W. Keuning

1.1k total citations
24 papers, 969 citations indexed

About

W. Keuning is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, W. Keuning has authored 24 papers receiving a total of 969 indexed citations (citations by other indexed papers that have themselves been cited), including 21 papers in Electrical and Electronic Engineering, 10 papers in Materials Chemistry and 9 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in W. Keuning's work include Semiconductor materials and devices (17 papers), Copper Interconnects and Reliability (7 papers) and Electronic and Structural Properties of Oxides (5 papers). W. Keuning is often cited by papers focused on Semiconductor materials and devices (17 papers), Copper Interconnects and Reliability (7 papers) and Electronic and Structural Properties of Oxides (5 papers). W. Keuning collaborates with scholars based in Netherlands, Belgium and United Kingdom. W. Keuning's co-authors include W. M. M. Kessels, M. C. M. van de Sanden, E. Langereis, G. Dingemans, Harm C. M. Knoops, S. B. S. Heil, Mariadriana Creatore, Stephen E. Potts, Dieter Pierreux and B. L. Williams and has published in prestigious journals such as The Journal of Chemical Physics, Journal of Applied Physics and Advanced Energy Materials.

In The Last Decade

W. Keuning

24 papers receiving 937 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
W. Keuning Netherlands 14 786 633 143 100 85 24 969
Fachun Lai China 19 634 0.8× 780 1.2× 201 1.4× 142 1.4× 64 0.8× 52 1.0k
Dragos Seghete United States 13 868 1.1× 656 1.0× 127 0.9× 166 1.7× 70 0.8× 23 1.0k
Tonya M. Klein United States 16 536 0.7× 477 0.8× 194 1.4× 59 0.6× 85 1.0× 28 766
Chu‐Chi Ting Taiwan 17 419 0.5× 662 1.0× 90 0.6× 127 1.3× 75 0.9× 41 849
E. San Andrés Spain 18 779 1.0× 426 0.7× 99 0.7× 102 1.0× 147 1.7× 85 925
Jan Musschoot Belgium 16 691 0.9× 581 0.9× 205 1.4× 54 0.5× 56 0.7× 25 916
C. Chaneliere France 9 769 1.0× 460 0.7× 210 1.5× 49 0.5× 111 1.3× 12 908
Z. A. Sechrist United States 7 457 0.6× 582 0.9× 103 0.7× 88 0.9× 69 0.8× 9 758
Bhaskar Chandra Mohanty India 17 625 0.8× 651 1.0× 79 0.6× 131 1.3× 66 0.8× 62 824
J. Bertomeu Spain 20 930 1.2× 767 1.2× 70 0.5× 198 2.0× 125 1.5× 110 1.2k

Countries citing papers authored by W. Keuning

Since Specialization
Citations

This map shows the geographic impact of W. Keuning's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by W. Keuning with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites W. Keuning more than expected).

Fields of papers citing papers by W. Keuning

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by W. Keuning. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by W. Keuning. The network helps show where W. Keuning may publish in the future.

