G. Ruhl

965 citations

40 papers · 704 indexed · h-index 12

Impact in

Materials Chemistry top 10%
- Graphene research and applications
- 2D Materials and Applications
- Electronic and Structural Properties of Oxides
Electrical and Electronic Engineering top 10%
- Semiconductor materials and devices
- Ferroelectric and Negative Capacitance Devices
- Advanced Memory and Neural Computing

Papers in

Surfaces, Coatings and Films 6
- Electron and X-Ray Spectroscopy Techniques 6
Electronic, Optical and Magnetic Materials 13
- Copper Interconnects and Reliability 13

Co-authors: Christian Wenger Mindaugas Lukosius Grzegorz Łupina I. Costina Christophe Müller Max C. Lemme Mikael Östling Wolfgang Mehr
Journals: Microelectronic Engineering (5 papers)Thin Solid Films (3 papers)ECS Journal of Solid State Science and Technology (2 papers)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2 papers)IEEE Transactions on Components Packaging and Manufacturing Technology (1 paper)
Partner nations: Germany United States Lithuania

In The Last Decade

G. Ruhl

38 papers receiving 680 citations

Peers

Countries citing papers authored by G. Ruhl

Since Specialization

Citations

This map shows the geographic impact of G. Ruhl's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by G. Ruhl with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites G. Ruhl more than expected).

Fields of papers citing papers by G. Ruhl

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by G. Ruhl. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by G. Ruhl. The network helps show where G. Ruhl may publish in the future.

