Toshiro Itani

3.3k total citations
280 papers, 2.7k citations indexed

About

Toshiro Itani is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Toshiro Itani has authored 280 papers receiving a total of 2.7k indexed citations (citations by other indexed papers that have themselves been cited), including 276 papers in Electrical and Electronic Engineering, 122 papers in Biomedical Engineering and 110 papers in Surfaces, Coatings and Films. Recurrent topics in Toshiro Itani's work include Advancements in Photolithography Techniques (265 papers), Integrated Circuits and Semiconductor Failure Analysis (128 papers) and Electron and X-Ray Spectroscopy Techniques (96 papers). Toshiro Itani is often cited by papers focused on Advancements in Photolithography Techniques (265 papers), Integrated Circuits and Semiconductor Failure Analysis (128 papers) and Electron and X-Ray Spectroscopy Techniques (96 papers). Toshiro Itani collaborates with scholars based in Japan, United States and Belgium. Toshiro Itani's co-authors include Takahiro Kozawa, Julius Joseph Santillan, Hiroaki Oizumi, Seiichi Tagawa, Minoru Toriumi, Kunihiko Kasama, Hiroto Kudo, Shinji Kobayashi, Shuichi Hashimoto and Tadatomi Nishikubo and has published in prestigious journals such as Journal of Materials Chemistry, IEEE Journal of Solid-State Circuits and Thin Solid Films.

In The Last Decade

Toshiro Itani

252 papers receiving 2.3k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Toshiro Itani Japan 25 2.5k 1.3k 1.0k 113 94 280 2.7k
Nelson Felix United States 17 818 0.3× 525 0.4× 266 0.3× 145 1.3× 46 0.5× 113 1.1k
M. Sanchez United States 16 636 0.3× 306 0.2× 236 0.2× 49 0.4× 225 2.4× 30 946
Masaru Sasago Japan 15 670 0.3× 473 0.4× 106 0.1× 97 0.9× 73 0.8× 137 912
Miguel Hernáez Spain 29 2.2k 0.9× 893 0.7× 178 0.2× 17 0.2× 86 0.9× 80 2.6k
Robert R. Krchnavek United States 15 444 0.2× 226 0.2× 59 0.1× 40 0.4× 54 0.6× 68 793
P. Susthitha Menon Malaysia 19 802 0.3× 531 0.4× 60 0.1× 19 0.2× 52 0.6× 203 1.3k
Shreya Kundu Belgium 19 782 0.3× 130 0.1× 120 0.1× 21 0.2× 93 1.0× 63 1.2k
Shaomin Xiong United States 14 499 0.2× 483 0.4× 63 0.1× 24 0.2× 164 1.7× 44 1.4k
Jeffrey D. Gelorme United States 10 853 0.3× 511 0.4× 60 0.1× 88 0.8× 236 2.5× 25 1.2k
B. K. Furman United States 16 577 0.2× 145 0.1× 47 0.0× 25 0.2× 175 1.9× 41 983

Countries citing papers authored by Toshiro Itani

Since Specialization
Citations

This map shows the geographic impact of Toshiro Itani's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Toshiro Itani with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Toshiro Itani more than expected).

Fields of papers citing papers by Toshiro Itani

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Toshiro Itani. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Toshiro Itani. The network helps show where Toshiro Itani may publish in the future.

