Y. Ohnishi

976 total citations
25 papers, 763 citations indexed

About

Y. Ohnishi is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Y. Ohnishi has authored 25 papers receiving a total of 763 indexed citations (citations by other indexed papers that have themselves been cited), including 17 papers in Electrical and Electronic Engineering, 11 papers in Biomedical Engineering and 5 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Y. Ohnishi's work include Advancements in Photolithography Techniques (14 papers), Nanofabrication and Lithography Techniques (8 papers) and Integrated Circuits and Semiconductor Failure Analysis (4 papers). Y. Ohnishi is often cited by papers focused on Advancements in Photolithography Techniques (14 papers), Nanofabrication and Lithography Techniques (8 papers) and Integrated Circuits and Semiconductor Failure Analysis (4 papers). Y. Ohnishi collaborates with scholars based in Japan and United Kingdom. Y. Ohnishi's co-authors include H. Gokan, S. Esho, Yukinori Ochiai, Jun‐ichi Fujita, S. Matsui, Kunio Kozima, Fumiya Watanabe, Eiichi Nomura, Masaru Suzuki and Fumio Shimura and has published in prestigious journals such as Applied Physics Letters, Journal of The Electrochemical Society and Investigative Ophthalmology & Visual Science.

In The Last Decade

Y. Ohnishi

25 papers receiving 719 citations

Peers

Y. Ohnishi
H. Hänsel Germany
Anthony E. Novembre United States
B. Laks Brazil
K. R. Milkove United States
R. Torge Germany
James L. Speidell United States
Y. Ohnishi
Citations per year, relative to Y. Ohnishi Y. Ohnishi (= 1×) peers Mitsuru Takenaga

Countries citing papers authored by Y. Ohnishi

Since Specialization
Citations

This map shows the geographic impact of Y. Ohnishi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Y. Ohnishi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Y. Ohnishi more than expected).

Fields of papers citing papers by Y. Ohnishi

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Y. Ohnishi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Y. Ohnishi. The network helps show where Y. Ohnishi may publish in the future.

Co-authorship network of co-authors of Y. Ohnishi

This figure shows the co-authorship network connecting the top 25 collaborators of Y. Ohnishi. A scholar is included among the top collaborators of Y. Ohnishi based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Y. Ohnishi. Y. Ohnishi is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Yagi, T., Masashi Watanabe, Y. Ohnishi, & Tomohiko Mukai. (2005). Bio–Hybrid Retinal Implant: Micro/Nano–Fabrication of Conductive Polymer for Molecular Electrodes. Investigative Ophthalmology & Visual Science. 46(13). 1089–1089. 2 indexed citations
2.
Fujita, Jun‐ichi, Y. Ohnishi, Shoko Manako, et al.. (1998). Resolution of calixarene resist under low energy electron irradiation. Microelectronic Engineering. 41-42. 323–326. 9 indexed citations
3.
Ohnishi, Y., Jun‐ichi Fujita, Yukinori Ochiai, & S. Matsui. (1997). Calixarenes-prospective materials for nanofabrications-. Microelectronic Engineering. 35(1-4). 117–120. 25 indexed citations
4.
Fujita, Jun‐ichi, et al.. (1997). Calixarene Electron Beam Resist for Nano-Lithography. Japanese Journal of Applied Physics. 36(12S). 7769–7769. 34 indexed citations
5.
Fujita, Jun‐ichi, Y. Ohnishi, Yukinori Ochiai, & S. Matsui. (1996). Ultrahigh resolution of calixarene negative resist in electron beam lithography. Applied Physics Letters. 68(9). 1297–1299. 192 indexed citations
6.
Matsui, S., Yukinori Ochiai, Masako Baba, et al.. (1995). Nanolithography Developed Through Electron Beam Induced Surface Reaction. MRS Proceedings. 380. 2 indexed citations
7.
Watanabe, Fumiya & Y. Ohnishi. (1986). Oxygen reactive ion etching of organosilicon polymers. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 4(1). 422–425. 34 indexed citations
8.
Saotome, Yasunori, et al.. (1985). A Silicon Containing Positive Photoresist (SIPR) for a Bilayer Resist System. Journal of The Electrochemical Society. 132(4). 909–913. 21 indexed citations
9.
Suzuki, M., Y. Ohnishi, & Akihiro Furuta. (1985). A Cross‐Linked Positive Resist Derived from Poly(Methacrylonitrile‐co‐Methacrylic Acid). Journal of The Electrochemical Society. 132(6). 1390–1393. 1 indexed citations
10.
Tanigaki, Katsumi, et al.. (1985). Radiation‐Induced Reactions of Chloromethylstyrene‐Based Resist Materials Analyzed from Radiolysis of Low Molecular Model Compounds. Journal of The Electrochemical Society. 132(7). 1678–1683. 8 indexed citations
11.
Tanigaki, Katsumi, et al.. (1985). Behavior of polymers containing spiroorthoester or bicycloorthoester structure under EB and X‐ray irradiation conditions. Journal of Applied Polymer Science. 30(4). 1419–1428. 7 indexed citations
12.
Ohnishi, Y., et al.. (1985). A negative photoresist (TAS) for a bi-layer resist system. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 3(1). 331–334. 12 indexed citations
13.
Inagaki, N., et al.. (1983). Glow discharge polymerization of tetramethylsilane by capacitive coupling of 20 kHz frequency and surface hardening of polyethylene sheet. Journal of Applied Polymer Science. 28(12). 3629–3640. 13 indexed citations
14.
Gokan, H., S. Esho, & Y. Ohnishi. (1983). Dry Etch Resistance of Organic Materials. Journal of The Electrochemical Society. 130(1). 143–146. 213 indexed citations
15.
Suzuki, Masaru, et al.. (1983). Copolymers of Trimethylsilylstyrene with Chloromethylstyrene for a Bi‐Layer Resist System. Journal of The Electrochemical Society. 130(9). 1962–1964. 22 indexed citations
16.
Gokan, H., et al.. (1983). Oxygen ion-beam etch resistance of metal-free and organosilicon resist materials. Microelectronic Engineering. 1(4). 251–262. 7 indexed citations
17.
Suzuki, Masayoshi & Y. Ohnishi. (1982). Factors Affecting the Sensitivity of Cross‐Linked Positive Resists. Journal of The Electrochemical Society. 129(2). 402–405. 5 indexed citations
18.
Shimura, Fumio, Y. Ohnishi, & Hideki Tsuya. (1981). Heterogeneous distribution of interstitial oxygen in annealed Czochralski-grown silicon crystals. Applied Physics Letters. 38(11). 867–869. 25 indexed citations
19.
Ohnishi, Y., et al.. (1974). Properties of nematic liquid crystals doped with hydroquinone and p-benzoquinone: Long-term dynamic scattering under dc excitation. Applied Physics Letters. 24(5). 213–216. 11 indexed citations
20.
Ohnishi, Y. & Kunio Kozima. (1968). Microwave Spectrum of Cyclohexanone. Bulletin of the Chemical Society of Japan. 41(6). 1323–1325. 44 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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