Anders Hårsta

2.5k total citations
79 papers, 2.2k citations indexed

About

Anders Hårsta is a scholar working on Materials Chemistry, Electrical and Electronic Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Anders Hårsta has authored 79 papers receiving a total of 2.2k indexed citations (citations by other indexed papers that have themselves been cited), including 56 papers in Materials Chemistry, 49 papers in Electrical and Electronic Engineering and 18 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Anders Hårsta's work include Semiconductor materials and devices (43 papers), Electronic and Structural Properties of Oxides (31 papers) and ZnO doping and properties (13 papers). Anders Hårsta is often cited by papers focused on Semiconductor materials and devices (43 papers), Electronic and Structural Properties of Oxides (31 papers) and ZnO doping and properties (13 papers). Anders Hårsta collaborates with scholars based in Sweden, Estonia and Finland. Anders Hårsta's co-authors include Jaan Aarik, Kaupo Kukli, Jonas Sundqvist, Mikael Schuisky, Aleks Aidla, Mikko Ritala, Markku Leskelä, Katarina Forsgren, Teet Uustare and Jun Lu and has published in prestigious journals such as Nano Letters, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Anders Hårsta

78 papers receiving 2.1k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Anders Hårsta Sweden 31 1.7k 1.5k 425 201 174 79 2.2k
Kanji Yasui Japan 21 1.0k 0.6× 1.1k 0.8× 478 1.1× 297 1.5× 116 0.7× 125 1.8k
C. M. Wang United States 21 1.1k 0.7× 1.2k 0.8× 524 1.2× 178 0.9× 141 0.8× 36 2.2k
Byung‐Teak Lee South Korea 24 1.4k 0.8× 1.8k 1.2× 980 2.3× 174 0.9× 195 1.1× 100 2.2k
Masahiko Hiratani Japan 27 1.3k 0.8× 863 0.6× 514 1.2× 149 0.7× 335 1.9× 87 1.8k
A. W. Ott United States 16 1.9k 1.1× 1.7k 1.1× 349 0.8× 241 1.2× 56 0.3× 25 2.4k
Won-Seon Seo South Korea 25 964 0.6× 1.9k 1.3× 362 0.9× 211 1.0× 163 0.9× 77 2.3k
N.L. Yakovlev Singapore 20 769 0.5× 745 0.5× 295 0.7× 233 1.2× 82 0.5× 88 1.5k
Yoshio Abe Japan 23 1.2k 0.7× 1.1k 0.7× 443 1.0× 219 1.1× 110 0.6× 172 2.0k
Dangxin Wu United States 9 1.3k 0.8× 2.3k 1.6× 344 0.8× 256 1.3× 72 0.4× 12 3.1k
Y. L. Foo Singapore 27 1.2k 0.7× 1.3k 0.9× 389 0.9× 473 2.4× 84 0.5× 72 2.2k

Countries citing papers authored by Anders Hårsta

Since Specialization
Citations

This map shows the geographic impact of Anders Hårsta's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Anders Hårsta with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Anders Hårsta more than expected).

Fields of papers citing papers by Anders Hårsta

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Anders Hårsta. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Anders Hårsta. The network helps show where Anders Hårsta may publish in the future.

