A. Rhallabi

921 citations

62 papers · 794 indexed · h-index 14

Impact in

Electrical and Electronic Engineering top 10%
- Plasma Diagnostics and Applications
- Semiconductor materials and devices
- Electrohydrodynamics and Fluid Dynamics
Mechanics of Materials top 5%
- Metal and Thin Film Mechanics

Papers in

Surfaces, Coatings and Films 10
Electrical and Electronic Engineering 58
- Semiconductor materials and devices 34
- Plasma Diagnostics and Applications 32
- Photonic and Optical Devices 6

Co-authors: G. Turban Εvangelos Gogolides Y. Catherine G. Marcos Christophe Cardinaud P. Ranson David Mary Mohamed Boufnichel
Journals: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (21 papers)Plasma Sources Science and Technology (5 papers)Journal of Applied Physics (3 papers)Applied Surface Science (2 papers)Applied Physics Letters (2 papers)
Partner nations: France Spain Czechia

In The Last Decade

A. Rhallabi

59 papers receiving 769 citations

Peers

Countries citing papers authored by A. Rhallabi

Since Specialization

Citations

This map shows the geographic impact of A. Rhallabi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Rhallabi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Rhallabi more than expected).

Fields of papers citing papers by A. Rhallabi

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. Rhallabi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Rhallabi. The network helps show where A. Rhallabi may publish in the future.

Co-authorship network

The 25 scholars most cited alongside A. Rhallabi, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with A. Rhallabi Line = papers co-authored together A. Rhallabi links everyone, so they are left out of the graph.

All Works

Sort: Min cites: Since: Top N: Style:

