D. Vender

2.2k citations

40 papers · 1.9k indexed · h-index 23

Impact in

Electrical and Electronic Engineering top 2%
- Plasma Diagnostics and Applications
- Electrohydrodynamics and Fluid Dynamics
- Semiconductor materials and devices
Mechanics of Materials top 2%
- Metal and Thin Film Mechanics

Papers in ⓘ

Electrical and Electronic Engineering 36
- Plasma Diagnostics and Applications 35
- Semiconductor materials and devices 6
- Electrohydrodynamics and Fluid Dynamics 5
Nuclear and High Energy Physics 7
- Magnetic confinement fusion research 7

Co-authors: Rod Boswell (4 shared papers)G. S. Oehrlein (7 shared papers)M. M. Turner (6 shared papers)R. W. Boswell (3 shared papers)Andrew Perry (1 shared paper)M. Haverlag (5 shared papers)F. J. de Hoog (7 shared papers)G. M. W. Kroesen (6 shared papers)
Journals: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (6 papers)Applied Physics Letters (5 papers)Plasma Sources Science and Technology (5 papers)IEEE Transactions on Plasma Science (4 papers)Journal of Applied Physics (2 papers)
Partner nations: Ireland Australia United States

In The Last Decade

D. Vender

39 papers receiving 1.8k citations

Peers

Countries citing papers authored by D. Vender

Since Specialization

Citations

This map shows the geographic impact of D. Vender's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Vender with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Vender more than expected).

Fields of papers citing papers by D. Vender

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. Vender. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Vender. The network helps show where D. Vender may publish in the future.

Co-authors

The 25 scholars most cited alongside D. Vender, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with D. Vender Line = papers co-authored together D. Vender links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 40 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	The application of the helicon source to plasma processing Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Andrew Perry, D. Vender, Rod Boswell	1991	209
2	Numerical modeling of low-pressure RF plasmas IEEE Transactions on Plasma Science ·D. Vender, Rod Boswell	1990	189
3	Fluorocarbon high-density plasmas. I. Fluorocarbon film deposition and etching using CF4 and CHF3 Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·G. S. Oehrlein, Y. Zhang, D. Vender, M. Haverlag	1994	159
4	Negative ions in a radio-frequency oxygen plasma Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics ·E. Stoffels, W. W. Stoffels, D. Vender, Masashi Kando, G. M. W. Kroesen, F. J. de Hoog	1995	150
5	Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF3 Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·G. S. Oehrlein, Y. Zhang, D. Vender, O. Joubert	1994	129
6	Collisionless Electron Heating by Capacitive rf Sheaths Physical Review Letters ·G. Gozadinos, M. M. Turner, D. Vender	2001	123
7	Characterization of the E to H transition in a pulsed inductively coupled plasma discharge with internal coil geometry: bi-stability and hysteresis Plasma Sources Science and Technology ·Gilles Cunge, B. Crowley, D. Vender, M. M. Turner	1999	114
8	Electron–sheath interaction in capacitive radio-frequency plasmas Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·D. Vender, R. W. Boswell	1992	93
9	Charged-species profiles in electronegative radio-frequency plasmas Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics ·D. Vender, W. W. Stoffels, E. Stoffels, G. M. W. Kroesen, F. J. de Hoog	1995	62
10	Plasma ionization through wave-particle interaction in a capacitively coupled radio-frequency discharge Physics of Plasmas ·Deborah O’Connell, Timo Gans, D. Vender, Uwe Czarnetzki, R. Boswell	2007	47
11	An experimental study of breakdown in a pulsed Helicon plasma Plasma Sources Science and Technology ·R. W. Boswell, D. Vender	1995	45
12	Simulations of multipactor-assisted breakdown in radio frequency plasmas Journal of Applied Physics ·D. Vender, H. B. Smith, Rod Boswell	1996	44
13	Investigation of selective SiO2-to-Si etching in an inductively coupled high-density plasma using fluorocarbon gases Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·F. H. Bell, O. Joubert, G. S. Oehrlein, Y. Zhang, D. Vender	1994	43
14	Transport of argon ions in an inductively coupled high-density plasma reactor Applied Physics Letters ·N. Sadeghi, M. van de Grift, D. Vender, G. M. W. Kroesen, F. J. de Hoog	1997	42
15	Sidewall passivation during the etching of poly-Si in an electron cyclotron resonance plasma of HBr Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·M. Haverlag, G. S. Oehrlein, D. Vender	1994	38
16	Global model of a radiofrequency H₂plasma in DENISE Plasma Sources Science and Technology ·Roberto Zorat, Jonathan P. Goss, D. Boilson, D. Vender	2000	37
17	Bohm velocity with a two-temperature distribution of negative particles IEEE Transactions on Plasma Science ·Rod Boswell, A. J. Lichtenberg, D. Vender	1992	37
18	Anomalous skin effect and collisionless power dissipation in inductively coupled discharges Journal of Applied Physics ·Gilles Cunge, B. Crowley, D. Vender, M. M. Turner	2001	35
19	Negative Ions in Low Pressure Discharges Contributions to Plasma Physics ·E. Stoffels, W. W. Stoffels, D. Vender, M. Haverlag, G. M. W. Kroesen, F. J. de Hoog	1995	35
20	Collisionless electron heating by capacitive radio-frequency plasma sheaths Plasma Sources Science and Technology ·G. Gozadinos, D. Vender, M. M. Turner, M. A. Lieberman	2001	28

About D. Vender

D. Vender is a scholar working on Electrical and Electronic Engineering, Nuclear and High Energy Physics, Mechanics of Materials, Atomic and Molecular Physics, and Optics and Aerospace Engineering, having authored 40 papers that have together received 1.9k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (35 papers), Dust and Plasma Wave Phenomena (11 papers), Metal and Thin Film Mechanics (9 papers), Particle accelerators and beam dynamics (8 papers), Magnetic confinement fusion research (7 papers), Semiconductor materials and devices (6 papers), Laser-induced spectroscopy and plasma (5 papers) and Electrohydrodynamics and Fluid Dynamics (5 papers). The work is most often cited by research in Electrical and Electronic Engineering (1.7k citations), Mechanics of Materials (621 citations), Atomic and Molecular Physics, and Optics (536 citations), Radiology, Nuclear Medicine and Imaging (377 citations) and Aerospace Engineering (327 citations). D. Vender has collaborated with scholars based in Ireland, Australia and United States. Frequent co-authors include Rod Boswell, G. S. Oehrlein, M. M. Turner, R. W. Boswell, Andrew Perry, M. Haverlag, F. J. de Hoog, G. M. W. Kroesen, W. W. Stoffels and E. Stoffels. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Applied Physics Letters, Plasma Sources Science and Technology, IEEE Transactions on Plasma Science and Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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