Michael Zeuner

869 total citations
35 papers, 743 citations indexed

About

Michael Zeuner is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Computational Mechanics. According to data from OpenAlex, Michael Zeuner has authored 35 papers receiving a total of 743 indexed citations (citations by other indexed papers that have themselves been cited), including 25 papers in Electrical and Electronic Engineering, 11 papers in Mechanics of Materials and 10 papers in Computational Mechanics. Recurrent topics in Michael Zeuner's work include Plasma Diagnostics and Applications (18 papers), Metal and Thin Film Mechanics (10 papers) and Electrohydrodynamics and Fluid Dynamics (7 papers). Michael Zeuner is often cited by papers focused on Plasma Diagnostics and Applications (18 papers), Metal and Thin Film Mechanics (10 papers) and Electrohydrodynamics and Fluid Dynamics (7 papers). Michael Zeuner collaborates with scholars based in Germany, Czechia and United States. Michael Zeuner's co-authors include H. Neumann, Jürgen Meichsner, Frank Scholze, Hynek Biederman, F. Bigl, Mirko Nitschke, D. Slavı́nská, P. Bílková, J.A. Rees and Alexandra Boldyreva and has published in prestigious journals such as Journal of Applied Physics, Thin Solid Films and Japanese Journal of Applied Physics.

In The Last Decade

Michael Zeuner

34 papers receiving 703 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Michael Zeuner Germany 16 468 328 243 225 126 35 743
Akinori Ebe Japan 15 483 1.0× 263 0.8× 346 1.4× 124 0.6× 42 0.3× 50 669
A. Rhallabi France 14 634 1.4× 243 0.7× 269 1.1× 90 0.4× 75 0.6× 62 794
T. E. F. M. Standaert United States 13 1.3k 2.7× 568 1.7× 459 1.9× 120 0.5× 151 1.2× 16 1.4k
Seitaro Matsuo Japan 14 864 1.8× 289 0.9× 282 1.2× 111 0.5× 105 0.8× 43 1.0k
M. Hudis United States 8 282 0.6× 237 0.7× 261 1.1× 56 0.2× 98 0.8× 14 585
N. Sakudo Japan 13 537 1.1× 265 0.8× 201 0.8× 111 0.5× 71 0.6× 83 784
S. Tachi Japan 16 730 1.6× 216 0.7× 232 1.0× 276 1.2× 173 1.4× 38 897
H. Okano Japan 16 520 1.1× 178 0.5× 189 0.8× 170 0.8× 92 0.7× 38 646
P.D. Prewett United Kingdom 14 379 0.8× 75 0.2× 153 0.6× 151 0.7× 161 1.3× 43 544
Tetsuya Tatsumi Japan 21 1.4k 2.9× 494 1.5× 416 1.7× 235 1.0× 97 0.8× 67 1.5k

Countries citing papers authored by Michael Zeuner

Since Specialization
Citations

This map shows the geographic impact of Michael Zeuner's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Michael Zeuner with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Michael Zeuner more than expected).

Fields of papers citing papers by Michael Zeuner

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Michael Zeuner. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Michael Zeuner. The network helps show where Michael Zeuner may publish in the future.

Co-authorship network of co-authors of Michael Zeuner

This figure shows the co-authorship network connecting the top 25 collaborators of Michael Zeuner. A scholar is included among the top collaborators of Michael Zeuner based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Michael Zeuner. Michael Zeuner is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Zeuner, Michael, et al.. (2015). Ion beam trimming in manufacturing of acoustic wave devices. Nanoindustry Russia. 34–39. 3 indexed citations
2.
Zeuner, Michael, et al.. (2014). A Family Office by Any Other Name…. ˜The œjournal of wealth management. 17(3). 20–26. 2 indexed citations
3.
Zeuner, Michael, et al.. (2011). Yield improvement by localized trimming in semiconductor and MEMS manufacturing. 12. 1–4. 2 indexed citations
4.
Zeuner, Michael, et al.. (2011). Ion beam figuring of silicon aspheres. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7934. 793416–793416. 3 indexed citations
5.
Zeuner, Michael, et al.. (2010). Ion beam figuring (IBF) for high precision optics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7591. 75910Y–75910Y. 24 indexed citations
6.
Zeuner, Michael, et al.. (2003). Ion Beam Characterisation of the RIT 10 Ion Thruster. 39th AIAA/ASME/SAE/ASEE Joint Propulsion Conference and Exhibit. 4 indexed citations
7.
Chassé, Thomas, H. Neumann, B. Ocker, et al.. (2003). Mo/Si multilayers for EUV lithography by ion beam sputter deposition. Vacuum. 71(3). 407–415. 12 indexed citations
8.
Zeuner, Michael, et al.. (2001). A unique ECR broad beam source for thin film processing. Surface and Coatings Technology. 142-144. 11–20. 37 indexed citations
9.
Zeuner, Michael, et al.. (2001). Optimisation and characterisation of a TCP type RF broad beam ion source. Surface and Coatings Technology. 142-144. 39–48. 53 indexed citations
10.
Gerlach, Jürgen W., et al.. (2000). Texture and epitaxy by ion beam assisted deposition of gallium nitride. Surface and Coatings Technology. 128-129. 286–291. 9 indexed citations
11.
Flamm, D. & Michael Zeuner. (1999). Spatially resolved measurements of plasma parameters in a broad-beam ion source. Surface and Coatings Technology. 116-119. 1089–1092. 4 indexed citations
12.
Zeuner, Michael, H. Neumann, Frank Scholze, et al.. (1998). Characterization of a modular broad beam ion source. Plasma Sources Science and Technology. 7(3). 252–267. 29 indexed citations
13.
Meichsner, Jürgen, et al.. (1998). Plasma diagnostics for surface modification of polymers. Surface and Coatings Technology. 98(1-3). 1565–1571. 41 indexed citations
14.
Zeitler, M., et al.. (1998). In situ stress analysis of boron nitride films prepared by ion beam assisted deposition. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 139(1-4). 327–331. 15 indexed citations
15.
Zeuner, Michael, et al.. (1998). Characterisation of DC unbalanced magnetron deposition of Ni⧹C : H composite films. Vacuum. 51(3). 417–426. 11 indexed citations
16.
Scholze, Frank, et al.. (1997). Scalable large volume ECR plasma generation for low pressure applications. Surface and Coatings Technology. 97(1-3). 755–758. 6 indexed citations
17.
Zeuner, Michael, Jürgen Meichsner, H. Neumann, Frank Scholze, & F. Bigl. (1996). Design of ion energy distributions by a broad beam ion source. Journal of Applied Physics. 80(2). 611–622. 74 indexed citations
18.
Zeuner, Michael, Jürgen Meichsner, & J.A. Rees. (1996). High energy negative ions in a radio-frequency discharge. Journal of Applied Physics. 79(12). 9379–9381. 28 indexed citations
19.
Zeuner, Michael & Jürgen Meichsner. (1995). Ion kinetic aspects of plasma chemical deposition of PMMA (Polymethylmethacrylate) films. Vacuum. 46(1). 27–31. 4 indexed citations
20.
Meichsner, Jürgen, et al.. (1995). Fundamental investigations in plasma modification of polymers. Surface and Coatings Technology. 74-75. 227–231. 33 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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