20 of 20 papers shown

#	Work
1	Modeling of ion transport from ionization region to entrance of mass spectrometer in HiPIMS argon/Cr target Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·亀田正二, Pierre-Yves Jouan, A. Rhallabi	2024	0
2	Development and Optimization of Gas Sensors for Ammonia detection SPIRE - Sciences Po Institutional REpository ·Mary Underwood Hood, Robert Bryant, A. Rhallabi, Anna Burak	2024	0
3	Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·亀田正二, Sérgio Luis Beserra Vidal, Julien Tranchant, 최홍운, Marie‐Paule Besland, Amaël Caillard, Tiberiu Minea, A. Rhallabi, Pierre-Yves Jouan	2023	1
4	Modelling of photovoltaic production and electrochemical storage in an autonomous solar drone SHILAP Revista de lepidopterología ·Dodd Stephanie, Юрій Гордієно, Ludovic Arzel, Philippe Poizot, A. Rhallabi	2022	11
5	Etching of iron and iron–chromium alloys using ICP-RIE chlorine plasma Plasma Sources Science and Technology ·Sheng Li, 陈云琪, S. Guilet, T. Czerwiec, G. Marcos, C. Noël, G. Henrion, Christophe Cardinaud, Aurélie Girard, A. Rhallabi	2021	4
6	Etching of GeSe ₂ chalcogenide glass and its pulsed laser deposited thin films in SF ₆ , SF ₆ /Ar and SF ₆ /O ₂ plasmas Plasma Sources Science and Technology ·S. Kitt, Matthew Regele, Aurélie Girard, A. Rhallabi, Marek Bouška, Petr Němec, Virginie Nazabal, Christophe Cardinaud	2020	6
7	Density functional theory study of the SiF molecule adsorption and decomposition on p(2×2) reconstructed Si(001) surface Surface Science ·Haoyue Qi, Mishaal M Alqahtani, A. Mokrani, A. Ziane, S. Bouarab, A. Rhallabi	2020	3
8	Modeling of C ₄ F ₈ inductively coupled plasmas: effects of high RF power on the plasma electrical properties Plasma Sources Science and Technology ·Sheng Li, A. Rhallabi, Aurélie Girard, Christophe Cardinaud, Cos M. Hesseling, Mohamed Boufnichel	2019	7
9	Theoretical study of the electronic structure of mono-bromide of lanthanum molecule including spin-orbit coupling effects Journal of Molecular Modeling ·Alamy Npg, Matthew Sugimoto, А. В. Вишневский, A. Rhallabi	2019	1
10	AlN Etching under ICP Cl2/BCl3/Ar Plasma Mixture: Experimental Characterization and Plasma Kinetic Model MRS Advances ·M. Rammal, A. Rhallabi, Delphine Néel, D. Maké, Alexandre Shen, Sarah Kopitzke	2019	3
11	Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour Microelectronics Reliability ·Jean-Pierre Landesman, Christophe Levallois, J. Jiménez, F. Pommereau, Yoan Léger, Alexandre Beck, Thomas Delhaye, A. Torres, C. Frigeri, A. Rhallabi	2015	4
12	SF₆and C₄F₈global kinetic models coupled to sheath models Plasma Sources Science and Technology ·А. В. Вишневский, H.M. Pastuszka, A. Rhallabi, 忠宏境, A. Mokrani, Matthew Sugimoto, Cos M. Hesseling, Mohamed Boufnichel	2014	17
13	Modeling of inductively coupled plasma SF6/O2/Ar plasma discharge: Effect of O2 on the plasma kinetic properties Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·H.M. Pastuszka, A. Rhallabi, P Swathy., Mohamed Boufnichel, Cos M. Hesseling	2013	43
14	Atomic scale study of InP etching by Cl₂-Ar ICP plasma discharge The European Physical Journal Applied Physics ·A. Rhallabi, Xiaocheng Jiang, Jean-Pierre Landesman, Christophe Cardinaud, 忠宏境	2011	3
15	Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching Applied Physics Letters ·M. Avella, Christer Johansson, F. Pommereau, Jean-Pierre Landesman, A. Rhallabi	2008	8
16	Chemically assisted ion beam etching of GaAs by argon and chlorine gases: Experimental and simulation investigations Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·A. Rhallabi, Mireille Gaillard, Murray F. Campbell, G. Marcos, A. Talneau, F. Pommereau, Danielle Boggs, Jean-Pierre Landesman, N. Bouadma	2005	9
17	Topographic and kinetic effects of the SF6/O2 rate during a cryogenic etching process of silicon Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·G. Marcos, A. Rhallabi, P. Ranson	2004	20
18	Study of the early stage of SiO2 growth by a TEOS–O2 plasma mixture using a three-dimensional Monte Carlo model Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·A. Rhallabi, G. Turban	2001	6
19	Simulation of mesa structures for III-V semiconductors under ion beam etching The European Physical Journal Applied Physics ·L. Willmitzer, A. Rhallabi, G. Turban	1999	7
20	Microscopic modeling of InP etching in CH4–H2 plasma Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·L. Willmitzer, A. Rhallabi, G. Turban	1999	6

About A. Rhallabi

A. Rhallabi is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Mechanics of Materials, Computational Mechanics and Atomic and Molecular Physics, and Optics, having authored 62 papers that have together received 794 indexed citations. Recurring topics across this work include Semiconductor materials and devices (34 papers), Plasma Diagnostics and Applications (32 papers), Metal and Thin Film Mechanics (18 papers), Ion-surface interactions and analysis (13 papers), Photonic Crystals and Applications (7 papers), Plasma Applications and Diagnostics (7 papers), Diamond and Carbon-based Materials Research (6 papers) and Photonic and Optical Devices (6 papers). The work is most often cited by research in Electrical and Electronic Engineering (634 citations), Mechanics of Materials (243 citations), Radiology, Nuclear Medicine and Imaging (150 citations), Surfaces, Coatings and Films (44 citations) and Materials Chemistry (269 citations). A. Rhallabi has collaborated with scholars based in France, Spain and Czechia. Frequent co-authors include G. Turban, Εvangelos Gogolides, Y. Catherine, G. Marcos, Christophe Cardinaud, P. Ranson, David Mary, Mohamed Boufnichel, Andreas G. Boudouvis and Nikolaos V. Mantzaris. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Plasma Sources Science and Technology, Journal of Applied Physics, Applied Surface Science and Applied Physics Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact