H.‐L. Huber
Impact in
- Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques
Papers in
-
- Electron and X-Ray Spectroscopy Techniques 22
-
- Advanced X-ray Imaging Techniques 8
- Co-authors
- Jiřı́ VlčekE. LugscheiderBernd LöchelJ. TrubeH. BetzRalph R. DammelHans-Joachim QuenzerA. Heuberger
- Journals
- Microelectronic Engineering (27 papers)Optics Express (1 paper)Japanese Journal of Applied Physics (1 paper)Diamond and Related Materials (1 paper)Review of Scientific Instruments (1 paper)
- Partner nations
- GermanyRussiaUnited States
In The Last Decade
H.‐L. Huber
48 papers receiving 371 citations
Peers
Comparison fields: 5 of 42
- Surfaces, Coatings and Films 89
- Ceramics and Composites 39
- Radiation 59
- Aerospace Engineering 114
- Electrical and Electronic Engineering 241
Countries citing papers authored by H.‐L. Huber
This map shows the geographic impact of H.‐L. Huber's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by H.‐L. Huber with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites H.‐L. Huber more than expected).
Fields of papers citing papers by H.‐L. Huber
This network shows the impact of papers produced by H.‐L. Huber. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by H.‐L. Huber. The network helps show where H.‐L. Huber may publish in the future.
Co-authorship network
The 25 scholars most cited alongside H.‐L. Huber, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2025 | 0 | |
| 2 | 2024 | 1 | |
| 3 | 2020 | 3 | |
| 4 | 1994 | 3 | |
| 5 | 1994 | 20 | |
| 6 | 1994 | 1 | |
| 7 | 1994 | 27 | |
| 8 | 1993 | 3 | |
| 9 | 1993 | 13 | |
| 10 | 1993 | 1 | |
| 11 | 1993 | 14 | |
| 12 | 1990 | 5 | |
| 13 | 1990 | 1 | |
| 14 | 1989 | 7 | |
| 15 | 1989 | 2 | |
| 16 | 1989 | 1 | |
| 17 | 1989 | 8 | |
| 18 | 1987 | 13 | |
| 19 | Half Micrometer N-MOS Technology Using X-Ray Lithography | 1987 | 1 |
| 20 | 1963 | 11 |
About H.‐L. Huber
H.‐L. Huber is a scholar working on Surfaces, Coatings and Films, Radiation, Electrical and Electronic Engineering, Orthodontics and Mechanical Engineering, having authored 54 papers that have together received 423 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (37 papers), Electron and X-Ray Spectroscopy Techniques (22 papers), Advanced Surface Polishing Techniques (9 papers), Advanced X-ray Imaging Techniques (8 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers), Semiconductor materials and devices (6 papers), Advanced Measurement and Metrology Techniques (5 papers) and Metal and Thin Film Mechanics (5 papers). The work is most often cited by research in Surfaces, Coatings and Films (89 citations), Ceramics and Composites (39 citations), Radiation (59 citations), Aerospace Engineering (114 citations) and Electrical and Electronic Engineering (241 citations). H.‐L. Huber has collaborated with scholars based in Germany, Russia and United States. Frequent co-authors include Jiřı́ Vlček, E. Lugscheider, Bernd Löchel, J. Trube, H. Betz, Ralph R. Dammel, Hans-Joachim Quenzer, A. Heuberger, Lothar Schäfer and H. Schopper. Their work appears in journals such as Microelectronic Engineering, Optics Express, Japanese Journal of Applied Physics, Diamond and Related Materials and Review of Scientific Instruments.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.