Akinori Ebe

813 total citations
50 papers, 669 citations indexed

About

Akinori Ebe is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Materials Chemistry. According to data from OpenAlex, Akinori Ebe has authored 50 papers receiving a total of 669 indexed citations (citations by other indexed papers that have themselves been cited), including 40 papers in Electrical and Electronic Engineering, 21 papers in Mechanics of Materials and 15 papers in Materials Chemistry. Recurrent topics in Akinori Ebe's work include Metal and Thin Film Mechanics (21 papers), Plasma Diagnostics and Applications (20 papers) and Thin-Film Transistor Technologies (13 papers). Akinori Ebe is often cited by papers focused on Metal and Thin Film Mechanics (21 papers), Plasma Diagnostics and Applications (20 papers) and Thin-Film Transistor Technologies (13 papers). Akinori Ebe collaborates with scholars based in Japan, France and South Korea. Akinori Ebe's co-authors include Yuichi Setsuhara, Kosuke Takenaka, Kiyoshi Ogata, Kazuo Takahashi, Shoji Miyake, Osamu Imai, K. Ogata, So Baba, Naoto Yamamoto and Koji Ono and has published in prestigious journals such as Journal of Alloys and Compounds, Thin Solid Films and Japanese Journal of Applied Physics.

In The Last Decade

Akinori Ebe

47 papers receiving 637 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Akinori Ebe Japan 15 483 346 263 124 106 50 669
Michael Zeuner Germany 16 468 1.0× 243 0.7× 328 1.2× 225 1.8× 29 0.3× 35 743
M. Hudis United States 8 282 0.6× 261 0.8× 237 0.9× 56 0.5× 56 0.5× 14 585
D.M. Rück Germany 16 232 0.5× 253 0.7× 233 0.9× 234 1.9× 104 1.0× 58 639
G. A. Al‐Jumaily United States 13 321 0.7× 235 0.7× 156 0.6× 165 1.3× 16 0.2× 40 529
Kiyoshi Miyake Japan 17 520 1.1× 219 0.6× 174 0.7× 208 1.7× 26 0.2× 51 719
I. Nashiyama Japan 18 1.1k 2.2× 185 0.5× 113 0.4× 104 0.8× 69 0.7× 63 1.2k
Stéphane Grauby France 16 329 0.7× 604 1.7× 245 0.9× 31 0.3× 39 0.4× 54 963
K. Mukai Japan 13 548 1.1× 180 0.5× 94 0.4× 32 0.3× 59 0.6× 29 654
K. S. Harshavardhan United States 15 354 0.7× 474 1.4× 91 0.3× 55 0.4× 22 0.2× 53 716
Mireille Gaillard France 12 311 0.6× 226 0.7× 182 0.7× 49 0.4× 11 0.1× 24 487

Countries citing papers authored by Akinori Ebe

Since Specialization
Citations

This map shows the geographic impact of Akinori Ebe's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Akinori Ebe with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Akinori Ebe more than expected).

Fields of papers citing papers by Akinori Ebe

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Akinori Ebe. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Akinori Ebe. The network helps show where Akinori Ebe may publish in the future.

Co-authorship network of co-authors of Akinori Ebe

This figure shows the co-authorship network connecting the top 25 collaborators of Akinori Ebe. A scholar is included among the top collaborators of Akinori Ebe based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Akinori Ebe. Akinori Ebe is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
2.
Takenaka, Kosuke, et al.. (2023). Analysis of oxygen-based species introduced during plasma assisted reactive processing of a-IGZO films. Japanese Journal of Applied Physics. 62(SL). SL1018–SL1018.
3.
Takenaka, Kosuke, et al.. (2023). Analysis of residual oxygen during a-IGZO thin film formation by plasma-assisted reactive sputtering using a stable isotope. Vacuum. 215. 112227–112227. 1 indexed citations
6.
Takenaka, Kosuke, et al.. (2019). Low-temperature formation of high-mobility a-InGaZnOx films using plasma-enhanced reactive processes. Japanese Journal of Applied Physics. 58(9). 90605–90605. 5 indexed citations
7.
Takenaka, Kosuke, Yuichi Setsuhara, Jeon G. Han, Giichiro Uchida, & Akinori Ebe. (2018). Plasma-enhanced reactive linear sputtering source for formation of silicon-based thin films. Review of Scientific Instruments. 89(8). 83902–83902. 4 indexed citations
8.
Takenaka, Kosuke, et al.. (2018). Influence of deposition condition on electrical properties of a-IGZO films deposited by plasma-enhanced reactive sputtering. Journal of Alloys and Compounds. 772. 642–649. 18 indexed citations
9.
Takenaka, Kosuke, et al.. (2016). Effects of Working Pressure on the Physical Properties of a-InGaZnO<italic>x</italic>Films Formed Using Inductively Coupled Plasma-Enhanced Reactive Sputtering Deposition. IEEE Transactions on Plasma Science. 44(12). 3099–3106. 9 indexed citations
10.
Setsuhara, Yuichi, Ken Cho, Kosuke Takenaka, et al.. (2009). Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units. Thin Solid Films. 518(3). 1006–1011. 20 indexed citations
11.
Setsuhara, Yuichi, Kouichi Ono, & Akinori Ebe. (2007). Development of a Meters-Scale Large Area Plasma Reactor Using Multiple Low-Inductance Antenna Modules for Giant Electronics Processing. OUKA (Osaka University Knowledge Archive) (Osaka University). 36(2). 95–97. 1 indexed citations
12.
Takenaka, Kosuke, et al.. (2007). Plasma Profiles of Inductively Coupled Plasmas Sustained with Low-Inductance Internal Antenna. Plasma Processes and Polymers. 4(S1). S1013–S1016. 3 indexed citations
13.
Fujiwara, Masaki, et al.. (2007). Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna. Japanese Journal of Applied Physics. 46(3S). 1280–1280. 56 indexed citations
14.
Setsuhara, Yuichi, et al.. (2007). Production and Control of Large-Area Plasmas for Meters-Scale Flat-Panel-Display Processing with Multiple Low-Inductance Antenna Modules. Plasma Processes and Polymers. 4(S1). S628–S632. 57 indexed citations
15.
Ebe, Akinori, et al.. (2003). Effect of dissolved water on electrical conduction in liquid dielectrics. 352–357. 1 indexed citations
16.
Setsuhara, Yuichi, T. Shoji, Akinori Ebe, et al.. (2003). Development of internal-antenna-driven large-area RF plasma sources using multiple low-inductance antenna units. Surface and Coatings Technology. 174-175. 33–39. 91 indexed citations
17.
Takahashi, Eiji J., et al.. (2002). Influence of the field emission on the electrical breakdown in vacuum. 16. 179–182. 1 indexed citations
18.
Hayashi, Hiroaki, et al.. (1998). Effect of sputtering-cleaning on adhesion of the metallic films to polymer substrates. Materials Chemistry and Physics. 54(1-3). 102–105. 22 indexed citations
19.
Ebe, Akinori, Satoshi Nishiyama, Osamu Imai, et al.. (1997). Interface structure between polyimide film substrate and copper film prepared by ion beam and vapor deposition (IVD) method. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 121(1-4). 207–211. 5 indexed citations
20.
Imai, Osamu, et al.. (1994). Internal stress in thin films prepared by ion beam and vapor deposition. Surface and Coatings Technology. 66(1-3). 310–312. 18 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026