Tsuneo Terasawa

1.4k total citations
129 papers, 1.1k citations indexed

About

Tsuneo Terasawa is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Tsuneo Terasawa has authored 129 papers receiving a total of 1.1k indexed citations (citations by other indexed papers that have themselves been cited), including 123 papers in Electrical and Electronic Engineering, 60 papers in Surfaces, Coatings and Films and 29 papers in Biomedical Engineering. Recurrent topics in Tsuneo Terasawa's work include Advancements in Photolithography Techniques (114 papers), Integrated Circuits and Semiconductor Failure Analysis (59 papers) and Electron and X-Ray Spectroscopy Techniques (55 papers). Tsuneo Terasawa is often cited by papers focused on Advancements in Photolithography Techniques (114 papers), Integrated Circuits and Semiconductor Failure Analysis (59 papers) and Electron and X-Ray Spectroscopy Techniques (55 papers). Tsuneo Terasawa collaborates with scholars based in Japan, United States and Germany. Tsuneo Terasawa's co-authors include Toshihiko Tanaka, Toshihisa Tomie, Norio Hasegawa, Takeshi Yamane, Osamu Suga, Tsuyoshi Amano, Hidehiro Watanabe, Masaaki Ito, Hiroshi Fukuda and Shinji Okazaki and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Mechanics and IEEE Transactions on Electron Devices.

In The Last Decade

Tsuneo Terasawa

118 papers receiving 891 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Tsuneo Terasawa Japan 19 1.0k 564 305 122 109 129 1.1k
Donis G. Flagello United States 14 450 0.4× 172 0.3× 272 0.9× 39 0.3× 20 0.2× 60 564
S. Erasmus United States 11 245 0.2× 114 0.2× 33 0.1× 28 0.2× 20 0.2× 33 429
Antonı́n Mikš Czechia 12 183 0.2× 108 0.2× 325 1.1× 11 0.1× 7 0.1× 80 575
Qun Yuan China 14 173 0.2× 60 0.1× 205 0.7× 19 0.2× 8 0.1× 59 505
А. Г. Полещук Russia 13 143 0.1× 142 0.3× 346 1.1× 5 0.0× 16 0.1× 67 575
Young-Pil Park South Korea 15 172 0.2× 62 0.1× 281 0.9× 19 0.2× 5 0.0× 88 611
Qi Wu China 16 286 0.3× 76 0.1× 106 0.3× 6 0.0× 19 0.2× 78 827
Yongtian Wang China 15 146 0.1× 192 0.3× 426 1.4× 6 0.0× 7 0.1× 83 654
Hans‐Ulrich Danzebrink Germany 17 350 0.3× 94 0.2× 500 1.6× 24 0.2× 5 0.0× 51 1.1k
Heejoo Choi United States 15 187 0.2× 24 0.0× 320 1.0× 35 0.3× 18 0.2× 85 644

Countries citing papers authored by Tsuneo Terasawa

Since Specialization
Citations

This map shows the geographic impact of Tsuneo Terasawa's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Tsuneo Terasawa with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Tsuneo Terasawa more than expected).

Fields of papers citing papers by Tsuneo Terasawa

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Tsuneo Terasawa. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Tsuneo Terasawa. The network helps show where Tsuneo Terasawa may publish in the future.

Co-authorship network of co-authors of Tsuneo Terasawa

This figure shows the co-authorship network connecting the top 25 collaborators of Tsuneo Terasawa. A scholar is included among the top collaborators of Tsuneo Terasawa based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Tsuneo Terasawa. Tsuneo Terasawa is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Terasawa, Tsuneo, Tsuyoshi Amano, Takeshi Yamane, et al.. (2013). Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability. Japanese Journal of Applied Physics. 52(9R). 96601–96601. 11 indexed citations
2.
Hirano, Ryoichi, et al.. (2013). Evaluation of novel projection electron microscopy (PEM) optics for EUV mask inspection. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8679. 86791T–86791T. 5 indexed citations
3.
Murakami, Takeshi, Kenji Watanabe, Shoji Yoshikawa, et al.. (2013). Development of inspection system for EUV mask with novel projection electron microscopy (PEM). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8880. 888028–888028. 12 indexed citations
4.
Yamane, Takeshi & Tsuneo Terasawa. (2012). Impact of EUVL mask surface roughness on an actinic blank inspection image and a wafer image. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8522. 85220H–85220H. 1 indexed citations
5.
Terasawa, Tsuneo, et al.. (2012). Phase defect printability analyses: dependence of defect type and EUV exposure condition. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83221R–83221R. 5 indexed citations
6.
Iida, S., Tsuyoshi Amano, Ryoichi Hirano, Tsuneo Terasawa, & Hidehiro Watanabe. (2012). Identification of residual-type defect on extreme ultraviolet mask by projection electron microscope using Monte Carlo simulation. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 30(6). 13 indexed citations
7.
Tanaka, Toshihiko, et al.. (2011). EB defect inspection of EUV resist patterned wafer for hp 32 nm and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7971. 797123–797123. 1 indexed citations
8.
Amano, Tsuyoshi, et al.. (2010). FIB-CVD technology for EUV mask repair. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7748. 77481I–77481I. 1 indexed citations
9.
Terasawa, Tsuneo, et al.. (2009). Development of actinic full-field EUV mask blank inspection tool at MIRAI-Selete. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727122–727122. 36 indexed citations
10.
Yamane, Takeshi, et al.. (2008). Signal analysis for the actinic full-field EUVL mask blank inspection system. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7122. 71222D–71222D. 3 indexed citations
11.
Amano, Tsuyoshi, et al.. (2008). Ga implantation and interlayer mixing during FIB repair of EUV mask defects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7122. 71222J–71222J. 4 indexed citations
12.
Matsunawa, Tetsuaki, Hirokazu Nosato, Hidenori Sakanashi, et al.. (2007). Adaptive Optical Proximity Correction Using an Optimization Method. 853–860. 6 indexed citations
13.
Goldberg, Kenneth A., Anton Barty, Yanwei Liu, et al.. (2006). Actinic Inspection of EUV Programmed Multilayer Defects and Cross-Comparison Measurements. University of North Texas Digital Library (University of North Texas). 3 indexed citations
14.
Gonda, Satoshi, et al.. (2005). AFM measurement of linewidth with sub-nanometer scale precision. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5752. 156–156. 6 indexed citations
15.
Gonda, Satoshi, et al.. (2004). Compact high-resolution homodyne interferometer for nanometer-scale multidimensional AFM metrology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5532. 229–229. 3 indexed citations
16.
Terasawa, Tsuneo & Norio Hasegawa. (2000). Theoretical Calculation of Mask Error Enhancement Factor for Periodic Pattern Imaging. Japanese Journal of Applied Physics. 39(12S). 6786–6786. 5 indexed citations
17.
Yoshimura, Toshiyuki, et al.. (1998). Nanometer-level metrology with a low-voltage CD SEM. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3332. 61–61. 3 indexed citations
18.
Ito, Masaaki, et al.. (1996). Optical Technology for EUV Lithography. EWW9–EWW9.
19.
Terasawa, Tsuneo, et al.. (1992). Effect of condenser tilt on projection images produced by a phase-shifting mask. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1674. 127–127. 1 indexed citations
20.
Terasawa, Tsuneo, et al.. (1989). 0.3-micron Optical Lithography Using A Phase-Shifting Mask. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1088. 25–25. 43 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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