Co-authorship network of co-authors of W. Keuning

This figure shows the co-authorship network connecting the top 25 collaborators of W. Keuning. A scholar is included among the top collaborators of W. Keuning based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with W. Keuning. W. Keuning is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Carbone, E., M. W. G. M. Verhoeven, W. Keuning, & J.J.A.M. van der Mullen. (2016). PTFE treatment by remote atmospheric Ar/O2plasmas: a simple reaction scheme model proposal. Journal of Physics Conference Series. 715. 12011–12011. 13 indexed citations
2.
Verheijen, Marcel A., et al.. (2016). Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches. The Journal of Chemical Physics. 146(5). 52818–52818. 16 indexed citations
3.
Williams, B. L., Jonathan D. Major, Leon Bowen, et al.. (2015). A Comparative Study of the Effects of Nontoxic Chloride Treatments on CdTe Solar Cell Microstructure and Stoichiometry. Advanced Energy Materials. 5(21). 34 indexed citations
4.
Williams, B. L., Sjoerd Smit, B. Kniknie, et al.. (2015). Identifying parasitic current pathways in CIGS solar cells by modelling dark J–V response. Progress in Photovoltaics Research and Applications. 23(11). 1516–1525. 97 indexed citations
5.
Starostin, Sergey A., et al.. (2015). Synergy Between Plasma‐Assisted ALD and Roll‐to‐Roll Atmospheric Pressure PE‐CVD Processing of Moisture Barrier Films on Polymers. Plasma Processes and Polymers. 13(3). 311–315. 19 indexed citations
6.
Sharma, Nidhi, Colin Daniels, W. Keuning, et al.. (2014). Multi-channel Andreev reflection in Co–W nanocontacts fabricated using focused electron/ion beam induced deposition. Nanotechnology. 25(49). 495201–495201. 7 indexed citations
7.
Aslam, Nabeel, Valentino Longo, W. Keuning, et al.. (2013). Influence of stoichiometry on the performance of MIM capacitors from plasma‐assisted ALD SrxTiyOz films. physica status solidi (a). 211(2). 389–396. 11 indexed citations
8.
Roozeboom, F., G. Dingemans, W. Keuning, et al.. (2013). Alternative technology concepts for low-cost and high-speed 2D and 3D interconnect manufacturing. IMAPSource Proceedings. 2013(1). 1–6. 1 indexed citations
9.
Zardetto, Valerio, Francesco Di Giacomo, Diana Garcia‐Alonso, et al.. (2013). Fully Plastic Dye Solar Cell Devices by Low‐Temperature UV‐Irradiation of both the Mesoporous TiO2 Photo‐ and Platinized Counter‐Electrodes. Advanced Energy Materials. 3(10). 1292–1298. 62 indexed citations
10.
Roozeboom, F., B. Kniknie, Adriaan Lankhorst, et al.. (2013). A New Concept for Spatially-Divided Reactive Ion Etching with ALD-Based Passivation. ECS Transactions. 50(32). 73–82. 3 indexed citations
11.
Verheijen, Marcel A., et al.. (2012). Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition (vol 112, 043708, 2012). Journal of Applied Physics. 112. 1. 20 indexed citations
12.
Roozeboom, F., et al.. (2012). A new concept for spatially divided Deep Reactive Ion Etching with ALD-based passivation. IOP Conference Series Materials Science and Engineering. 41. 12001–12001. 8 indexed citations
13.
Keuning, W., et al.. (2011). Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 30(1). 46 indexed citations
14.
Potts, Stephen E., W. Keuning, E. Langereis, et al.. (2010). Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films. Journal of The Electrochemical Society. 157(7). P66–P66. 155 indexed citations
15.
Langereis, E., et al.. (2009). In situ spectroscopic ellipsometry for atomic layer deposition. Munich Personal RePEc Archive (Ludwig Maximilian University of Munich). 2010(36). 36–41. 1 indexed citations
16.
Sioncke, Sonja, Annelies Delabie, Guy Brammertz, et al.. (2009). Thermal and Plasma Enhanced Atomic Layer Deposition of Al[sub 2]O[sub 3] on GaAs Substrates. Journal of The Electrochemical Society. 156(4). H255–H255. 16 indexed citations
17.
Langereis, E., S. B. S. Heil, Harm C. M. Knoops, et al.. (2009). In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition. Journal of Physics D Applied Physics. 42(7). 73001–73001. 259 indexed citations
18.
Potts, Stephen E., G. Dingemans, E. Langereis, et al.. (2009). Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films. ECS Transactions. 25(4). 233–242. 3 indexed citations
19.
Karouta, F., et al.. (2008). Investigation of AI2O3 deposited by ALD as passivation layers for InP-based nano lasers. Munich Personal RePEc Archive (Ludwig Maximilian University of Munich). 47(2). 195–198. 1 indexed citations
20.
Heil, S. B. S., et al.. (2007). Opportunities for Plasma-Assisted Atomic Layer Deposition. ECS Transactions. 3(15). 183–190. 19 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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