л. А. Шмаенок, F. Bijkerk, Rutger Schlatmann, J. Verhoeven, Rosario Obregon, G. E. van Dorssen, H. A. Padmore	1994	37
16	Absolute brightness of laser plasmas in the soft-x-ray emission band Applied Optics ·F. Bijkerk, E. Louis, G. E. van Dorssen, A. P. Shevelko, A. A. Vasilyev	1994	4
17	Optimization of X-ray emission from a laser-produced plasma in a narrow wavelength band Laser and Particle Beams ·G. E. van Dorssen, E. Louis, Nilanjan Sasmal	1992	1
18	Rapid Thermal Processing for Self-Aligned Silicide Technology MRS Proceedings ·V. (Viktoriya) Poterya, عليان ، هبة, E. Louis, Wang Chiu, Dim‐Lee Kwong	1987	2
19	Subgrain imaging of high-purity aluminum using electron channeling in the SEM Metallography ·E. Louis, David L. Bourell	1987	0
20	Research and development of low cost processes for integrated solar arrays NASA STI/Recon Technical Report N ·Octavia L Vogel, Amalia Iliopoulou, E. Louis	1976	1

About E. Louis

E. Louis is a scholar working on Surfaces, Coatings and Films, Radiation, Structural Biology, Computational Mechanics and Atomic and Molecular Physics, and Optics, having authored 62 papers that have together received 928 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (15 papers), Ion-surface interactions and analysis (15 papers), Semiconductor materials and interfaces (13 papers), Semiconductor materials and devices (12 papers), Electron and X-Ray Spectroscopy Techniques (11 papers), Laser-induced spectroscopy and plasma (10 papers), Optical Coatings and Gratings (10 papers) and Advanced X-ray Imaging Techniques (9 papers). The work is most often cited by research in Surfaces, Coatings and Films (240 citations), Radiation (220 citations), Structural Biology (21 citations), Computational Mechanics (254 citations) and Atomic and Molecular Physics, and Optics (324 citations). E. Louis has collaborated with scholars based in Netherlands, Germany and Russia. Frequent co-authors include F. Bijkerk, Andrey Yakshin, Robbert Wilhelmus Elisabeth van de Kruijs, E. Zoethout, N.B. Koster, Ileana Nedelcu, S. Müllender, Dim‐Lee Kwong, Paul K. Chu and Salim Abdali. Their work appears in journals such as Journal of Applied Physics, Thin Solid Films, Microelectronic Engineering, Applied Surface Science and Optics Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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