Trudo Clarysse

3.0k total citations
127 papers, 2.3k citations indexed

About

Trudo Clarysse is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Computational Mechanics. According to data from OpenAlex, Trudo Clarysse has authored 127 papers receiving a total of 2.3k indexed citations (citations by other indexed papers that have themselves been cited), including 116 papers in Electrical and Electronic Engineering, 66 papers in Atomic and Molecular Physics, and Optics and 22 papers in Computational Mechanics. Recurrent topics in Trudo Clarysse's work include Integrated Circuits and Semiconductor Failure Analysis (71 papers), Semiconductor materials and devices (48 papers) and Silicon and Solar Cell Technologies (35 papers). Trudo Clarysse is often cited by papers focused on Integrated Circuits and Semiconductor Failure Analysis (71 papers), Semiconductor materials and devices (48 papers) and Silicon and Solar Cell Technologies (35 papers). Trudo Clarysse collaborates with scholars based in Belgium, United States and Denmark. Trudo Clarysse's co-authors include Wilfried Vandervorst, Peter Wolf, W. Vandervorst, Eddy Simoen, L. Hellemans, A. Satta, Pierre Eyben, Tom Janssens, Marc Meuris and A. Benedetti and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Trudo Clarysse

124 papers receiving 2.3k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Trudo Clarysse Belgium 27 2.0k 1.4k 525 411 292 127 2.3k
H. Tanoue Japan 22 1.1k 0.5× 640 0.5× 227 0.4× 551 1.3× 241 0.8× 128 1.6k
W. Vandervorst Belgium 21 1.2k 0.6× 650 0.5× 315 0.6× 325 0.8× 263 0.9× 98 1.4k
A. Ronda France 26 1.4k 0.7× 1.2k 0.9× 880 1.7× 1.1k 2.6× 428 1.5× 134 2.4k
M. Bruel France 21 2.3k 1.1× 463 0.3× 378 0.7× 559 1.4× 393 1.3× 60 2.5k
Frank Fournel France 22 1.4k 0.7× 610 0.4× 555 1.1× 366 0.9× 65 0.2× 194 1.8k
M. T. Currie United States 22 2.9k 1.4× 1.3k 0.9× 850 1.6× 622 1.5× 51 0.2× 46 3.2k
J.L. Regolini France 22 1.3k 0.7× 559 0.4× 261 0.5× 473 1.2× 108 0.4× 97 1.5k
Y. Campidelli France 24 1.4k 0.7× 1.2k 0.9× 404 0.8× 631 1.5× 82 0.3× 121 1.9k
Junichi Murota Japan 25 2.0k 1.0× 641 0.5× 295 0.6× 797 1.9× 146 0.5× 206 2.2k
F. Ajustron France 15 484 0.2× 655 0.5× 271 0.5× 274 0.7× 149 0.5× 42 1.0k

Countries citing papers authored by Trudo Clarysse

Since Specialization
Citations

This map shows the geographic impact of Trudo Clarysse's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Trudo Clarysse with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Trudo Clarysse more than expected).

Fields of papers citing papers by Trudo Clarysse

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Trudo Clarysse. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Trudo Clarysse. The network helps show where Trudo Clarysse may publish in the future.

