A. See

1.1k citations

74 papers · 873 indexed · h-index 18

Electrical and Electronic Engineering top 5%
- Silicon and Solar Cell Technologies 30
- Semiconductor materials and devices 30
- Integrated Circuits and Semiconductor Failure Analysis 29
- Advancements in Semiconductor Devices and Circuit Design 10
Atomic and Molecular Physics, and Optics top 10%
- Semiconductor materials and interfaces 22
Computational Mechanics top 5%
- Ion-surface interactions and analysis 14
- Laser Material Processing Techniques 7
Materials Chemistry
- Silicon Nanostructures and Photoluminescence 8
Electronic, Optical and Magnetic Materials

Co-authors: Andrew T. S. Wee K. L. Pey Zexiang Shen Hao Gong L. Chan G. D. Wilk Petri I. Räisänen S. K. Lahiri
Cited by: Electrical and Electronic Engineering Atomic and Molecular Physics, and Optics Computational Mechanics
Journals: Applied Physics Letters (8 papers)Journal of The Electrochemical Society (7 papers)Journal of Applied Physics (6 papers)
Partner nations: Singapore United States France

In The Last Decade

A. See

71 papers receiving 836 citations

Peers

Countries citing papers authored by A. See

Since Specialization

Citations

This map shows the geographic impact of A. See's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. See with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. See more than expected).

Fields of papers citing papers by A. See

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. See. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. See. The network helps show where A. See may publish in the future.

