M. Bruel

3.2k total citations · 1 hit paper
60 papers, 2.5k citations indexed

About

M. Bruel is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Biomedical Engineering. According to data from OpenAlex, M. Bruel has authored 60 papers receiving a total of 2.5k indexed citations (citations by other indexed papers that have themselves been cited), including 55 papers in Electrical and Electronic Engineering, 13 papers in Computational Mechanics and 8 papers in Biomedical Engineering. Recurrent topics in M. Bruel's work include Silicon and Solar Cell Technologies (38 papers), Semiconductor materials and devices (33 papers) and Integrated Circuits and Semiconductor Failure Analysis (21 papers). M. Bruel is often cited by papers focused on Silicon and Solar Cell Technologies (38 papers), Semiconductor materials and devices (33 papers) and Integrated Circuits and Semiconductor Failure Analysis (21 papers). M. Bruel collaborates with scholars based in France, Greece and Italy. M. Bruel's co-authors include C. Jaussaud, J. Margail, J. Stoëmenos, A.J. Auberton‐Hervé, B. Aspar, A.M. Papon, Y. Le Tiec, L. Di Cioccio, F. Letertre and H. Moriceau and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Japanese Journal of Applied Physics.

In The Last Decade

M. Bruel

56 papers receiving 2.3k citations

Hit Papers

Silicon on insulator material technology 1995 2026 2005 2015 1995 250 500 750

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
M. Bruel France 21 2.3k 559 463 393 378 60 2.5k
D. Fathy United States 17 1.1k 0.5× 489 0.9× 371 0.8× 387 1.0× 176 0.5× 48 1.4k
H. Tanoue Japan 22 1.1k 0.5× 551 1.0× 640 1.4× 241 0.6× 227 0.6× 128 1.6k
F. Cristiano France 26 2.2k 1.0× 713 1.3× 999 2.2× 590 1.5× 353 0.9× 193 2.5k
B. Aspar France 24 1.2k 0.5× 327 0.6× 492 1.1× 118 0.3× 310 0.8× 76 1.4k
J. L. Batstone United States 19 1.0k 0.5× 604 1.1× 662 1.4× 184 0.5× 281 0.7× 58 1.4k
A. Schindler Germany 19 781 0.3× 586 1.0× 268 0.6× 677 1.7× 291 0.8× 52 1.3k
K.K. Bourdelle France 22 1.7k 0.7× 336 0.6× 307 0.7× 166 0.4× 523 1.4× 120 1.9k
J. S. Custer Netherlands 17 948 0.4× 593 1.1× 323 0.7× 364 0.9× 143 0.4× 45 1.1k
Seijiro Furukawa Japan 20 952 0.4× 398 0.7× 618 1.3× 254 0.6× 138 0.4× 99 1.3k
Kiyokazu Nakagawa Japan 30 2.3k 1.0× 986 1.8× 1.2k 2.6× 120 0.3× 525 1.4× 220 2.8k

Countries citing papers authored by M. Bruel

Since Specialization
Citations

This map shows the geographic impact of M. Bruel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. Bruel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. Bruel more than expected).

Fields of papers citing papers by M. Bruel

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M. Bruel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. Bruel. The network helps show where M. Bruel may publish in the future.

