J. F. Marchiando

476 citations
29 papers · 344 indexed · h-index 11

J. F. Marchiando

26 papers receiving 327 citations

Peers

J. F. Marchiando
Comparison fields: 5 of 30
  • Atomic and Molecular Physics, and Optics 266
  • Electrical and Electronic Engineering 287
  • Surfaces, Coatings and Films 23
  • Biomedical Engineering 114
  • Bioengineering 9
Replace R. Beyeler with:
R. Beyeler Switzerland
Thomas Trenkler Belgium
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Alexander Reum Germany
Albert K. Henning United States
R. G. Mazur United States
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Countries citing papers authored by J. F. Marchiando

Since Specialization
Citations

This map shows the geographic impact of J. F. Marchiando's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. F. Marchiando with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. F. Marchiando more than expected).

Fields of papers citing papers by J. F. Marchiando

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. F. Marchiando. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. F. Marchiando. The network helps show where J. F. Marchiando may publish in the future.

Co-authorship network

The 25 scholars most cited alongside J. F. Marchiando, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with J. F. Marchiando Line = papers co-authored together J. F. Marchiando links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 200410
2 200213
3 200215
4 200013
5 199828
6
MODELS FOR INTERPRETING SCANNING CAPACITANCE MICROSCOPE MEASUREMENTS
19980
7 199832
8
Scanning Capacitance Microscopy Measurement of 2-D Dopant Profiles across Junctions
19972
9
Practical metrology aspects of scanning capacitance microscopy for silicon 2-D dopant profiling
19971
10 199687
11 19965
12 19956
13
Scanning Capacitance Microscopy for Profiling PN-Junctions in Silicon
19942
14
Semiconductor Measurement Technology: A Software Program for Aiding the Analysis of Ellipsometric Measurements, Simple Models
19892
15 19885
16 19871
17 198511
18 198314
19
Monte Carlo simulation of submicrometer linewidth measurements in the scanning electron microscope.
19813
20 19801

About J. F. Marchiando

J. F. Marchiando is a scholar working on Surfaces, Coatings and Films, Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Numerical Analysis and Instrumentation, having authored 29 papers that have together received 344 indexed citations. Recurring topics across this work include Integrated Circuits and Semiconductor Failure Analysis (17 papers), Force Microscopy Techniques and Applications (12 papers), Semiconductor materials and devices (7 papers), Semiconductor materials and interfaces (5 papers), Electron and X-Ray Spectroscopy Techniques (5 papers), Silicon and Solar Cell Technologies (4 papers), Surface and Thin Film Phenomena (4 papers) and Advancements in Photolithography Techniques (3 papers). The work is most often cited by research in Atomic and Molecular Physics, and Optics (266 citations), Electrical and Electronic Engineering (287 citations), Surfaces, Coatings and Films (23 citations), Biomedical Engineering (114 citations) and Bioengineering (9 citations). J. F. Marchiando has collaborated with scholars based in United States, Belgium and South Korea. Frequent co-authors include Joseph J. Kopanski, Jeremiah R. Lowney, John Albers, H. E. SMITH, D.W. Berning, Roger Alvis, Grady S. White, Young Kuk, A. Glen Birdwell and P. Roitman. Their work appears in journals such as Journal of Applied Physics, Materials Science and Engineering B, Journal of Research of the National Institute of Standards and Technology, International Journal for Numerical Methods in Engineering and IEEE Transactions on Electron Devices.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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