L. Lamagna

953 total citations
45 papers, 729 citations indexed

About

L. Lamagna is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, L. Lamagna has authored 45 papers receiving a total of 729 indexed citations (citations by other indexed papers that have themselves been cited), including 44 papers in Electrical and Electronic Engineering, 28 papers in Materials Chemistry and 16 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in L. Lamagna's work include Semiconductor materials and devices (41 papers), Electronic and Structural Properties of Oxides (21 papers) and Semiconductor materials and interfaces (13 papers). L. Lamagna is often cited by papers focused on Semiconductor materials and devices (41 papers), Electronic and Structural Properties of Oxides (21 papers) and Semiconductor materials and interfaces (13 papers). L. Lamagna collaborates with scholars based in Italy, France and Belgium. L. Lamagna's co-authors include M. Fanciulli, Sabina Spiga, Claudia Wiemer, Alessio Lamperti, Alessandro Molle, Michele Perego, Dimitra Tsoutsou, G. Scarel, Sylvie Schamm‐Chardon and Silvia C. Capelli and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Chemistry of Materials.

In The Last Decade

L. Lamagna

44 papers receiving 697 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
L. Lamagna Italy 18 642 468 126 104 57 45 729
Laegu Kang United States 12 1.3k 1.9× 509 1.1× 149 1.2× 146 1.4× 43 0.8× 27 1.3k
Moonju Cho South Korea 22 1.5k 2.3× 619 1.3× 152 1.2× 95 0.9× 48 0.8× 59 1.6k
Jaehoo Park South Korea 16 925 1.4× 546 1.2× 118 0.9× 101 1.0× 55 1.0× 29 971
R. Gregory United States 18 988 1.5× 542 1.2× 164 1.3× 162 1.6× 60 1.1× 46 1.1k
M. Badylevich Belgium 11 395 0.6× 355 0.8× 171 1.4× 58 0.6× 75 1.3× 25 513
Jae-Sung Roh South Korea 16 693 1.1× 430 0.9× 98 0.8× 162 1.6× 56 1.0× 57 789
Petri I. Räisänen United States 7 893 1.4× 598 1.3× 98 0.8× 122 1.2× 27 0.5× 9 971
M. W. Stoker United States 13 631 1.0× 411 0.9× 108 0.9× 51 0.5× 61 1.1× 28 765
G. Pavia Italy 12 495 0.8× 358 0.8× 127 1.0× 89 0.9× 63 1.1× 46 658
M. Lemberger Germany 16 1.2k 1.8× 785 1.7× 110 0.9× 92 0.9× 53 0.9× 43 1.3k

Countries citing papers authored by L. Lamagna

Since Specialization
Citations

This map shows the geographic impact of L. Lamagna's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by L. Lamagna with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites L. Lamagna more than expected).

Fields of papers citing papers by L. Lamagna

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by L. Lamagna. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by L. Lamagna. The network helps show where L. Lamagna may publish in the future.