Co-authorship network of co-authors of M. Bruel

This figure shows the co-authorship network connecting the top 25 collaborators of M. Bruel. A scholar is included among the top collaborators of M. Bruel based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with M. Bruel. M. Bruel is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Moriceau, H., et al.. (2015). Study of high-temperature Smart Cut™: Application to silicon-on-sapphire films and to thin foils of single crystal silicon. Solid-State Electronics. 115. 225–231. 3 indexed citations
2.
Aspar, B., C. Jaussaud, L. Di Cioccio, et al.. (2003). New semiconductor hetero-substrates for high temperature applications using the Smart-Cut(R) technology. 61. 67–73. 1 indexed citations
3.
Bruel, M.. (1999). Separation of silicon wafers by the smart-cut method. Materials Research Innovations. 3(1). 9–13. 43 indexed citations
4.
Jalaguier, E., B. Aspar, S. Pocas, et al.. (1998). Transfer of 3 in GaAs film on silicon substrateby proton implantation process. Electronics Letters. 34(4). 408–409. 65 indexed citations
5.
Cioccio, L. Di, et al.. (1998). Silicon Carbide on Insulator Formation by the Smart CUT<sup>®</sup> Process. Materials science forum. 264-268. 765–770. 19 indexed citations
6.
Auberton‐Hervé, A.J., M. Bruel, B. Aspar, Christophe Maleville, & H. Moriceau. (1997). SMART-CUT: The Basic Fabrication Process for UNIBOND SOI Wafers. IEICE Transactions on Electronics. 80(3). 358–363. 13 indexed citations
7.
Bruel, M., et al.. (1997). Smart-Cut: A New Silicon On Insulator Material Technology Based on Hydrogen Implantation and Wafer Bonding*1. Japanese Journal of Applied Physics. 36(3S). 1636–1636. 184 indexed citations
8.
Maleville, Christophe, B. Aspar, H. Moriceau, et al.. (1997). Wafer bonding and H-implantation mechanisms involved in the Smart-cut® technology. Materials Science and Engineering B. 46(1-3). 14–19. 31 indexed citations
9.
Aspar, B., M. Bruel, Marc Zussy, & Alain Cartier. (1996). Transfer of structured and patterned thin siliconfilms using the Smart-Cut® process. Electronics Letters. 32(21). 1985–1986. 25 indexed citations
10.
Belleville, Marie‐Pierre, et al.. (1991). A 16×16 bits Multiplier in 0.5μm CMOS technology. 1(1). 149–152. 1 indexed citations
11.
Papaioannou, G., V. Ioannou-Sougleridis, S. Cristoloveanu, M. Bruel, & P.L.F. Hemment. (1989). Investigation of Trapping Properities in Simox Films by Photo-Induced Current Transient Spectroscopy. Materials science forum. 38-41. 1463–1468.
12.
Elewa, T., H. Haddara, S. Cristoloveanu, & M. Bruel. (1988). CHARGE PUMPING IN SILICON ON INSULATOR STRUCTURES USING GATED P-I-N DIODES. Le Journal de Physique Colloques. 49(C4). C4–137. 8 indexed citations
13.
Jaussaud, C., J. Margail, J. Stoëmenos, & M. Bruel. (1988). High Temperature Annealing of Simox Layers Physical Mechanisms of Oxygen Segregation. MRS Proceedings. 100. 20 indexed citations
14.
Cartier, Alain, et al.. (1987). Critical aspects of high energy implants for CMOS technology: Channeling effects and masking problems. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 21(1-4). 452–455. 10 indexed citations
15.
Bruel, M., et al.. (1987). Nitrogen implantation for local inhibition of oxidation. Applied Physics Letters. 50(2). 89–91. 7 indexed citations
16.
Biasse, B., Alain Cartier, & M. Bruel. (1985). Low-energy BF2+ implants. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 10-11. 526–528. 5 indexed citations
17.
Biasse, B., et al.. (1985). In-depth spreading resistance characterization of buried insulating layers synthesized by high dose implantation of nitrogen or oxygen ions. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 10-11. 501–505. 2 indexed citations
18.
Bruel, M., et al.. (1979). Target heating during ion implantation and related problems. Radiation Effects. 44(1-4). 173–179. 2 indexed citations
19.
Bruel, M., et al.. (1977). Ion implantation in semiconductors and other materials. 16 indexed citations
20.
Bruel, M., et al.. (1973). Analyse de traces par utilisation simultanee d'un abraseur ionique et des techniques de reactions nucleaires. Journal of Radioanalytical and Nuclear Chemistry. 17(1-2). 79–90. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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