Co-authorship network

The 25 scholars most cited alongside A. See, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with A. See Line = papers co-authored together A. See links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	High temperature ferromagnetic resonance study on pMTJ stacks with diffusion barrier layers Journal of Physics D Applied Physics ·Juan Carlos Bañados M.,T. Tahmasebi,Funan Tan,Tianli Jin,Wei Liang Gan,Amaia Hernández Auzmendi,Shengfei Liu,恒視田村,Xia Zhao,C. S. Seet,A. See,S. N. Piramanayagam,Wen Siang Lew	2018	3
2	Mechanism of Stress Memorization Technique (SMT) and Method to Maximize Its Effect IEEE Electron Device Letters ·Zbyněk Tomiška,Destri Asirika,Hania Gajewska,S. Flachowsky,T. Herrmann,Rosemary Hickey -Vargas,F. Bénistant,A. See,Nacny Steinbach,C. Clément	2011	10
3	Loading Effect of Selective Epitaxial Growth of Silicon Germanium in Submicrometer-Scale Silicon (001) Windows Electrochemical and Solid-State Letters ·Jinping Liu,Han Guan Chew,A. See,Juan Pablo Coppola,L. C. Hsia	2009	2
4	Deactivation Induced Within Wafer Nonuniformity During Nonmelt Laser Annealing of Arsenic and Phosphorus Implanted Silicon IEEE Transactions on Semiconductor Manufacturing ·Anne Krogh Larsen,A. See,Meisheng Zhou,Cui-Hua Wang	2009	5
5	Near-field Raman imaging using optically trapped dielectric microsphere Optics Express ·Johnson Kasim,Ting Yu,You Meng,Ping Liu,A. See,Lain‐Jong Li,Zexiang Shen	2008	40
6	The Effect of Film Thickness on the C40 TiSi[sub 2] to C54 TiSi[sub 2] Transition Temperature Journal of The Electrochemical Society ·Swee Ching Tan,Lei Liu,William Geisbert,A. See,Zexiang Shen	2005	3
7	Bias-temperature stress analysis of Cu∕ultrathin Ta∕SiO2∕Si interconnect structure Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Jian Chen,Fanshu Jiao,J Zattoni,J Koziol,A. See,Yal�in Co kuner,N IUPPA,N.L. Yakovlev	2004	3
8	Multiple-pulse laser annealing of preamorphized silicon for ultrashallow boron junction formation Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Anne Krogh Larsen,Byung Jin Cho,Yongfeng Lu,Katrina Marian Fernandez.,A. See	2003	18
9	Applications of micro-Raman spectroscopy in salicide characterization for Si device fabrication Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Feng Zhao,曲璐 Qu Lu,Zexiang Shen,Luo Baozhang,Jingjing Zheng,A. See,L. H. Chan	2003	27
10	Negative-bias-temperature-instability (NBTI) for p/sup +/-gate pMOSFET with ultra-thin plasma-nitrided gate dielectrics N.К. Seitzhapparov,T. P. Chen,Marcelo Jordao Silva,Robert Cordingly,E. Mohanapriya,Hans-Guenter Kremser,A. See,Lap Chan	2003	3
11	Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID Marcos Joshua Mariño Lozano,S Yamanaka,Eng Fong Chor,A. See	2002	1
12	Laser-induced amorphization of silicon during pulsed-laser irradiation of TiN/Ti/polycrystalline silicon/SiO2/silicon Applied Physics Letters ·Y. F. Chong,K. L. Pey,Andrew T. S. Wee,Michael O. Thompson,Ching‐Hsuan Tung,A. See	2002	12
13	Structural study of refractory-metal-free C40 TiSi2 and its transformation to C54 TiSi2 Applied Physics Letters ·Ting Yu,Swee Ching Tan,Zexiang Shen,Luwei Chen,Jyi-Tsong Lin,A. See	2002	18
14	Application of phase-imaging tapping-mode atomic-force microscopy to investigate the grain growth and surface morphology of TiSi2 Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Changhyun Pang,Peter Hing,A. See	2002	7
15	Steep retrograde indium channel profiling for high performance nMOSFETs device fabrication Microelectronics Journal ·Elena A. Kushnikova,Eng Fong Chor,Yuet‐Kin Leung,James Lee,В.О. Юхимчук,A. See,Lap Chan	2002	2
16	Effects of oxygen flooding on crater bottom composition and roughness in ultrashallow secondary ion mass spectrometry depth profiling Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·C. M. Ng,Andrew T. S. Wee,C. H. A. Huan,A. See	2001	17
17	Application of attenuated phase-shifting masks to sub-130-nm lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Joke Somers,Merlin Vianda,Qunying Lin,Chica Francisco,Hui Jing Lee,Siu Chung Tam,A. See	2001	0
18	Effect of via etching process and postclean treatment on via electrical performance Journal of Electronic Materials ·Nice Ardiana,Stefano Catalano,Hua Qing-cuo,Wang Ling Goh,Man Siu Tse,A. See	2001	0
19	Laser-induced formation of titanium silicides Surface and Interface Analysis ·Fabiana Polichetti,Zexiang Shen,Adam Galkovski,A. See,L. H. Chan,Mariella Affonseca,Carol Ann Walk	1999	5
20	Effects of ramp-up rates on the salicide process Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Lee Kong,Li Lü,Vivek Kute,Zexiang Shen,A. See,L. H. Chan,أحمد عبد اللطيف عبادة,T. K. Chan	1999	1

About A. See

A. See is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Atomic and Molecular Physics, and Optics, having authored 74 papers that have together received 873 indexed citations. Recurring topics across this work include Silicon and Solar Cell Technologies (30 papers), Semiconductor materials and devices (30 papers), Integrated Circuits and Semiconductor Failure Analysis (29 papers), Semiconductor materials and interfaces (22 papers), Ion-surface interactions and analysis (14 papers), Advancements in Semiconductor Devices and Circuit Design (10 papers), Silicon Nanostructures and Photoluminescence (8 papers) and Laser Material Processing Techniques (7 papers). The work is most often cited by research in Electrical and Electronic Engineering (726 citations), Atomic and Molecular Physics, and Optics (270 citations) and Computational Mechanics (171 citations). A. See has collaborated with scholars based in Singapore, United States and France. Frequent co-authors include Andrew T. S. Wee, K. L. Pey, Zexiang Shen, Hao Gong, L. Chan, G. D. Wilk, Petri I. Räisänen, S. K. Lahiri, B. Busch and M. E. Loomans. Their work appears in journals such as Applied Physics Letters, Journal of The Electrochemical Society, Journal of Applied Physics, IEEE Transactions on Semiconductor Manufacturing and Journal of Electronic Materials.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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