T. Nakamura
- Electrical and Electronic Engineering top 2%
- Electronic, Optical and Magnetic Materials top 5%
- Biomedical Engineering top 10%
- Atomic and Molecular Physics, and Optics top 10%
- Materials Chemistry
- Co-authors
- Hajime IshikawaTakashi ItoTakashi KatodaTakayuki OhbaHideki KitadaH. KurinoMitsumasa KoyanagiKoji Fujimoto
- Topics
- Semiconductor materials and devices (68 papers)Copper Interconnects and Reliability (57 papers)3D IC and TSV technologies (55 papers)
- Cited by
- Electrical and Electronic EngineeringElectronic, Optical and Magnetic MaterialsAtomic and Molecular Physics, and Optics
- Partner nations
- JapanUnited StatesTaiwan
In The Last Decade
T. Nakamura
147 papers receiving 1.9k citations
Peers
Comparison fields: 5 of 58
- Electrical and Electronic Engineering 1.8k
- Electronic, Optical and Magnetic Materials 388
- Biomedical Engineering 326
- Atomic and Molecular Physics, and Optics 309
- Materials Chemistry 295
Countries citing papers authored by T. Nakamura
This map shows the geographic impact of T. Nakamura's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. Nakamura with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. Nakamura more than expected).
Fields of papers citing papers by T. Nakamura
This network shows the impact of papers produced by T. Nakamura. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. Nakamura. The network helps show where T. Nakamura may publish in the future.
Co-authorship network of co-authors of T. Nakamura
This figure shows the co-authorship network connecting the top 25 collaborators of T. Nakamura. A scholar is included among the top collaborators of T. Nakamura based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with T. Nakamura. T. Nakamura is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 1 | |
| 2 | Micro-Raman Spectroscopy of a Plagioclase Particle from the Hayabusa-1 Sample Return Mission | 1 |
| 3 | 4 | |
| 4 | 6 | |
| 5 | 3 | |
| 6 | 結晶可塑性を使った,Cu/絶縁層界面クラック進展シミュレーションの開発 | 2 |
| 7 | 6 | |
| 8 | Influence of Via Stress on Surface Micro-roughness-induced Leakage Current in Through-Silicon Via Interconnects | 0 |
| 9 | 16 | |
| 10 | 12 | |
| 11 | 3 | |
| 12 | 10 | |
| 13 | 5 | |
| 14 | 10 | |
| 15 | Comparison of DRAM Cells in the Simulation of Soft Error Rates | 4 |
| 16 | 7 | |
| 17 | Interfacial Oxidation of Ta2O5-Si Systems for High-Density D-RAM | 2 |
| 18 | Aluminum Plasma-CVD for VLSI Circuit Interconnections | 1 |
| 19 | 191 | |
| 20 | 15 |
About T. Nakamura
T. Nakamura is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering and General Materials Science, having authored 154 papers that have together received 2.0k indexed citations. Recurring topics across this work include Semiconductor materials and devices (68 papers), Copper Interconnects and Reliability (57 papers) and 3D IC and TSV technologies (55 papers). The work is most often cited by research in Electrical and Electronic Engineering (1.8k citations), Electronic, Optical and Magnetic Materials (388 citations) and Atomic and Molecular Physics, and Optics (309 citations). T. Nakamura has collaborated with scholars based in Japan, United States and Taiwan. Frequent co-authors include Hajime Ishikawa, Takashi Ito, Takashi Katoda, Takayuki Ohba, Hideki Kitada, H. Kurino, Mitsumasa Koyanagi, Koji Fujimoto, Yusuke Yamada and Takashi Suzuki. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.