Tom Blomberg

743 total citations
30 papers, 377 citations indexed

About

Tom Blomberg is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Tom Blomberg has authored 30 papers receiving a total of 377 indexed citations (citations by other indexed papers that have themselves been cited), including 20 papers in Electrical and Electronic Engineering, 14 papers in Materials Chemistry and 7 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Tom Blomberg's work include Semiconductor materials and devices (18 papers), Ferroelectric and Negative Capacitance Devices (9 papers) and Copper Interconnects and Reliability (7 papers). Tom Blomberg is often cited by papers focused on Semiconductor materials and devices (18 papers), Ferroelectric and Negative Capacitance Devices (9 papers) and Copper Interconnects and Reliability (7 papers). Tom Blomberg collaborates with scholars based in Germany, United States and Finland. Tom Blomberg's co-authors include Suvi Haukka, S. Marcus, Kai‐Erik Elers, Brad Aitchison, Christian Wenger, G. Ruhl, Mindaugas Lukosius, Matti Hiltunen, M. Gros‐Jean and P. K. Baumann and has published in prestigious journals such as Journal of Applied Physics, Chemistry of Materials and Journal of The Electrochemical Society.

In The Last Decade

Tom Blomberg

30 papers receiving 359 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Tom Blomberg Germany 12 249 212 92 55 39 30 377
Qingyun Sun China 13 147 0.6× 260 1.2× 105 1.1× 84 1.5× 37 0.9× 31 428
Yuanping Chen United States 10 274 1.1× 120 0.6× 27 0.3× 54 1.0× 25 0.6× 34 357
Ian Kerr United Kingdom 6 223 0.9× 161 0.8× 31 0.3× 12 0.2× 100 2.6× 7 377
V. Balitska Ukraine 15 212 0.9× 419 2.0× 63 0.7× 58 1.1× 106 2.7× 57 512
Yen-Hsing Liu Taiwan 11 176 0.7× 167 0.8× 119 1.3× 65 1.2× 20 0.5× 22 405
Etsuo Hamada Japan 9 84 0.3× 244 1.2× 51 0.6× 42 0.8× 15 0.4× 20 333
Y. Matsui Japan 10 226 0.9× 118 0.6× 69 0.8× 11 0.2× 30 0.8× 48 348
Sumio Kamiya Japan 10 156 0.6× 180 0.8× 115 1.3× 35 0.6× 27 0.7× 18 347
Sandeep Dalal India 8 178 0.7× 179 0.8× 79 0.9× 54 1.0× 53 1.4× 26 356

Countries citing papers authored by Tom Blomberg

Since Specialization
Citations

This map shows the geographic impact of Tom Blomberg's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Tom Blomberg with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Tom Blomberg more than expected).

Fields of papers citing papers by Tom Blomberg

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Tom Blomberg. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Tom Blomberg. The network helps show where Tom Blomberg may publish in the future.

Co-authorship network of co-authors of Tom Blomberg

This figure shows the co-authorship network connecting the top 25 collaborators of Tom Blomberg. A scholar is included among the top collaborators of Tom Blomberg based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Tom Blomberg. Tom Blomberg is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
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Blomberg, Tom, Suvi Haukka, Michael Givens, et al.. (2020). Thermal gas-phase etching of titanium nitride (TiN) by thionyl chloride (SOCl2). Applied Surface Science. 540. 148309–148309. 4 indexed citations
4.
Blomberg, Tom. (2020). Role of potassium hydroxide in fouling and fireside corrosion processes in biomass-fired boilers. 2 indexed citations
5.
Ruhl, G., Mindaugas Lukosius, Christian Wenger, et al.. (2014). Dielectric Material Options for Integrated Capacitors. ECS Journal of Solid State Science and Technology. 3(8). N120–N125. 8 indexed citations
6.
Lukosius, Mindaugas, Tom Blomberg, Damian Walczyk, G. Ruhl, & Christian Wenger. (2012). Metal-Insulator-Metal capacitors with ALD grown SrTiO3: Influence of Pt electrodes. IOP Conference Series Materials Science and Engineering. 41. 12015–12015. 5 indexed citations
7.
Blomberg, Tom, Suvi Haukka, M. Tuominen, et al.. (2012). Textured strontium titanate layers on platinum by atomic layer deposition. Thin Solid Films. 520(21). 6535–6540. 6 indexed citations
8.
Lukosius, Mindaugas, Christian Wenger, Tom Blomberg, et al.. (2012). Electrical and Morphological Properties of ALD and AVD Grown Perovskite-Type Dielectrics and Their Stacks for Metal-Insulator-Metal Applications. ECS Journal of Solid State Science and Technology. 1(1). N1–N5. 9 indexed citations
9.
Lukosius, Mindaugas, Christian Wenger, Tom Blomberg, & G. Ruhl. (2012). Properties of stacked SrTiO3/Al2O3 metal–insulator–metal capacitors. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 31(1). 8 indexed citations
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Elliott, Simon D., Tom Blomberg, & Ola Nilsen. (2011). Reaction Mechanisms in ALD of Ternary Oxides. ECS Meeting Abstracts. MA2011-02(26). 1854–1854. 3 indexed citations
12.
Wenger, Christian, Mindaugas Lukosius, Tom Blomberg, et al.. (2011). (Invited) ALD and AVD Grown Perovskite-type Dielectrics for Metal-Insulator-Metal Applications. ECS Transactions. 41(2). 53–61. 1 indexed citations
13.
Maı̂trejean, S., S. Lhostis, Suvi Haukka, et al.. (2011). Demonstration of Phase Change Memories devices using Ge<inf>2</inf>Sb<inf>2</inf>Te<inf>5</inf> films deposited by Atomic Layer Deposition. 29. 1–3. 2 indexed citations
14.
Lukosius, Mindaugas, et al.. (2011). Properties of atomic-vapor and atomic-layer deposited Sr, Ti, and Nb doped Ta2O5 Metal–Insulator–Metal capacitors. Thin Solid Films. 520(14). 4576–4579. 5 indexed citations
15.
Blomberg, Tom, et al.. (2011). ALD grown NbTaO based MIM capacitors. Microelectronic Engineering. 88(8). 2447–2451. 13 indexed citations
16.
Blomberg, Tom. (2010). A thermodynamic study of the gaseous potassium chemistry in the convection sections of biomass fired boilers. Materials and Corrosion. 62(7). 635–641. 29 indexed citations
17.
Blomberg, Tom, E. Blanquet, Philippe Bouvet, et al.. (2008). Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient. Journal of The Electrochemical Society. 155(8). H625–H625. 40 indexed citations
18.
Blomberg, Tom, Raija Matero, Suvi Haukka, & Andrew Root. (2008). Studies on the Surface Reactions of Substituted Disilanes with Silica Surface. MRS Proceedings. 1066. 1 indexed citations
19.
Wilk, G. D., Johan Swerts, Jan Willem Maes, et al.. (2007). Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing. 359–365. 11 indexed citations
20.
Blomberg, Tom. (2006). Which are the right test conditions for the simulation of high temperature alkali corrosion in biomass combustion?. Materials and Corrosion. 57(2). 170–175. 24 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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