Co-authorship network of co-authors of Trudo Clarysse

This figure shows the co-authorship network connecting the top 25 collaborators of Trudo Clarysse. A scholar is included among the top collaborators of Trudo Clarysse based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Trudo Clarysse. Trudo Clarysse is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Eyben, Pierre, Trudo Clarysse, Geert Hellings, et al.. (2012). Understanding device performance by incorporating 2D-carrier profiles from high resolution scanning spreading resistance microscopy into device simulations. Solid-State Electronics. 74. 38–42. 3 indexed citations
2.
Shimura, Yosuke, Shotaro Takeuchi, Osamu Nakatsuka, et al.. (2011). In-situ Ga doping of fully strained Ge1-xSnx heteroepitaxial layers grown on Ge(001) substrates. Thin Solid Films. 520(8). 3206–3210. 12 indexed citations
3.
Hellings, Geert, Erik Rosseel, Trudo Clarysse, et al.. (2010). Systematic study of shallow junction formation on germanium substrates. Microelectronic Engineering. 88(4). 347–350. 12 indexed citations
4.
Nguyen, Ngoc Duy, Erik Rosseel, Shotaro Takeuchi, et al.. (2009). Vapor phase doping and sub-melt laser anneal for the fabrication of Si-based ultra-shallow junctions in sub-32 nm CMOS technology. Open Repository and Bibliography (University of Liège). 1–2. 1 indexed citations
5.
Satta, A., Eddy Simoen, Ray Duffy, et al.. (2006). Diffusion, activation, and regrowth behavior of high dose P implants in Ge. Applied Physics Letters. 88(16). 77 indexed citations
6.
Satta, A., Tom Janssens, Trudo Clarysse, et al.. (2005). P implantation on doping of Ge: diffusion, activation, re-crystallization. 2 indexed citations
7.
Vandervorst, Wilfried, Trudo Clarysse, Roger Loo, & Bartek Pawlak. (2003). Limitations and concerns in the sheet resistance measurement of ultra-shallow dopant profiles. 187. 1 indexed citations
8.
Eyben, Pierre, et al.. (2003). Progress towards a physical contact model for scanning spreading resistance microscopy. Materials Science and Engineering B. 102(1-3). 132–137. 41 indexed citations
9.
Eyben, Pierre, et al.. (2002). Scanning spreading resistance microscopy and spectroscopy for routine and quantitative two-dimensional carrier profiling. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(1). 471–478. 88 indexed citations
10.
Clarysse, Trudo, Matty Caymax, & Wilfried Vandervorst. (2002). Impact of three-dimensional lateral current flow on ultrashallow spreading resistance profiles. Applied Physics Letters. 80(13). 2407–2409. 7 indexed citations
11.
Clarysse, Trudo, Danielle Vanhaeren, & Wilfried Vandervorst. (2002). Impact of probe penetration on the electrical characterization of sub-50 nm profiles. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(1). 459–466. 24 indexed citations
12.
Eyben, Pierre, Ingrid De Wolf, R. Rooyackers, et al.. (2001). SSRM and SCM observation of modified lateral diffusion of As, BF2 and Sb induced by nitride spacers.. MRS Proceedings. 669. 4 indexed citations
13.
Wolf, Peter, Trudo Clarysse, Wilfried Vandervorst, J. Snauwaert, & L. Hellemans. (1996). One- and two-dimensional carrier profiling in semiconductors by nanospreading resistance profiling. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(1). 380–385. 50 indexed citations
14.
Wolf, Peter, J. Snauwaert, Trudo Clarysse, W. Vandervorst, & L. Hellemans. (1995). Characterization of a point-contact on silicon using force microscopy-supported resistance measurements. Applied Physics Letters. 66(12). 1530–1532. 95 indexed citations
15.
Vandervorst, Wilfried, Trudo Clarysse, Peter Wolf, et al.. (1995). On the determination of two-dimensional carrier distributions. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 96(1-2). 123–132. 7 indexed citations
16.
Vandervorst, Wilfried, et al.. (1994). Two-dimensional spreading resistance profiling: Recent understandings and applications. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(1). 276–282. 10 indexed citations
17.
Elst, Kathy, et al.. (1992). Secondary ion mass spectrometry–spreading resistance profiling study on the outdiffusion from poly- and monocrystalline cobaltsilicide. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(1). 524–532. 5 indexed citations
18.
Clarysse, Trudo & W. Vandervorst. (1992). A contact model for Poisson-based spreading resistance correction schemes incorporating Schottky barrier and pressure effects. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(1). 413–420. 5 indexed citations
19.
Clarysse, Trudo & W. Vandervorst. (1992). A new spreading resistance correction scheme combining variable radius and barrier resistance with epilayer matching. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(1). 432–437. 13 indexed citations
20.
Clarysse, Trudo, et al.. (1990). Quantitative analysis of on bevel electrical junction shifts due to carrier spilling effects. Applied Physics Letters. 57(26). 2856–2858. 21 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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