Atsushi Noya

793 citations
74 papers · 705 indexed · h-index 14
Topics
Semiconductor materials and devices (44 papers)Copper Interconnects and Reliability (42 papers)Semiconductor materials and interfaces (29 papers)
Partner nations
Japan

In The Last Decade

Atsushi Noya

71 papers receiving 684 citations

Peers

Atsushi Noya
Comparison fields: 5 of 32
  • Electrical and Electronic Engineering 507
  • Mechanics of Materials 373
  • Electronic, Optical and Magnetic Materials 341
  • Materials Chemistry 203
  • Atomic and Molecular Physics, and Optics 174
Replace Miki Moriyama with:
Miki Moriyama Japan
Brad J. Burrow United States
E. M. Zielinski United States
Jyrki Molarius Finland
Hiromu Shiomi Japan
A.S. Segal Russia
E. Andideh United States
Gai Wu China
Tommi Riekkinen Finland
F. R. Chien United States
Atsushi Noya relative to Miki Moriyama Japan Miki Moriyama's profile →
Citations per field
00.5×1.5×2.1×
Miki Moriyama · 1×
Citations per year

Countries citing papers authored by Atsushi Noya

Since Specialization
Citations

This map shows the geographic impact of Atsushi Noya's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Atsushi Noya with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Atsushi Noya more than expected).

Fields of papers citing papers by Atsushi Noya

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Atsushi Noya. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Atsushi Noya. The network helps show where Atsushi Noya may publish in the future.

Co-authorship network of co-authors of Atsushi Noya

This figure shows the co-authorship network connecting the top 25 collaborators of Atsushi Noya. A scholar is included among the top collaborators of Atsushi Noya based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Atsushi Noya. Atsushi Noya is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
#WorkIndexed citations
1
Room-temperature deposition of HfN
1
2 6
3 4
4
Preparation of nanocrystalline HfN
8
5 7
6 18
7 4
8 11
9 7
10
Formation of [111] Preferentially Oriented Cu Layer on [110] Nb Barrier on SiO_2
0
11 8
12 9
13 19
14 103
15 24
16 1
17 5
18
Improvement of the Electrical Properties of Al/Hf bi-Layered Anodized Capacitor by Interposing a Ta Layer
1
19
Preparation of the CuTi_2 Intermetallic Compound Film and Its Application to the Cu/CuTi_2/Si Contact Structure
1
20 5

About Atsushi Noya

Atsushi Noya is a scholar working on Electronic, Optical and Magnetic Materials, Mechanics of Materials and Electrical and Electronic Engineering, having authored 74 papers that have together received 705 indexed citations. Recurring topics across this work include Semiconductor materials and devices (44 papers), Copper Interconnects and Reliability (42 papers) and Semiconductor materials and interfaces (29 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (341 citations), Mechanics of Materials (373 citations) and Electrical and Electronic Engineering (507 citations). Atsushi Noya has collaborated with scholars based in Japan. Frequent co-authors include Mayumi B. Takeyama, Katsutaka Sasaki, Eiji Aoyagi, Takaomi Itoi, Akira Ohta, Masaru Sato, Yuichiro Hayasaka, Yoshihiro Nakata, T. Nakamura and Yasushi Kobayashi. Their work appears in journals such as Journal of Applied Physics, Applied Surface Science and Thin Solid Films.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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