S. Lhostis
-
- Semiconductor materials and devices 30
- 3D IC and TSV technologies 28
- Electronic Packaging and Soldering Technologies 17
- Integrated Circuits and Semiconductor Failure Analysis 14
- Advancements in Semiconductor Devices and Circuit Design 9
- Ferroelectric and Negative Capacitance Devices 8
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- Copper Interconnects and Reliability 13
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- Electronic and Structural Properties of Oxides 8
- Cited by
- Electrical and Electronic EngineeringElectronic, Optical and Magnetic MaterialsMaterials Chemistry
- Journals
- Microelectronics Reliability (5 papers)Microelectronic Engineering (4 papers)ECS Journal of Solid State Science and Technology (3 papers)
- Partner nations
- FranceSwitzerlandIndia
In The Last Decade
S. Lhostis
67 papers receiving 727 citations
Peers
Comparison fields: 5 of 44
- Electrical and Electronic Engineering 600
- Electronic, Optical and Magnetic Materials 172
- Materials Chemistry 291
- Surfaces, Coatings and Films 36
- Automotive Engineering 50
Countries citing papers authored by S. Lhostis
This map shows the geographic impact of S. Lhostis's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. Lhostis with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. Lhostis more than expected).
Fields of papers citing papers by S. Lhostis
This network shows the impact of papers produced by S. Lhostis. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. Lhostis. The network helps show where S. Lhostis may publish in the future.
Co-authorship network
The 25 scholars most cited alongside S. Lhostis, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2024 | 0 | |
| 2 | 2023 | 4 | |
| 3 | 2023 | 1 | |
| 4 | 2022 | 35 | |
| 5 | 2022 | 1 | |
| 6 | 2021 | 5 | |
| 7 | 2017 | 27 | |
| 8 | 2015 | 16 | |
| 9 | 2015 | 2 | |
| 10 | 2014 | 12 | |
| 11 | Impact of integrating microchannel cooling within 3D microelectronic packages for portable applications | 2013 | 2 |
| 12 | 2013 | 23 | |
| 13 | 2011 | 13 | |
| 14 | 2011 | 19 | |
| 15 | 2008 | 7 | |
| 16 | Chemical interface analysis of as grown HfO[sub 2] ultrathin films on SiO[sub 2] | 2007 | 3 |
| 17 | 2007 | 4 | |
| 18 | 2007 | 21 | |
| 19 | 2005 | 26 | |
| 20 | 2004 | 10 |
About S. Lhostis
S. Lhostis is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Materials Chemistry and Hardware and Architecture, having authored 70 papers that have together received 750 indexed citations. Recurring topics across this work include Semiconductor materials and devices (30 papers), 3D IC and TSV technologies (28 papers), Electronic Packaging and Soldering Technologies (17 papers), Integrated Circuits and Semiconductor Failure Analysis (14 papers), Copper Interconnects and Reliability (13 papers), Advancements in Semiconductor Devices and Circuit Design (9 papers), Ferroelectric and Negative Capacitance Devices (8 papers) and Electronic and Structural Properties of Oxides (8 papers). The work is most often cited by research in Electrical and Electronic Engineering (600 citations), Electronic, Optical and Magnetic Materials (172 citations), Materials Chemistry (291 citations), Surfaces, Coatings and Films (36 citations) and Automotive Engineering (50 citations). S. Lhostis has collaborated with scholars based in France, Switzerland and India. Frequent co-authors include S. Moreau, A. Roule, S. Maı̂trejean, H. Frémont, E. Gourvest, C. Vallée, B. Pelissier, E. Martínez, E. Deloffre and D. Bouchu. Their work appears in journals such as Microelectronics Reliability, Microelectronic Engineering, ECS Journal of Solid State Science and Technology, Journal of The Electrochemical Society and IEEE Electron Device Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.