Co-authorship network of co-authors of L. Lamagna

This figure shows the co-authorship network connecting the top 25 collaborators of L. Lamagna. A scholar is included among the top collaborators of L. Lamagna based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with L. Lamagna. L. Lamagna is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Cianci, E., Alessio Lamperti, G. Tallarida, et al.. (2018). Advanced protective coatings for reflectivity enhancement by low temperature atomic layer deposition of HfO2 on Al surfaces for micromirror applications. Sensors and Actuators A Physical. 282. 124–131. 13 indexed citations
2.
Berdova, Maria, Claudia Wiemer, Alessio Lamperti, et al.. (2016). Protective coatings of hafnium dioxide by atomic layer deposition for microelectromechanical systems applications. Applied Surface Science. 368. 470–476. 9 indexed citations
3.
Shimizu, Yasuo, Hisashi Takamizawa, Koji Inoue, et al.. (2013). Behavior of phosphorous and contaminants from molecular doping combined with a conventional spike annealing method. Nanoscale. 6(2). 706–710. 36 indexed citations
4.
Lamagna, L., Gabriele Seguini, M. Fanciulli, et al.. (2011). The fabrication of tunable nanoporous oxide surfaces by block copolymer lithography and atomic layer deposition. Nanotechnology. 22(33). 335303–335303. 22 indexed citations
5.
Lamagna, L., Alessandro Molle, Claudia Wiemer, et al.. (2011). Atomic Layer Deposition of Al-Doped ZrO2 Thin Films for Advanced Gate Stack on III-V Substrates. ECS Transactions. 35(3). 431–440. 1 indexed citations
6.
Leick, Noémi, et al.. (2011). Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 29(2). 50 indexed citations
7.
8.
Lamperti, Alessio, et al.. (2011). Cubic/Tetragonal Phase Stabilization in High-κ ZrO2 Thin Films Grown Using O3-Based Atomic Layer Deposition. Journal of The Electrochemical Society. 158(10). G221–G221. 39 indexed citations
9.
Lamperti, Alessio, et al.. (2011). Stack engineering of TANOS charge-trap flash memory cell using high-κ ZrO2 grown by ALD as charge trapping layer. Microelectronic Engineering. 88(7). 1174–1177. 20 indexed citations
10.
Lamagna, L., Claudia Wiemer, Michele Perego, et al.. (2010). O 3 -based atomic layer deposition of hexagonal La2O3 films on Si(100) and Ge(100) substrates. Journal of Applied Physics. 108(8). 28 indexed citations
11.
Wiemer, Claudia, L. Lamagna, Michele Perego, et al.. (2010). Dielectric properties of Er−doped HfO2 (Er∼15%) grown by atomic layer deposition for high-κ gate stacks. Applied Physics Letters. 96(18). 37 indexed citations
12.
Zenkevich, A., Yu. Yu. Lebedinskiǐ, Yu. Matveyev, et al.. (2009). Effect of heat treatments on electric dipole at metal/high-k dielectric interfaces measured by in situ XPS. Microelectronic Engineering. 86(7-9). 1777–1779. 3 indexed citations
13.
Molle, Alessandro, Guy Brammertz, L. Lamagna, et al.. (2009). Ge-based interface passivation for atomic layer deposited La-doped ZrO2 on III-V compound (GaAs,In0.15Ga0.85As) substrates. Applied Physics Letters. 95(2). 22 indexed citations
14.
Lamagna, L.. (2009). Atomic layer deposition and characterization of rare earth oxides for innovation in microelectronics. BOA (University of Milano-Bicocca). 1 indexed citations
15.
Lamagna, L., Claudia Wiemer, Alessandro Molle, et al.. (2009). Thermally induced permittivity enhancement in La-doped ZrO2 grown by atomic layer deposition on Ge(100). Applied Physics Letters. 95(12). 30 indexed citations
16.
Molle, Alessandro, L. Lamagna, Sabina Spiga, et al.. (2009). Interface analysis of Ge ultra thin layers intercalated between GaAs substrates and oxide stacks. Thin Solid Films. 518(6). S123–S127. 4 indexed citations
17.
Alessandri, M., Annalisa Del Vitto, Claudia Wiemer, et al.. (2009). Rare earth-based high-k materials for non-volatile memory applications. Microelectronic Engineering. 87(3). 290–293. 8 indexed citations
18.
Tsoutsou, Dimitra, G. Scarel, A. Debernardi, et al.. (2008). Infrared spectroscopy and X-ray diffraction studies on the crystallographic evolution of La2O3 films upon annealing. Microelectronic Engineering. 85(12). 2411–2413. 36 indexed citations
19.
Weber, W., Lutz Geelhaar, L. Lamagna, et al.. (2008). Tuning the Polarity of Si-Nanowire Transistors Without the Use of Doping. 580–581. 13 indexed citations
20.
Liu, Lu, L. Lamagna, Claudia Wiemer, et al.. (2008). Chemical/Structural Nanocharacterization and Electrical Properties of ALD-Grown La[sub 2]O[sub 3]∕Si Interfaces for Advanced Gate Stacks. Journal of The Electrochemical Society. 156(1). H1–H1. 24 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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