Igor Turovets

454 total citations
39 papers, 346 citations indexed

About

Igor Turovets is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Igor Turovets has authored 39 papers receiving a total of 346 indexed citations (citations by other indexed papers that have themselves been cited), including 23 papers in Electrical and Electronic Engineering, 16 papers in Surfaces, Coatings and Films and 12 papers in Biomedical Engineering. Recurrent topics in Igor Turovets's work include Optical Coatings and Gratings (16 papers), Advancements in Photolithography Techniques (7 papers) and Retinal and Macular Surgery (7 papers). Igor Turovets is often cited by papers focused on Optical Coatings and Gratings (16 papers), Advancements in Photolithography Techniques (7 papers) and Retinal and Macular Surgery (7 papers). Igor Turovets collaborates with scholars based in United States, Israel and Belgium. Igor Turovets's co-authors include Daniel Palanker, Aaron Lewis, G.A. Fish, Itzhak Hemo, Klony Lieberman, H. Zauberman, Matthew Sendelbach, Cornel Bozdog, Alok Vaid and Boris Sherman and has published in prestigious journals such as Journal of Applied Physics, Japanese Journal of Applied Physics and Review of Scientific Instruments.

In The Last Decade

Igor Turovets

36 papers receiving 318 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Igor Turovets United States 11 155 147 72 66 65 39 346
Agostino Occhicone Italy 9 173 1.1× 140 1.0× 28 0.4× 70 1.1× 36 0.6× 21 305
J. T. C. Yeh United States 8 100 0.6× 203 1.4× 44 0.6× 157 2.4× 238 3.7× 9 503
Alexander Pikulin Russia 10 312 2.0× 68 0.5× 15 0.2× 99 1.5× 99 1.5× 27 401
Zhuo‐Chen Ma China 10 193 1.2× 57 0.4× 52 0.7× 40 0.6× 56 0.9× 23 314
Matthias Bolle France 9 123 0.8× 72 0.5× 55 0.8× 98 1.5× 241 3.7× 12 369
Isabelle Verrier France 12 179 1.2× 179 1.2× 67 0.9× 34 0.5× 29 0.4× 50 337
Saher Maswadi United States 10 233 1.5× 70 0.5× 7 0.1× 68 1.0× 70 1.1× 33 411
Baoshan Guo China 8 135 0.9× 80 0.5× 20 0.3× 68 1.0× 83 1.3× 30 347
M.E.A. Hermans Germany 10 235 1.5× 81 0.6× 6 0.1× 51 0.8× 223 3.4× 28 433
A. Y. Vorobyev United States 10 283 1.8× 74 0.5× 92 1.3× 74 1.1× 474 7.3× 20 614

Countries citing papers authored by Igor Turovets

Since Specialization
Citations

This map shows the geographic impact of Igor Turovets's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Igor Turovets with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Igor Turovets more than expected).

Fields of papers citing papers by Igor Turovets

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Igor Turovets. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Igor Turovets. The network helps show where Igor Turovets may publish in the future.

Co-authorship network of co-authors of Igor Turovets

This figure shows the co-authorship network connecting the top 25 collaborators of Igor Turovets. A scholar is included among the top collaborators of Igor Turovets based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Igor Turovets. Igor Turovets is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kwon, Hyeok-Il, Adam Urbanowicz, Igor Turovets, et al.. (2025). Critical in-line OCD metrology for CFET manufacturing. 4–4. 1 indexed citations
2.
Schmidt, Daniel, et al.. (2023). Spectral interferometry for fully integrated device metrology. Journal of Micro/Nanopatterning Materials and Metrology. 22(3). 1 indexed citations
3.
Moussa, Alain, Janusz Bogdanowicz, Benjamin Groven, et al.. (2023). 300mm in-line metrologies for the characterization of ultra-thin layer of 2D materials. 65–65. 4 indexed citations
4.
Schmidt, Daniel, et al.. (2022). Scatterometry-based methodologies for characterization of MRAM technology. 41–41. 1 indexed citations
5.
Schmidt, Daniel, et al.. (2022). Vertical travelling scatterometry for metrology on fully integrated devices. 40–40. 4 indexed citations
6.
Schmidt, Daniel, et al.. (2021). Advanced EUV Resist Characterization using Scatterometry and Machine Learning. 1–4. 4 indexed citations
7.
Schmidt, Daniel, S. Pancharatnam, Andrew Greene, et al.. (2021). OCD enhanced: implementation and validation of spectral interferometry for nanosheet inner spacer indentation. 58–58. 9 indexed citations
8.
Das, Sayantan, et al.. (2021). Scatterometry solutions for 14nm half-pitch BEOL layers patterned by EUV single exposure. 75–75. 2 indexed citations
9.
Kong, Dexin, Daniel Schmidt, Julien Frougier, et al.. (2020). Development of SiGe Indentation Process Control to Enable Stacked Nanosheet FET Technology. 1–5. 3 indexed citations
10.
Kong, Dexin, Daniel Schmidt, Chi‐Chun Liu, et al.. (2020). Measuring local CD uniformity in EUV vias with scatterometry and machine learning. 43–43. 6 indexed citations
11.
12.
Moussa, Alain, Philippe Leray, Igor Turovets, et al.. (2019). Scatterometry and AFM measurement combination for area selective deposition process characterization. 17. 57–57. 4 indexed citations
13.
Das, Sayantan, et al.. (2019). Machine learning for predictive electrical performance using OCD. 14–14. 8 indexed citations
14.
Vaid, Alok, John A. Allgair, Erin Mclellan, et al.. (2012). Hybrid metrology solution for 1X node technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8324. 832404–832404. 17 indexed citations
15.
Bozdog, Cornel, et al.. (2011). A holistic metrology approach: multi-channel scatterometry for complex applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7971. 797113–797113. 3 indexed citations
16.
Vaid, Alok, John A. Allgair, Matthew Sendelbach, et al.. (2011). A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7971. 797103–797103. 51 indexed citations
17.
Palanker, Daniel, et al.. (1999). Microheater as an alternative to lasers for in-vitro fertilization applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3601. 400–400. 1 indexed citations
18.
Palanker, Daniel, Igor Turovets, & Aaron Lewis. (1997). Dynamics of ArF excimer laser-induced cavitation bubbles in gel surrounded by a liquid medium. Lasers in Surgery and Medicine. 21(3). 294–300. 18 indexed citations
19.
Palanker, Daniel, Igor Turovets, & Aaron Lewis. (1996). Mechanisms of tissue damage during ArF excimer endolaser microsurgery. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2681. 220–220. 3 indexed citations
20.
Turovets, Igor, Daniel Palanker, & Aaron Lewis. (1994). ArF EXCIMER LASER‐INDUCED BUBBLE FORMATION DURING IRRADIATION OF NaCl SOLUTIONS. Photochemistry and Photobiology. 60(5). 412–414. 9 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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