J. Da̧browski
Impact in
-
- Surface and Thin Film Phenomena
- Semiconductor materials and interfaces
- Advanced Chemical Physics Studies
- Materials Chemistry top 2%
- Graphene research and applications
- Electronic and Structural Properties of Oxides
Papers in
-
- Semiconductor materials and devices 74
- Ferroelectric and Negative Capacitance Devices 17
- Advancements in Semiconductor Devices and Circuit Design 14
- Silicon and Solar Cell Technologies 12
-
- Graphene research and applications 25
- Electronic and Structural Properties of Oxides 20
- Co-authors
- Matthias Scheffler (8 shared papers)H.‐J. Müssig (38 shared papers)Grzegorz Łupina (41 shared papers)G. Lippert (34 shared papers)Thomas Schroeder (33 shared papers)G. A. Wolff (8 shared papers)Christian Wenger (32 shared papers)P. Zaumseil (23 shared papers)
In The Last Decade
J. Da̧browski
117 papers receiving 2.9k citations
Peers
Comparison fields: 5 of 57
- Atomic and Molecular Physics, and Optics 1.2k
- Materials Chemistry 1.7k
- Electrical and Electronic Engineering 1.9k
- Surfaces, Coatings and Films 194
- Structural Biology 35
Countries citing papers authored by J. Da̧browski
This map shows the geographic impact of J. Da̧browski's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Da̧browski with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Da̧browski more than expected).
Fields of papers citing papers by J. Da̧browski
This network shows the impact of papers produced by J. Da̧browski. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Da̧browski. The network helps show where J. Da̧browski may publish in the future.
Co-authors
The 25 scholars most cited alongside J. Da̧browski, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 122 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 1992 | 215 | |
| 2 | 1988 | 204 | |
| 3 | 2013 | 188 | |
| 4 | 1994 | 163 | |
| 5 | 1989 | 136 | |
| 6 | 2000 | 122 | |
| 7 | 2012 | 120 | |
| 8 | 2009 | 90 | |
| 9 | 2002 | 88 | |
| 10 | 1988 | 86 | |
| 11 | 2005 | 74 | |
| 12 | 2016 | 58 | |
| 13 | 2014 | 55 | |
| 14 | 2001 | 45 | |
| 15 | 2004 | 44 | |
| 16 | 2006 | 42 | |
| 17 | 1994 | 41 | |
| 18 | 2008 | 39 | |
| 19 | 2006 | 39 | |
| 20 | 2007 | 39 |
About J. Da̧browski
J. Da̧browski is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials and Biomedical Engineering, having authored 122 papers that have together received 3.0k indexed citations. Recurring topics across this work include Semiconductor materials and devices (74 papers), Graphene research and applications (25 papers), Semiconductor materials and interfaces (24 papers), Surface and Thin Film Phenomena (20 papers), Electronic and Structural Properties of Oxides (20 papers), Ferroelectric and Negative Capacitance Devices (17 papers), Advancements in Semiconductor Devices and Circuit Design (14 papers) and Silicon and Solar Cell Technologies (12 papers). The work is most often cited by research in Atomic and Molecular Physics, and Optics (1.2k citations), Materials Chemistry (1.7k citations), Electrical and Electronic Engineering (1.9k citations), Surfaces, Coatings and Films (194 citations) and Structural Biology (35 citations). J. Da̧browski has collaborated with scholars based in Germany, Sweden and Poland. Frequent co-authors include Matthias Scheffler, H.‐J. Müssig, Grzegorz Łupina, G. Lippert, Thomas Schroeder, G. A. Wolff, Christian Wenger, P. Zaumseil, Wolfgang Mehr and Max C. Lemme. Their work appears in journals such as Journal of Applied Physics, Applied Physics Letters, Microelectronic Engineering, Surface Science and ACS Applied Materials & Interfaces.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.