Co-authorship network of co-authors of Anders Hårsta

This figure shows the co-authorship network connecting the top 25 collaborators of Anders Hårsta. A scholar is included among the top collaborators of Anders Hårsta based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Anders Hårsta. Anders Hårsta is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Soroka, Inna L., Jun Lü, Mats Boman, et al.. (2009). Template-based multiwalled TiO2/iron oxides nanotubes: Structure and magnetic properties. Journal of Applied Physics. 106(8). 9 indexed citations
2.
Lindahl, Erik, et al.. (2006). Atomic Layer Deposition of Co3O4 Thin Films Using a CoI2/O2 Precursor Combination. Chemical Vapor Deposition. 12(4). 209–213. 25 indexed citations
3.
Sundqvist, Jonas, Jun Lu, Mikael Ottosson, & Anders Hårsta. (2006). Growth of SnO2 thin films by atomic layer deposition and chemical vapour deposition: A comparative study. Thin Solid Films. 514(1-2). 63–68. 87 indexed citations
4.
Kukli, Kaupo, Jaan Aarik, Teet Uustare, et al.. (2005). Engineering structure and properties of hafnium oxide films by atomic layer deposition temperature. Thin Solid Films. 479(1-2). 1–11. 32 indexed citations
5.
Kukli, Kaupo, Mikko Ritala, Jun Lü, Anders Hårsta, & Markku Leskelä. (2004). Properties of HfO[sub 2] Thin Films Grown by ALD from Hafnium tetrakis(ethylmethylamide) and Water. Journal of The Electrochemical Society. 151(8). F189–F189. 58 indexed citations
6.
Tarre, Aivar, A. Rosental, Jonas Sundqvist, et al.. (2003). Nanoepitaxy of SnO2 on α-Al2O3(012). Surface Science. 532-535. 514–518. 22 indexed citations
7.
Rosental, A., Aivar Tarre, Jonas Sundqvist, et al.. (2003). Gas sensing properties of epitaxial SnO2 thin films prepared by atomic layer deposition. Sensors and Actuators B Chemical. 93(1-3). 552–555. 74 indexed citations
8.
Moon, Byung‐Moo, et al.. (2002). Na 0.5 K 0.5 NbO 3 Thin Films for MFIS_FET Type Non-Volatile Memory Applications. Integrated ferroelectrics. 49(1). 21–30. 4 indexed citations
9.
Aarik, Jaan, Aleks Aidla, Hugo Mändar, et al.. (2002). Atomic layer growth of epitaxial TiO2 thin films from TiCl4 and H2O on α-Al2O3 substrates. Journal of Crystal Growth. 242(1-2). 189–198. 79 indexed citations
10.
Schuisky, Mikael, Kaupo Kukli, Jaan Aarik, Jun Lu, & Anders Hårsta. (2002). Epitaxial growth of TiO2 films in a hydroxyl-free atomic layer deposition process. Journal of Crystal Growth. 235(1-4). 293–299. 41 indexed citations
11.
Schuisky, Mikael, Jaan Aarik, Kaupo Kukli, Aleks Aidla, & Anders Hårsta. (2001). Atomic Layer Deposition of Thin Films Using O2 as Oxygen Source. Langmuir. 17(18). 5508–5512. 28 indexed citations
12.
Forsgren, Katarina, Anders Hårsta, Kaupo Kukli, Jaan Aarik, & Aleks Aidla. (2001). Chemical deposition routes to HfO2: real-time monitoring and film growth. 152. 1 indexed citations
13.
Schuisky, Mikael & Anders Hårsta. (1998). Halide Chemical Vapor Deposition of Bi4Ti3O12. Chemical Vapor Deposition. 4(6). 213–216. 3 indexed citations
14.
Hårsta, Anders & Jun Lu. (1997). TEM investigation of halide CVD grown Bi2Sr2CaCu2O8 + x films. Journal of Alloys and Compounds. 251(1-2). 134–137. 5 indexed citations
15.
Schuisky, Mikael & Anders Hårsta. (1996). Epitaxial growth of Bi2O2.33 by halide Cvd. Chemical Vapor Deposition. 2(6). 235–238. 53 indexed citations
16.
Hårsta, Anders, et al.. (1991). CVD OF COPPER USING CuCl AS PRECURSOR. Journal de Physique IV (Proceedings). 2(C2). C2–881. 3 indexed citations
17.
Hårsta, Anders & J.‐O. Carlsson. (1991). THERMODYNAMIC MODELING OF MOCVD OF THE SUPERCONDUCTING PHASE IN THE Bi-Sr-Ca-Cu-O SYSTEM : INFLUENCE OF METAL PRECURSOR AND OXYGEN SOURCE. Journal de Physique IV (Proceedings). 2(C2). C2–287. 1 indexed citations
18.
Hårsta, Anders & Jan‐Otto Carlsson. (1991). Thermodynamic modeling of MOCVD of Bi2Sr2CaCu2O8+x: influence of metal and oxygen source. Journal of Crystal Growth. 114(3). 507–516. 3 indexed citations
19.
Ottosson, Mikael, Anders Hårsta, & Jan‐Otto Carlsson. (1989). Thermodynamic investigation of CVD of the superconducting YBa2Cu3O7−x phase using halide precursors. Journal of Crystal Growth. 96(4). 1019–1029. 12 indexed citations
20.
Hårsta, Anders, et al.. (1982). New kappa-Phases in the Systems Hf--W--{S,As,Se} and Hf--Re--{Si,P,S,Ge,As,Se,Fe,Co,Ni}.. Acta chemica Scandinavica/Acta chemica Scandinavica. B, Organic chemistry and biochemistry/Acta chemica Scandinavica. A, Physical and inorganic chemistry/Acta chemica Scandinavica. Series B. Organic chemistry and biochemistry/Acta chemica Scandinavica. Series A, Physical and inorganic chemistry. 36a. 547–548. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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