Michael Zeuner
- Surfaces, Coatings and Films top 5%
- Mechanics of Materials top 5%
- Metal and Thin Film Mechanics 10
- Computational Mechanics top 5%
- Ion-surface interactions and analysis 7
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- Plasma Diagnostics and Applications 18
- Electrohydrodynamics and Fluid Dynamics 7
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- Advanced Surface Polishing Techniques 7
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- Particle accelerators and beam dynamics 6
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- Mass Spectrometry Techniques and Applications 6
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- Advanced Measurement and Metrology Techniques 3
Michael Zeuner
34 papers receiving 703 citations
Peers
Comparison fields: 5 of 53
- Surfaces, Coatings and Films 112
- Mechanics of Materials 328
- Computational Mechanics 225
- Electrical and Electronic Engineering 468
- Materials Chemistry 243
Countries citing papers authored by Michael Zeuner
This map shows the geographic impact of Michael Zeuner's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Michael Zeuner with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Michael Zeuner more than expected).
Fields of papers citing papers by Michael Zeuner
This network shows the impact of papers produced by Michael Zeuner. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Michael Zeuner. The network helps show where Michael Zeuner may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Michael Zeuner, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2015 | 3 | |
| 2 | 2014 | 2 | |
| 3 | 2011 | 2 | |
| 4 | 2011 | 3 | |
| 5 | 2010 | 24 | |
| 6 | 2003 | 4 | |
| 7 | 2003 | 12 | |
| 8 | 2001 | 37 | |
| 9 | 2001 | 53 | |
| 10 | 2000 | 9 | |
| 11 | 1999 | 4 | |
| 12 | 1998 | 29 | |
| 13 | 1998 | 41 | |
| 14 | 1998 | 15 | |
| 15 | 1998 | 11 | |
| 16 | 1997 | 6 | |
| 17 | 1996 | 74 | |
| 18 | 1996 | 28 | |
| 19 | 1995 | 4 | |
| 20 | 1995 | 33 |
About Michael Zeuner
Michael Zeuner is a scholar working on Surfaces, Coatings and Films, Computational Mechanics, Mechanics of Materials, Electrical and Electronic Engineering and Spectroscopy, having authored 35 papers that have together received 743 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (18 papers), Metal and Thin Film Mechanics (10 papers), Electrohydrodynamics and Fluid Dynamics (7 papers), Ion-surface interactions and analysis (7 papers), Advanced Surface Polishing Techniques (7 papers), Particle accelerators and beam dynamics (6 papers), Mass Spectrometry Techniques and Applications (6 papers) and Advanced Measurement and Metrology Techniques (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (112 citations), Mechanics of Materials (328 citations), Computational Mechanics (225 citations), Electrical and Electronic Engineering (468 citations) and Materials Chemistry (243 citations). Michael Zeuner has collaborated with scholars based in Germany, Czechia and United States. Frequent co-authors include H. Neumann, Jürgen Meichsner, Frank Scholze, Hynek Biederman, F. Bigl, Mirko Nitschke, D. Slavı́nská, P. Bílková, J.A. Rees and Alexandra Boldyreva. Their work appears in journals such as Surface and Coatings Technology, Vacuum, Journal of Applied Physics, Plasma Sources Science and Technology and Japanese Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.