Qunying Lin

487 total citations
28 papers, 351 citations indexed

About

Qunying Lin is a scholar working on Biomedical Engineering, Electronic, Optical and Magnetic Materials and Electrical and Electronic Engineering. According to data from OpenAlex, Qunying Lin has authored 28 papers receiving a total of 351 indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Biomedical Engineering, 13 papers in Electronic, Optical and Magnetic Materials and 11 papers in Electrical and Electronic Engineering. Recurrent topics in Qunying Lin's work include Metamaterials and Metasurfaces Applications (13 papers), Advancements in Photolithography Techniques (11 papers) and Advanced Antenna and Metasurface Technologies (8 papers). Qunying Lin is often cited by papers focused on Metamaterials and Metasurfaces Applications (13 papers), Advancements in Photolithography Techniques (11 papers) and Advanced Antenna and Metasurface Technologies (8 papers). Qunying Lin collaborates with scholars based in Singapore, China and Nigeria. Qunying Lin's co-authors include Yuan Hsing Fu, Shiyang Zhu, Zhengji Xu, Yuan Dong, Ting Hu, Keng Heng Lai, Navab Singh, Qize Zhong, Yuandong Gu and Vladimir Bliznetsov and has published in prestigious journals such as Scientific Reports, Optics Express and Laser & Photonics Review.

In The Last Decade

Qunying Lin

23 papers receiving 327 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Qunying Lin Singapore 9 248 146 137 136 103 28 351
Keng Heng Lai Singapore 7 220 0.9× 127 0.9× 102 0.7× 113 0.8× 63 0.6× 18 275
Shengyuan Chang United States 6 228 0.9× 106 0.7× 108 0.8× 106 0.8× 91 0.9× 9 317
Sucheng Li China 11 291 1.2× 183 1.3× 117 0.9× 145 1.1× 76 0.7× 20 378
Jitao Ji China 14 202 0.8× 96 0.7× 118 0.9× 137 1.0× 133 1.3× 22 353
Meir Y. Grajower United States 5 278 1.1× 166 1.1× 124 0.9× 117 0.9× 125 1.2× 7 354
Yingli Ha China 8 261 1.1× 147 1.0× 100 0.7× 128 0.9× 110 1.1× 17 349
Shiyu Li China 10 216 0.9× 112 0.8× 212 1.5× 129 0.9× 124 1.2× 26 374
Sang‐Eun Mun South Korea 10 308 1.2× 117 0.8× 169 1.2× 135 1.0× 148 1.4× 13 400
Qiaoling Lin China 5 383 1.5× 209 1.4× 151 1.1× 186 1.4× 115 1.1× 11 495
Duhyun Lee South Korea 5 204 0.8× 117 0.8× 107 0.8× 103 0.8× 109 1.1× 13 299

Countries citing papers authored by Qunying Lin

Since Specialization
Citations

This map shows the geographic impact of Qunying Lin's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Qunying Lin with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Qunying Lin more than expected).

Fields of papers citing papers by Qunying Lin

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Qunying Lin. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Qunying Lin. The network helps show where Qunying Lin may publish in the future.

Co-authorship network of co-authors of Qunying Lin

This figure shows the co-authorship network connecting the top 25 collaborators of Qunying Lin. A scholar is included among the top collaborators of Qunying Lin based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Qunying Lin. Qunying Lin is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Khaidarov, Egor, Keng Heng Lai, Yuan Hsing Fu, et al.. (2022). Large-scale vivid metasurface color printing using advanced 12-in. immersion photolithography. Scientific Reports. 12(1). 14044–14044. 16 indexed citations
2.
Long, Liangkun, et al.. (2022). Functional characterization of a new 3-dehydroshikimate dehydratase from Eupenicillium parvum and its potential for protocatechuic acid production. Bioscience Biotechnology and Biochemistry. 86(8). 1024–1030. 2 indexed citations
3.
Zhou, Yanyan, Ting Hu, Yu Li, et al.. (2020). A Performance Study of Dielectric Metalens with Process-Induced Defects. IEEE photonics journal. 12(3). 1–14. 8 indexed citations
4.
Li, Nanxi, Yuan Hsing Fu, Yuan Dong, et al.. (2020). Metasurface Beam Deflector Array on a 12-inch Glass Wafer. W2A.9–W2A.9. 2 indexed citations
5.
Fu, Yuan Hsing, Nanxi Li, Qize Zhong, et al.. (2020). Large-area Flat Optics via Immersion Lithography on CMOS Platform for Laser Beam Shaping. Conference on Lasers and Electro-Optics. 352. SW4E.4–SW4E.4. 1 indexed citations
6.
Hu, Ting, Qize Zhong, Nanxi Li, et al.. (2020). A Metalens Array on a 12-inch Glass Wafer for Optical Dot Projection. W4C.3–W4C.3. 3 indexed citations
7.
Zhong, Qize, Yuan Dong, Dongdong Li, et al.. (2020). Large-area Metalens Directly Patterned on a 12-inch Glass Wafer using Immersion Lithography for Mass Production. Th2A.8–Th2A.8. 8 indexed citations
8.
Xu, Zhengji, Yuan Dong, Yuan Hsing Fu, et al.. (2019). Embedded dielectric metasurface based subtractive color filter on a 300mm glass wafer. Conference on Lasers and Electro-Optics. STh1O.4–STh1O.4. 4 indexed citations
9.
Xu, Zhengji, Yuan Dong, Ting Hu, et al.. (2019). CMOS-compatible all-Si metasurface polarizing bandpass filters on 12-inch wafers. Optics Express. 27(18). 26060–26060. 35 indexed citations
10.
Hu, Ting, Yuan Hsing Fu, Zhengji Xu, et al.. (2018). Demonstration of color display metasurfaces via immersion lithography on a 12-inch silicon wafer. Optics Express. 26(15). 19548–19548. 66 indexed citations
11.
Chen, Zhengxian, et al.. (2017). <i>In vitro</i> pharmacokinetics of sirolimus-coated stent for tracheal stenosis. Tropical Journal of Pharmaceutical Research. 16(8). 2033–2033. 4 indexed citations
12.
Chen, Bing, et al.. (2016). Pushing ArF Dry Scanner Beyond Limitation. International Journal of Mechanical Engineering and Robotics Research. 1 indexed citations
13.
Lin, Qunying, et al.. (2008). Customized illumination shapes for 193nm immersion lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 692435–692435. 13 indexed citations
14.
Tay, C.J., et al.. (2007). A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6520. 65203U–65203U.
15.
Tay, C.J., et al.. (2004). Performance improvement in gate level lithography using resolution enhancement techniques. Microelectronic Engineering. 75(2). 155–164. 1 indexed citations
16.
Tay, C.J., et al.. (2004). Rigorous diffraction analysis using geometrical theory of diffraction for future mask technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 1267–1267. 1 indexed citations
17.
Lin, Qunying, et al.. (2002). Impact of transmission error for attenuated phase-shift mask for 0.10-μm technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 1062–1062. 1 indexed citations
18.
Lin, Qunying, et al.. (2002). Sub-0.10-μm lithography technology with resolution enhancement technique. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 1563–1563. 2 indexed citations
19.
Lin, Qunying, et al.. (2001). Application of attenuated phase-shifting masks to sub-130-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4346. 787–787.
20.
Lin, Qunying, et al.. (2000). Effects of process parameters on pattern-edge roughness of chemically amplified resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 240–240. 11 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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