Mario Meissl

636 total citations
13 papers, 518 citations indexed

About

Mario Meissl is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Mario Meissl has authored 13 papers receiving a total of 518 indexed citations (citations by other indexed papers that have themselves been cited), including 12 papers in Electrical and Electronic Engineering, 12 papers in Biomedical Engineering and 7 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Mario Meissl's work include Nanofabrication and Lithography Techniques (12 papers), Advancements in Photolithography Techniques (11 papers) and Force Microscopy Techniques and Applications (7 papers). Mario Meissl is often cited by papers focused on Nanofabrication and Lithography Techniques (12 papers), Advancements in Photolithography Techniques (11 papers) and Force Microscopy Techniques and Applications (7 papers). Mario Meissl collaborates with scholars based in United States and Japan. Mario Meissl's co-authors include Byung Jin Choi, C. Grant Willson, Matthew Colburn, S. V. Sreenivasan, John G. Ekerdt, T. C. Bailey, Todd Bailey, S. V. Sreenivasan, Steve Johnson and Kevin J. Nordquist and has published in prestigious journals such as Physics of Fluids, IEEE/ASME Transactions on Mechatronics and Microelectronic Engineering.

In The Last Decade

Mario Meissl

9 papers receiving 476 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Mario Meissl United States 7 487 389 165 42 34 13 518
M. Wissen Germany 12 412 0.8× 255 0.7× 175 1.1× 26 0.6× 76 2.2× 33 430
Hua Tan United States 6 301 0.6× 255 0.7× 114 0.7× 48 1.1× 24 0.7× 11 361
G. Bleidießel Germany 7 286 0.6× 208 0.5× 105 0.6× 25 0.6× 11 0.3× 9 315
Yohannes M. Desta United States 10 267 0.5× 203 0.5× 40 0.2× 30 0.7× 41 1.2× 38 371
W. H. Juan United States 10 152 0.3× 228 0.6× 121 0.7× 14 0.3× 41 1.2× 21 318
Young-Chul Ko South Korea 10 151 0.3× 224 0.6× 91 0.6× 107 2.5× 36 1.1× 15 336
Hideki Kitada Japan 12 141 0.3× 469 1.2× 67 0.4× 15 0.4× 25 0.7× 61 534
P. Regli Switzerland 7 218 0.4× 288 0.7× 141 0.9× 63 1.5× 8 0.2× 14 388
C. Deguet France 14 197 0.4× 494 1.3× 142 0.9× 10 0.2× 17 0.5× 34 565
Jay Mody Belgium 13 230 0.5× 254 0.7× 189 1.1× 9 0.2× 48 1.4× 26 415

Countries citing papers authored by Mario Meissl

Since Specialization
Citations

This map shows the geographic impact of Mario Meissl's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mario Meissl with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mario Meissl more than expected).

Fields of papers citing papers by Mario Meissl

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mario Meissl. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mario Meissl. The network helps show where Mario Meissl may publish in the future.

Co-authorship network of co-authors of Mario Meissl

This figure shows the co-authorship network connecting the top 25 collaborators of Mario Meissl. A scholar is included among the top collaborators of Mario Meissl based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Mario Meissl. Mario Meissl is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

13 of 13 papers shown
1.
Hayashi, Tatsuya, Osamu Morimoto, Wei Zhang, et al.. (2020). High Volume Semiconductor Manufacturing Using Nanoimprint Lithography. 1–4.
2.
3.
Im, Se Hyuk, Mario Meissl, Ahmed Hussein, et al.. (2019). Topography and flatness induced overlay distortion correction using resist drop pattern compensation in nanoimprint lithography systems. 67. 11–11. 1 indexed citations
4.
5.
Mokaberi, Babak, et al.. (2014). Nanoscale Magnification and Shape Control System for Precision Overlay in Jet and Flash Imprint Lithography. IEEE/ASME Transactions on Mechatronics. 20(1). 122–132. 10 indexed citations
6.
Meissl, Mario, et al.. (2013). Inkjet-based deposition of polymer thin films enabled by a lubrication model incorporating nano-scale parasitics. Physics of Fluids. 25(9). 7 indexed citations
7.
Bailey, T. C., Douglas J. Resnick, David P. Mancini, et al.. (2002). Template fabrication schemes for step and flash imprint lithography. Microelectronic Engineering. 61-62. 461–467. 88 indexed citations
8.
Resnick, Douglas J., Todd Bailey, David P. Mancini, et al.. (2002). <title>New methods for fabricating step and flash imprint lithography templates</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4608. 176–181. 1 indexed citations
9.
Choi, Byung Jin, Mario Meissl, Matthew Colburn, et al.. (2001). <title>Layer-to-layer alignment for step and flash imprint lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4343. 436–442. 11 indexed citations
10.
Colburn, Matthew, Byung Jin Choi, Mario Meissl, et al.. (2001). Characterization and modeling of volumetric and mechanical properties for step and flash imprint lithography photopolymers. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(6). 2685–2689. 55 indexed citations
11.
Bailey, T. C., Byung Jin Choi, Matthew Colburn, et al.. (2001). Step and flash imprint lithography: Defect analysis. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(6). 2806–2810. 46 indexed citations
12.
Bailey, Travis S., Byung Jin Choi, Matthew Colburn, et al.. (2000). Step and Flash Imprint Lithography: A Technology Review. 11(4). 54–67. 1 indexed citations
13.
Bailey, T. C., Byung Jin Choi, Matthew Colburn, et al.. (2000). Step and flash imprint lithography: Template surface treatment and defect analysis. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3572–3577. 295 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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