Myrtle I. Blakey

591 total citations
28 papers, 387 citations indexed

About

Myrtle I. Blakey is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Myrtle I. Blakey has authored 28 papers receiving a total of 387 indexed citations (citations by other indexed papers that have themselves been cited), including 26 papers in Electrical and Electronic Engineering, 24 papers in Surfaces, Coatings and Films and 3 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Myrtle I. Blakey's work include Advancements in Photolithography Techniques (25 papers), Electron and X-Ray Spectroscopy Techniques (24 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). Myrtle I. Blakey is often cited by papers focused on Advancements in Photolithography Techniques (25 papers), Electron and X-Ray Spectroscopy Techniques (24 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). Myrtle I. Blakey collaborates with scholars based in United States, Germany and United Kingdom. Myrtle I. Blakey's co-authors include Andrew J. Turberfield, Bernard Yurke, Friedrich C. Simmel, James C. Mitchell, A. P. Mills, Anthony E. Novembre, R. C. Farrow, Richard Kasica, J. Alexander Liddle and Leonidas E. Ocola and has published in prestigious journals such as Physical Review Letters, Journal of Applied Physics and Microelectronic Engineering.

In The Last Decade

Myrtle I. Blakey

23 papers receiving 355 citations

Peers

Countries citing papers authored by Myrtle I. Blakey

Since Specialization

Citations

This map shows the geographic impact of Myrtle I. Blakey's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Myrtle I. Blakey with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Myrtle I. Blakey more than expected).

Fields of papers citing papers by Myrtle I. Blakey

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Myrtle I. Blakey. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Myrtle I. Blakey. The network helps show where Myrtle I. Blakey may publish in the future.

