E. Langereis

2.7k total citations · 1 hit paper
31 papers, 2.4k citations indexed

About

E. Langereis is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, E. Langereis has authored 31 papers receiving a total of 2.4k indexed citations (citations by other indexed papers that have themselves been cited), including 30 papers in Electrical and Electronic Engineering, 14 papers in Materials Chemistry and 13 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in E. Langereis's work include Semiconductor materials and devices (26 papers), Copper Interconnects and Reliability (13 papers) and Catalytic Processes in Materials Science (12 papers). E. Langereis is often cited by papers focused on Semiconductor materials and devices (26 papers), Copper Interconnects and Reliability (13 papers) and Catalytic Processes in Materials Science (12 papers). E. Langereis collaborates with scholars based in Netherlands, United States and Germany. E. Langereis's co-authors include M. C. M. van de Sanden, W. M. M. Kessels, S. B. S. Heil, Bram Hoex, Harm C. M. Knoops, W. Keuning, F. Roozeboom, Mariadriana Creatore, G. Dingemans and Stephen E. Potts and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

E. Langereis

30 papers receiving 2.3k citations

Hit Papers

align trajectories

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

2006 625 citations Bram Hoex, S. B. S. Heil et al. Applied Physics Letters profile →

Peers

Countries citing papers authored by E. Langereis

Since Specialization

Citations

This map shows the geographic impact of E. Langereis's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. Langereis with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. Langereis more than expected).

Fields of papers citing papers by E. Langereis

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by E. Langereis. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. Langereis. The network helps show where E. Langereis may publish in the future.

Co-authorship network of co-authors of E. Langereis

This figure shows the co-authorship network connecting the top 25 collaborators of E. Langereis. A scholar is included among the top collaborators of E. Langereis based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with E. Langereis. E. Langereis is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Dielectric Material Options for Integrated Capacitors 2014 ·ECS Journal of Solid State Science and Technology ·G. Ruhl, (unknown), Mindaugas Lukosius, Christian Wenger, (unknown), Tom Blomberg, Suvi Haukka, P. K. Baumann, W.F.A. Besling, Aarnoud L. Roest, (unknown), S. Lhostis, (unknown), F. Roozeboom, E. Langereis, W. M. M. Kessels, A. Zauner, S. Rushworth	8
2	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma 2011 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Noémi Leick, (unknown), L. Lamagna, E. Langereis, (unknown), F. Roozeboom, M. C. M. van de Sanden, (unknown)	50
3	Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas 2011 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Harm C. M. Knoops, E. Langereis, M. C. M. van de Sanden, W. M. M. Kessels	25
4	Remote Plasma ALD of SrTiO[sub 3] Using Cyclopentadienlyl-Based Ti and Sr Precursors 2010 ·Journal of The Electrochemical Society ·E. Langereis, (unknown), F. Roozeboom, M. C. M. van de Sanden, W. M. M. Kessels	26
5	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films 2010 ·Journal of The Electrochemical Society ·Stephen E. Potts, W. Keuning, E. Langereis, G. Dingemans, M. C. M. van de Sanden, W. M. M. Kessels	155
6	In situ spectroscopic ellipsometry for atomic layer deposition 2009 ·Munich Personal RePEc Archive (Ludwig Maximilian University of Munich) ·E. Langereis, (unknown), Harm C. M. Knoops, W. Keuning, M. C. M. van de Sanden, (unknown)	1
7	In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition 2009 ·Journal of Physics D Applied Physics ·E. Langereis, S. B. S. Heil, Harm C. M. Knoops, W. Keuning, M. C. M. van de Sanden, W. M. M. Kessels	259
8	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films 2009 ·ECS Transactions ·Stephen E. Potts, (unknown), G. Dingemans, E. Langereis, W. Keuning, M. C. M. van de Sanden, W. M. M. Kessels	3
9	In Situ Infrared Characterization during Atomic Layer Deposition of Lanthanum Oxide 2008 ·The Journal of Physical Chemistry C ·Jinhee Kwon, Min Dai, Mathew D. Halls, E. Langereis, Yves J. Chabal, Roy G. Gordon	81
10	Plasma-assisted atomic layer deposition:an in situ diagnostic study 2008 ·Data Archiving and Networked Services (DANS) ·E. Langereis	0
11	Plasma-Assisted ALD of Al2O3 at Low Temperatures: Reaction Mechanisms and Material Properties 2008 ·ECS Transactions ·E. Langereis, (unknown), (unknown), S. B. S. Heil, M. C. M. van de Sanden, W. M. M. Kessels	16
12	Deposition of TiN and TaN by Remote Plasma ALD for Cu and Li Diffusion Barrier Applications 2008 ·Journal of The Electrochemical Society ·Harm C. M. Knoops, Loïc Baggetto, E. Langereis, M. C. M. van de Sanden, J.H. Klootwijk, F. Roozeboom, R.A.H. Niessen, Peter H. L. Notten, W. M. M. Kessels	91
13	Deposition of TiN and TaN by Remote Plasma ALD for Diffusion Barrier Applications 2007 ·ECS Transactions ·Harm C. M. Knoops, Loïc Baggetto, E. Langereis, M. C. M. van de Sanden, J.H. Klootwijk, F. Roozeboom, R.A.H. Niessen, Peter H. L. Notten, W. M. M. Kessels	5
14	Opportunities for Plasma-Assisted Atomic Layer Deposition 2007 ·ECS Transactions ·(unknown), S. B. S. Heil, E. Langereis, (unknown), Harm C. M. Knoops, W. Keuning, M. C. M. van de Sanden	19
15	Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3 breakdown → 2006 ·Applied Physics Letters ·Bram Hoex, S. B. S. Heil, E. Langereis, M. C. M. van de Sanden, W. M. M. Kessels	625
16	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry 2005 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·S. B. S. Heil, E. Langereis, (unknown), F. Roozeboom, M. C. M. van de Sanden, W. M. M. Kessels	30
17	Plasma-surface interaction and surface diffusion during silicon-based thin-film growth 2005 ·IEEE Transactions on Plasma Science ·J.P.M. Hoefnagels, E. Langereis, W. M. M. Kessels, M. C. M. van de Sanden	5
18	Initial growth and properties of atomic layer deposited TiN films studied by in situ spectroscopic ellipsometry 2005 ·Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics ·E. Langereis, S. B. S. Heil, M. C. M. van de Sanden, W. M. M. Kessels	11
19	Plasma-assisted Atomic Layer Deposition of TiN Films at low Deposition Temperature for High-aspect Ratio Applications 2005 ·MRS Proceedings ·S. B. S. Heil, E. Langereis, F. Roozeboom, (unknown), Nga Pham, P.M. Sarro, M. C. M. van de Sanden, W. M. M. Kessels	4
20	New ultrahigh vacuum setup and advanced diagnostic techniques for studying a-Si:H film growth by radical beams 2004 ·MRS Proceedings ·J.P.M. Hoefnagels, E. Langereis, M. C. M. van de Sanden, W. M. M. Kessels	2

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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