J. A. Hallmark

830 citations
22 papers · 641 indexed · h-index 11

Impact in

    • Electronic and Structural Properties of Oxides
    • Ferroelectric and Piezoelectric Materials
    • Semiconductor materials and devices
    • Ferroelectric and Negative Capacitance Devices
    • Advancements in Semiconductor Devices and Circuit Design
    • Integrated Circuits and Semiconductor Failure Analysis

Papers in

J. A. Hallmark

21 papers receiving 620 citations

Peers

J. A. Hallmark
Comparison fields: 5 of 25
  • Materials Chemistry 448
  • Electrical and Electronic Engineering 539
  • Atomic and Molecular Physics, and Optics 157
  • Surfaces, Coatings and Films 35
  • Electronic, Optical and Magnetic Materials 72
Replace Moonju Cho with:
Moonju Cho South Korea
C. Hobbs United States
Jaehoo Park South Korea
Mau-Phon Houng Taiwan
Takeshi Miyauchi Japan
W. Kissinger Germany
S. Marthon France
Jiro Yota United States
J. T. Fitch United States
P. Y. Hung United States
J. A. Hallmark relative to Moonju Cho South Korea Moonju Cho's profile →
Citations per field
00.5×1.5×1.8×
Moonju Cho · 1×
Citations per year

Countries citing papers authored by J. A. Hallmark

Since Specialization
Citations

This map shows the geographic impact of J. A. Hallmark's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. A. Hallmark with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. A. Hallmark more than expected).

Fields of papers citing papers by J. A. Hallmark

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. A. Hallmark. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. A. Hallmark. The network helps show where J. A. Hallmark may publish in the future.

Co-authorship network

The 25 scholars most cited alongside J. A. Hallmark, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with J. A. Hallmark Line = papers co-authored together J. A. Hallmark links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 20163
2 200516
3 20050
4 20022
5 20029
6 20026
7 200098
8 200033
9 200014
10 200061
11 2000243
12 200029
13 199924
14 199931
15 199924
16 19972
17 19978
18 19953
19 19942
20 19939

About J. A. Hallmark

J. A. Hallmark is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Materials Chemistry and Biomedical Engineering, having authored 22 papers that have together received 641 indexed citations. Recurring topics across this work include Semiconductor materials and devices (12 papers), Electronic and Structural Properties of Oxides (5 papers), Advancements in Semiconductor Devices and Circuit Design (5 papers), Surface and Thin Film Phenomena (5 papers), Semiconductor materials and interfaces (3 papers), Ferroelectric and Piezoelectric Materials (3 papers), Low-power high-performance VLSI design (3 papers) and Electron and X-Ray Spectroscopy Techniques (3 papers). The work is most often cited by research in Materials Chemistry (448 citations), Electrical and Electronic Engineering (539 citations), Atomic and Molecular Physics, and Optics (157 citations), Surfaces, Coatings and Films (35 citations) and Electronic, Optical and Magnetic Materials (72 citations). J. A. Hallmark has collaborated with scholars based in United States, Sweden and Spain. Frequent co-authors include W. J. Ooms, J. Curless, J. Ramdani, C. Overgaard, J. Finder, K. Eisenbeiser, R. Droopad, Zhiyi Yu, Loai G. Salem and Zhiping Yu. Their work appears in journals such as Surface Science, Physical review. B, Condensed matter, IEEE Transactions on Electron Devices, Applied Surface Science and IEEE Journal of Solid-State Circuits.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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