Co-authorship network of co-authors of Myrtle I. Blakey

This figure shows the co-authorship network connecting the top 25 collaborators of Myrtle I. Blakey. A scholar is included among the top collaborators of Myrtle I. Blakey based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Myrtle I. Blakey. Myrtle I. Blakey is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	DNA Fuel for Free-Running Nanomachines 2003 ·Physical Review Letters ·Andrew J. Turberfield, James C. Mitchell, Bernard Yurke, A. P. Mills, Myrtle I. Blakey, Friedrich C. Simmel	290
2	Terahertz electroluminescence from superlattice quantum cascade structures 2002 ·Journal of Applied Physics ·R. Colombelli, A. Straub, Federico Capasso, Claire Gmachl, Myrtle I. Blakey, A. M. Sergent, S. N. G. Chu, Ken West, L. N. Pfeiffer	10
3	Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system 2001 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·J. Alexander Liddle, Myrtle I. Blakey, (unknown), R. C. Farrow, Gregg M. Gallatin, Richard Kasica, (unknown), (unknown), (unknown), (unknown), Anthony E. Novembre, Leonidas E. Ocola, (unknown), Milton L. Peabody, (unknown), (unknown), W. K. Waskiewicz, Eric Munro	8
4	Monte Carlo study of high performance resists for SCALPEL nanolithography 2000 ·Microelectronic Engineering ·Leonidas E. Ocola, (unknown), Richard Kasica, Myrtle I. Blakey, (unknown), W. K. Waskiewicz, Anthony E. Novembre, Masaru Sato	10
5	SCALPEL aerial image monitoring: Principles and application to space charge 2000 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Gregg M. Gallatin, R. C. Farrow, J. Alexander Liddle, W. K. Waskiewicz, (unknown), (unknown), (unknown), J. S. Kraus, (unknown), (unknown), Anthony E. Novembre, Myrtle I. Blakey	2
6	Marks for SCALPEL® tool optics optimization 2000 ·Microelectronic Engineering ·R. C. Farrow, Gregg M. Gallatin, W. K. Waskiewicz, J. Alexander Liddle, I.C. Kizilyalli, A. Kornblit, (unknown), Myrtle I. Blakey, F. Klemens, (unknown), J. S. Kraus, (unknown), (unknown), N. Layadi, (unknown)	1
7	CMOS compatible alignment marks for the SCALPEL proof of lithography tool 1999 ·Microelectronic Engineering ·R. C. Farrow, W. K. Waskiewicz, I.C. Kizilyalli, Leonidas E. Ocola, (unknown), (unknown), Gregg M. Gallatin, (unknown), Myrtle I. Blakey, J. S. Kraus, Anthony E. Novembre, (unknown), Milton L. Peabody, Richard Kasica, A. Kornblit, F. Klemens	2
8	Alignment mark detection in CMOS materials with SCALPEL e-beam lithography 1999 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·R. C. Farrow, W. K. Waskiewicz, I.C. Kizilyalli, Gregg M. Gallatin, J. Alexander Liddle, (unknown), A. Kornblit, Leonidas E. Ocola, F. Klemens, (unknown), (unknown), (unknown), Myrtle I. Blakey, (unknown), (unknown), (unknown)	1
9	200-mm SCALPEL mask development 1999 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Gregory R. Bogart, Anthony E. Novembre, A. Kornblit, Milton L. Peabody, R. C. Farrow, Myrtle I. Blakey, Richard Kasica, J. Alexander Liddle, (unknown), (unknown), (unknown)	10
10	Cleaning of SCALPEL next-generation lithography masks using PLASMAX, a revolutionary dry cleaning technology 1999 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Anthony E. Novembre, (unknown), Richard Kasica, B.C. Bailey, Myrtle I. Blakey	2
11	New Developments in Resist Materials for the SCALPEL Technology 1998 ·Journal of Photopolymer Science and Technology ·Anthony E. Novembre, Leonidas E. Ocola, F. M. Houlihan, (unknown), Myrtle I. Blakey	5
12	Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL) 1998 ·Microelectronic Engineering ·J. Alexander Liddle, Myrtle I. Blakey, (unknown), (unknown), Anthony E. Novembre, Leonidas E. Ocola, (unknown), W. K. Waskiewicz	2
13	Commercialization of SCALPEL masks 1998 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·R. C. Farrow, Anthony E. Novembre, Milton L. Peabody, Richard Kasica, Myrtle I. Blakey, J. Alexander Liddle, (unknown), (unknown), Leonidas E. Ocola, (unknown), (unknown), James F. Unruh, Feng Qian, (unknown)	4
14	Yield, metrology, and inspection characteristics of SCALPEL masks 1997 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Milton L. Peabody, Myrtle I. Blakey, R. C. Farrow, Richard Kasica, J. Alexander Liddle, Anthony E. Novembre, (unknown), D. M. Tennant, David L. Windt	1
15	Application of transmission electron detection to SCALPEL mask metrology 1997 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·R. C. Farrow, Michael T. Postek, (unknown), Samuel N. Jones, Jeremiah R. Lowney, Myrtle I. Blakey, Linus A. Fetter, (unknown), J. Alexander Liddle, L. C. Hopkins, H. A. Huggins, Milton L. Peabody, Anthony E. Novembre	4
16	<title>Patterning of membrane masks for projection e-beam lithography</title> 1996 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Linus A. Fetter, (unknown), Myrtle I. Blakey, J. Alexander Liddle, Milton L. Peabody, Anthony E. Novembre, D. M. Tennant	1
17	Resist Design Considerations for Direct Write and Projection Electron-Beam Lithography Technologies. 1996 ·Journal of Photopolymer Science and Technology ·Anthony E. Novembre, (unknown), (unknown), (unknown), Myrtle I. Blakey, (unknown), Linus A. Fetter, L. R. Harriott, H. A. Huggins, (unknown), J. Alexander Liddle, (unknown), Milton L. Peabody	1
18	<title>Mark topography for alignment and registration in projection electron lithography</title> 1996 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·R. C. Farrow, (unknown), (unknown), Myrtle I. Blakey, (unknown), Linus A. Fetter, H. A. Huggins, (unknown), (unknown)	3
19	Precise measurement of the effective backscatter coefficient for 100-keV electron-beam lithography on Si 1995 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·G. P. Watson, (unknown), Joyce Liddle, Linus A. Fetter, R. C. Farrow, (unknown), (unknown), Anthony E. Novembre, Myrtle I. Blakey, (unknown), (unknown)	4
20	Lithographic performance of a negative resist under scattering with angular limitation for projection electron lithography exposure at 100 keV 1994 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·(unknown), (unknown), Myrtle I. Blakey, (unknown), R. C. Farrow, Linus A. Fetter, H. A. Huggins, J. S. Kraus, Joyce Liddle, (unknown), Anthony E. Novembre, G. P. Watson, S. D. Berger	1

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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