Co-authorship network

The 25 scholars most cited alongside G. Ruhl, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with G. Ruhl Line = papers co-authored together G. Ruhl links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	The integration of graphene into microelectronic devices Beilstein Journal of Nanotechnology ·G. Ruhl, Sebastian Wittmann, I Mazhdrakova-Chalmanova, Daniel Neumaier	2017	25
2	Going ballistic: Graphene hot electron transistors Solid State Communications ·Sam Vaziri, Anderson D. Smith, Mikael Östling, Grzegorz Łupina, J. Da̧browski, G. Lippert, Wolfgang Mehr, F. Driussi, Lambert Nyabola, Valerio Di Lecce, A. Gnudi, Matthias König, G. Ruhl, 大和筒井, Max C. Lemme	2015	31
3	Metal-Insulator-Metal capacitors with ALD grown SrTiO₃: Influence of Pt electrodes IOP Conference Series Materials Science and Engineering ·Mindaugas Lukosius, Tom Blomberg, Damian Walczyk, G. Ruhl, Christian Wenger	2012	5
4	Electrical and Morphological Properties of ALD and AVD Grown Perovskite-Type Dielectrics and Their Stacks for Metal-Insulator-Metal Applications ECS Journal of Solid State Science and Technology ·Mindaugas Lukosius, Christian Wenger, Tom Blomberg, A. Abrutis, Grzegorz Łupina, P. K. Baumann, G. Ruhl	2012	9
5	Properties of stacked SrTiO3/Al2O3 metal–insulator–metal capacitors Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Mindaugas Lukosius, Christian Wenger, Tom Blomberg, G. Ruhl	2012	8
6	Atomic Vapor Depositions of Ti–Ta–O thin films for Metal–Insulator–Metal applications Thin Solid Films ·Mindaugas Lukosius, Ariane Arias-Ortiz, Christian Wenger, G. Ruhl, S. Rushworth, P. K. Baumann	2011	7
7	Electrical characteristics of Ti–Ta–O based MIM capacitors Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Mindaugas Lukosius, Ariane Arias-Ortiz, Christian Wenger, G. Ruhl, S. Rushworth	2011	4
8	(Invited) ALD and AVD Grown Perovskite-type Dielectrics for Metal-Insulator-Metal Applications ECS Transactions ·Christian Wenger, Mindaugas Lukosius, Tom Blomberg, A. Abrutis, P. K. Baumann, G. Ruhl	2011	1
9	Investigations of thermal annealing effects on electrical and structural properties of SrTaO based MIM capacitor Microelectronic Engineering ·Ariane Arias-Ortiz, Mindaugas Lukosius, I. Costina, Bernd Tillack, Christian Wenger, G. Ruhl, S. Rushworth	2010	9
10	Investigation of Cr etch chamber seasoning Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Pavel Nesládek, G. Ruhl, Msiii Sokas	2004	1
11	Numerical and experimental study of oxide growth on EUV mask capping layers Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·C. Romijn, V. Y. Kramov, U. Dersch, G. Ruhl, Jan Perlich	2004	3
12	Microwave plasma resist stripping for mask manufacturing Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·G. Ruhl, Pavel Nesládek, Patrick Buccato	2002	0
13	Endpoint solution for photomask chrome loads down to 0.25% Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·熊谷元, Sandra Espíndola Lunardelli, Rafik Dembri, G. Ruhl	2002	7
14	Development and characterization of a new plasma etching process for mask manufacturing Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Aqilatul Muyassaroh, G. Ruhl, Saidobid S. Sаidоv, Anastasia V. Povecherova, Hasan Jamil, Pavel Nesládek	2001	1
15	Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Christoph M. Friedrich, Achmad Yusuf Budianto, Andreas Erdmann, Matthew R. Vindigni, �. Lazar, G. Hoffmann, Virginijus Kanapė, J.A.F. Peters, Hasan Jamil, G. Ruhl, Wilhelm Maurer	2000	11
16	Low dielectric constant materials for interlayer dielectric Microelectronic Engineering ·Pegah Farhang, G. Ruhl, Isadora Fernandes Zangeroli, Yuan-jia Tang, Christophe Müller, Hao Feng	1998	94
17	Vertically integrated circuits. A key technology for future high performance systems Fraunhofer-Publica (Fraunhofer-Gesellschaft) ·M. Engelhardt, (unknown), (unknown), M.B. Kleiner, Stefan Kühn, W. Pamler, Elisabeth Renner, Amit Sanger, Ulrich Scheler, (unknown), Haris Hakam, Johannes Weber, Володимир Боголюбов, Shu-Ping Gong, K. Hieber, (unknown), Armin Klumpp, Christof Landesberger, 高维全, (unknown), G. Ruhl, Julian Weber	1997	1
18	In Situ XPS Studies of the Deposition of TiN_xC_y Films from Tetrakis(dimethylamido)titanium(IV) and Bis[N,N‘-bis(tert-butyl)ethylenediamido]titanium(IV) Chemistry of Materials ·G. Ruhl, Ana Mafalda Santos Agria de Almeida Ferreira, Силина Елена Алексеевна, 英美奥野, S. Vepřek	1996	26
19	Photoluminescence from OH-related radiative centres in silica, metal oxides and oxidized nanocrystalline and porous silicon Journal of Luminescence ·M. Rückschloß, Thembisile Muteyi, Hideki Tamura, G. Ruhl, J. Oswald, S. Vepřek	1995	50
20	Deposition of titanium nitride/tungsten layers for application in vertically integrated circuits technology Applied Surface Science ·G. Ruhl, Sunn, Peter Ramm, De Bartolo, W. Pamler	1995	11

About G. Ruhl

G. Ruhl is a scholar working on Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering, Mechanics of Materials and Materials Chemistry, having authored 40 papers that have together received 704 indexed citations. Recurring topics across this work include Semiconductor materials and devices (23 papers), Copper Interconnects and Reliability (13 papers), Advancements in Photolithography Techniques (11 papers), Ferroelectric and Negative Capacitance Devices (10 papers), Metal and Thin Film Mechanics (7 papers), Graphene research and applications (6 papers), Ferroelectric and Piezoelectric Materials (6 papers) and Electron and X-Ray Spectroscopy Techniques (6 papers). The work is most often cited by research in Materials Chemistry (483 citations), Electrical and Electronic Engineering (432 citations), Electronic, Optical and Magnetic Materials (114 citations), Polymers and Plastics (71 citations) and Surfaces, Coatings and Films (32 citations). G. Ruhl has collaborated with scholars based in Germany, United States and Lithuania. Frequent co-authors include Christian Wenger, Mindaugas Lukosius, Grzegorz Łupina, I. Costina, Christophe Müller, Max C. Lemme, Mikael Östling, Wolfgang Mehr, Sam Vaziri and Amit Gahoi. Their work appears in journals such as Microelectronic Engineering, Thin Solid Films, ECS Journal of Solid State Science and Technology, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena and IEEE Transactions on Components Packaging and Manufacturing Technology.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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