Co-authorship network of co-authors of Toshiro Itani

This figure shows the co-authorship network connecting the top 25 collaborators of Toshiro Itani. A scholar is included among the top collaborators of Toshiro Itani based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Toshiro Itani. Toshiro Itani is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Santillan, Julius Joseph, et al.. (2022). Effect of Alternative Developer Solutions on EUVL Patterning. Journal of Photopolymer Science and Technology. 35(1). 67–74. 3 indexed citations
2.
Santillan, Julius Joseph, et al.. (2022). Dependence of photoresist dissolution dynamics in alkaline developers on alkyl chain length of tetraalkylammonium hydroxide. Japanese Journal of Applied Physics. 61(5). 56506–56506. 8 indexed citations
3.
Tanaka, Yuji, et al.. (2021). Pattern collapse mitigation by controlling atmosphere during development process for semiconductor lithography. Japanese Journal of Applied Physics. 60(SC). SCCA03–SCCA03. 9 indexed citations
4.
Santillan, Julius Joseph, et al.. (2021). Application of ethyltrimethylammonium hydroxide (ETMAH) as an alternative developer solution/process for semiconductor lithography. Japanese Journal of Applied Physics. 60(SC). SCCC01–SCCC01. 8 indexed citations
5.
Santillan, Julius Joseph, et al.. (2021). Alternative developer solution/process for EUV lithography: ethyltrimethylammonium hydroxide (ETMAH). 32–32. 1 indexed citations
6.
Yamada, Teppei, Satoshi Ishihara, Yusa Muroya, et al.. (2019). Pulse radiolysis of methacrylic acid ligand for zirconia nanoparticle resist. Japanese Journal of Applied Physics. 58(3). 36503–36503. 8 indexed citations
7.
Kozawa, Takahiro, Ayako Nakajima, Teppei Yamada, et al.. (2019). Dependence of relationship between chemical gradient and line width roughness of zirconia nanoparticle resist on pattern duty, acid generator, and developer. Japanese Journal of Applied Physics. 58(3). 36501–36501. 8 indexed citations
8.
Yamashita, Yoshiyuki, Toyohiro Chikyow, Julius Joseph Santillan, & Toshiro Itani. (2019). Reaction mechanism of ZrO x metal resists with extreme ultraviolet irradiation. Japanese Journal of Applied Physics. 58(SD). SDDC01–SDDC01. 7 indexed citations
9.
Kozawa, Takahiro, Julius Joseph Santillan, & Toshiro Itani. (2017). Theoretical study on sensitivity enhancement in energy-deficit region of chemically amplified resists used for extreme ultraviolet lithography. Japanese Journal of Applied Physics. 56(10). 106503–106503. 1 indexed citations
10.
Itani, Toshiro, et al.. (2015). High-sensitivity negative-tone imaging materials using EUV exposure for sub-10 nm manufacturing — Toru Fujimori. 1–2. 1 indexed citations
11.
Santillan, Julius Joseph, et al.. (2015). In situ characterization of nano-scale pattern roughness during resist dissolution process. Microelectronic Engineering. 143. 64–68.
12.
Toriumi, Minoru & Toshiro Itani. (2014). Inhomogeneity of PAGs in Resist Film studied by Molecular Dynamics Simulations. Journal of Photopolymer Science and Technology. 27(5). 617–622. 5 indexed citations
13.
Kozawa, Takahiro, Julius Joseph Santillan, & Toshiro Itani. (2014). Theoretical study on stochastic defect generation in chemically amplified resist process for extreme ultraviolet lithography. Japanese Journal of Applied Physics. 53(6). 66504–66504. 8 indexed citations
14.
Morita, Masamichi, et al.. (2011). High-sensitivity EUV Resists based on Tetrafluoroethylene contained Fluoropolymers. Journal of Photopolymer Science and Technology. 24(2). 165–172. 5 indexed citations
15.
Morita, Masamichi, et al.. (2011). High-sensitivity EUV resists based on fluorinated polymers. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7972. 79721G–79721G. 4 indexed citations
16.
Watanabe, Takeo & Toshiro Itani. (2008). Photo Resist Technology. The Journal of the Institute of Electrical Engineers of Japan. 128(10). 681–683.
17.
Oizumi, Hiroaki, et al.. (2008). Development of New Negative-tone Molecular Resists Based on Calixarene for EUV Lithography. Journal of Photopolymer Science and Technology. 21(3). 443–449. 17 indexed citations
18.
Itani, Toshiro, Kiyoshi Fujii, Takuji Ishikawa, et al.. (2004). Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 159–159. 5 indexed citations
19.
Watanabe, Hiroyuki, et al.. (2002). Hard Mask Process Using Chemically Amplified 157-nm Resists.. Journal of Photopolymer Science and Technology. 15(4). 699–706. 3 indexed citations
20.
Itani, Toshiro, et al.. (1995). Photoacid bulkiness effect on dissolution kinetics in chemically amplified deep ultraviolet resists. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 3026–3029. 23 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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